JPS61256347A - アルカリ可溶性シロキサン重合体 - Google Patents

アルカリ可溶性シロキサン重合体

Info

Publication number
JPS61256347A
JPS61256347A JP9803285A JP9803285A JPS61256347A JP S61256347 A JPS61256347 A JP S61256347A JP 9803285 A JP9803285 A JP 9803285A JP 9803285 A JP9803285 A JP 9803285A JP S61256347 A JPS61256347 A JP S61256347A
Authority
JP
Japan
Prior art keywords
group
alkali
soluble
siloxane polymer
polymer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP9803285A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0521228B2 (enExample
Inventor
Hisashi Sugiyama
寿 杉山
Kazuo Nate
和男 名手
Takashi Inoue
隆史 井上
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP9803285A priority Critical patent/JPS61256347A/ja
Priority to US06/859,370 priority patent/US4745169A/en
Priority to EP86106238A priority patent/EP0204963B1/en
Priority to DE8686106238T priority patent/DE3687479T2/de
Publication of JPS61256347A publication Critical patent/JPS61256347A/ja
Priority to US07/893,946 priority patent/US5264319A/en
Publication of JPH0521228B2 publication Critical patent/JPH0521228B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C08G77/14—Polysiloxanes containing silicon bound to oxygen-containing groups
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/60—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule in which all the silicon atoms are connected by linkages other than oxygen atoms

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Silicon Polymers (AREA)
JP9803285A 1985-05-10 1985-05-10 アルカリ可溶性シロキサン重合体 Granted JPS61256347A (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP9803285A JPS61256347A (ja) 1985-05-10 1985-05-10 アルカリ可溶性シロキサン重合体
US06/859,370 US4745169A (en) 1985-05-10 1986-05-05 Alkali-soluble siloxane polymer, silmethylene polymer, and polyorganosilsesquioxane polymer
EP86106238A EP0204963B1 (en) 1985-05-10 1986-05-07 Use of Alkali-Soluble Polyorganosilsesquioxane Polymers in a resist for preparing electronics parts.
DE8686106238T DE3687479T2 (de) 1985-05-10 1986-05-07 Verwendung von in alkalische milieu loeslichen silsesquioxanpolymeren in einem resist zur herstellung von electronischen teilen.
US07/893,946 US5264319A (en) 1985-05-10 1992-06-04 Photosensitive resin composition having high resistance to oxygen plasma, containing alkali-soluble organosilicon polymer and photosensitive dissolution inhibitor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9803285A JPS61256347A (ja) 1985-05-10 1985-05-10 アルカリ可溶性シロキサン重合体

Publications (2)

Publication Number Publication Date
JPS61256347A true JPS61256347A (ja) 1986-11-13
JPH0521228B2 JPH0521228B2 (enExample) 1993-03-23

Family

ID=14208669

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9803285A Granted JPS61256347A (ja) 1985-05-10 1985-05-10 アルカリ可溶性シロキサン重合体

Country Status (1)

Country Link
JP (1) JPS61256347A (enExample)

Cited By (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62159141A (ja) * 1986-01-08 1987-07-15 Hitachi Ltd 感光性樹脂組成物
JPS6391654A (ja) * 1986-10-06 1988-04-22 Hitachi Ltd 感光性樹脂組成物
JPS63231331A (ja) * 1987-03-19 1988-09-27 Hitachi Ltd パターン形成方法
JPS63239440A (ja) * 1986-11-25 1988-10-05 Nippon Telegr & Teleph Corp <Ntt> エネルギ線感応性樹脂組成物
JPS63269150A (ja) * 1987-04-28 1988-11-07 Nippon Telegr & Teleph Corp <Ntt> パタ−ン形成方法
US4946921A (en) * 1988-05-18 1990-08-07 Toray Silicone Company Limited Alkali-soluble organopolysiloxane
EP0410606A2 (en) 1989-07-12 1991-01-30 Fuji Photo Film Co., Ltd. Siloxane polymers and positive working light-sensitive compositions comprising the same
US6387590B1 (en) * 1999-09-28 2002-05-14 Fuji Photo Film Co., Ltd. Positive photoresist composition
JP2002308990A (ja) * 2001-04-10 2002-10-23 Jsr Corp ポリシロキサンとその製造方法および感放射線性樹脂組成物
US6914114B2 (en) 2000-07-17 2005-07-05 Honeywell International Inc. Absorbing compounds for spin-on-glass anti-reflective coatings for photolithography
JP2009511638A (ja) * 2005-10-18 2009-03-19 ディーシーイー アプリリス，インコーポレイテッド ホログラフィックストレージのための、カチオン重合をサポートするシロキサン化合物を含む光重合可能な媒体
US8864898B2 (en) 2011-05-31 2014-10-21 Honeywell International Inc. Coating formulations for optical elements
US8992806B2 (en) 2003-11-18 2015-03-31 Honeywell International Inc. Antireflective coatings for via fill and photolithography applications and methods of preparation thereof
JP2021514943A (ja) * 2018-04-17 2021-06-17 ジェレスト テクノロジーズ， インコーポレイテッド アルキルエーテル置換シクロトリシロキサン及びその製造方法

Cited By (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62159141A (ja) * 1986-01-08 1987-07-15 Hitachi Ltd 感光性樹脂組成物
JPS6391654A (ja) * 1986-10-06 1988-04-22 Hitachi Ltd 感光性樹脂組成物
JPS63239440A (ja) * 1986-11-25 1988-10-05 Nippon Telegr & Teleph Corp <Ntt> エネルギ線感応性樹脂組成物
JPS63231331A (ja) * 1987-03-19 1988-09-27 Hitachi Ltd パターン形成方法
JPS63269150A (ja) * 1987-04-28 1988-11-07 Nippon Telegr & Teleph Corp <Ntt> パタ−ン形成方法
US4946921A (en) * 1988-05-18 1990-08-07 Toray Silicone Company Limited Alkali-soluble organopolysiloxane
EP0410606A2 (en) 1989-07-12 1991-01-30 Fuji Photo Film Co., Ltd. Siloxane polymers and positive working light-sensitive compositions comprising the same
US6387590B1 (en) * 1999-09-28 2002-05-14 Fuji Photo Film Co., Ltd. Positive photoresist composition
US6479213B2 (en) 1999-09-28 2002-11-12 Fuji Photo Film Co., Ltd. Positive photoresist composition
US6914114B2 (en) 2000-07-17 2005-07-05 Honeywell International Inc. Absorbing compounds for spin-on-glass anti-reflective coatings for photolithography
JP2002308990A (ja) * 2001-04-10 2002-10-23 Jsr Corp ポリシロキサンとその製造方法および感放射線性樹脂組成物
US8992806B2 (en) 2003-11-18 2015-03-31 Honeywell International Inc. Antireflective coatings for via fill and photolithography applications and methods of preparation thereof
JP2009511638A (ja) * 2005-10-18 2009-03-19 ディーシーイー アプリリス，インコーポレイテッド ホログラフィックストレージのための、カチオン重合をサポートするシロキサン化合物を含む光重合可能な媒体
US8864898B2 (en) 2011-05-31 2014-10-21 Honeywell International Inc. Coating formulations for optical elements
JP2021514943A (ja) * 2018-04-17 2021-06-17 ジェレスト テクノロジーズ， インコーポレイテッド アルキルエーテル置換シクロトリシロキサン及びその製造方法

Also Published As

Publication number Publication date
JPH0521228B2 (enExample) 1993-03-23

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