JPS6125217B2 - - Google Patents
Info
- Publication number
- JPS6125217B2 JPS6125217B2 JP53143092A JP14309278A JPS6125217B2 JP S6125217 B2 JPS6125217 B2 JP S6125217B2 JP 53143092 A JP53143092 A JP 53143092A JP 14309278 A JP14309278 A JP 14309278A JP S6125217 B2 JPS6125217 B2 JP S6125217B2
- Authority
- JP
- Japan
- Prior art keywords
- layer
- metal
- aluminum
- metal layer
- semiconductor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 229910052751 metal Inorganic materials 0.000 claims description 26
- 239000002184 metal Substances 0.000 claims description 26
- 239000004065 semiconductor Substances 0.000 claims description 20
- 238000005530 etching Methods 0.000 claims description 15
- 239000000758 substrate Substances 0.000 claims description 10
- 238000000034 method Methods 0.000 claims description 9
- 238000010438 heat treatment Methods 0.000 claims description 4
- 238000004519 manufacturing process Methods 0.000 claims description 3
- 229910045601 alloy Inorganic materials 0.000 claims description 2
- 239000000956 alloy Substances 0.000 claims description 2
- 239000010408 film Substances 0.000 claims description 2
- 238000000059 patterning Methods 0.000 claims description 2
- 239000010409 thin film Substances 0.000 claims description 2
- 229910052782 aluminium Inorganic materials 0.000 description 16
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 16
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 16
- 239000004020 conductor Substances 0.000 description 11
- 238000009792 diffusion process Methods 0.000 description 9
- 229910000676 Si alloy Inorganic materials 0.000 description 5
- 239000005360 phosphosilicate glass Substances 0.000 description 5
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 4
- CSDREXVUYHZDNP-UHFFFAOYSA-N alumanylidynesilicon Chemical compound [Al].[Si] CSDREXVUYHZDNP-UHFFFAOYSA-N 0.000 description 4
- 229910052710 silicon Inorganic materials 0.000 description 4
- 239000010703 silicon Substances 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 238000000151 deposition Methods 0.000 description 3
- 229910052814 silicon oxide Inorganic materials 0.000 description 3
- 230000002411 adverse Effects 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- 230000003321 amplification Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 229910021419 crystalline silicon Inorganic materials 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 230000003628 erosive effect Effects 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 238000003199 nucleic acid amplification method Methods 0.000 description 1
- 238000001020 plasma etching Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/11—Manufacturing methods
Landscapes
- Electrodes Of Semiconductors (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14309278A JPS5568653A (en) | 1978-11-20 | 1978-11-20 | Manufacturing method of semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14309278A JPS5568653A (en) | 1978-11-20 | 1978-11-20 | Manufacturing method of semiconductor device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5568653A JPS5568653A (en) | 1980-05-23 |
JPS6125217B2 true JPS6125217B2 (US20030199744A1-20031023-C00003.png) | 1986-06-14 |
Family
ID=15330718
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP14309278A Granted JPS5568653A (en) | 1978-11-20 | 1978-11-20 | Manufacturing method of semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5568653A (US20030199744A1-20031023-C00003.png) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6378817A (ja) * | 1986-09-20 | 1988-04-08 | Ota Sheet:Kk | 幌支持用フレ−ム |
JPH02103862U (US20030199744A1-20031023-C00003.png) * | 1989-02-03 | 1990-08-17 | ||
JPH0242486Y2 (US20030199744A1-20031023-C00003.png) * | 1984-10-19 | 1990-11-13 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5119478A (en) * | 1974-08-09 | 1976-02-16 | Fujitsu Ltd | Handotaisochino seizohoho |
JPS5326692A (en) * | 1976-08-23 | 1978-03-11 | Ibm | Method of forming aluminum silicon conductor structure without projection |
-
1978
- 1978-11-20 JP JP14309278A patent/JPS5568653A/ja active Granted
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5119478A (en) * | 1974-08-09 | 1976-02-16 | Fujitsu Ltd | Handotaisochino seizohoho |
JPS5326692A (en) * | 1976-08-23 | 1978-03-11 | Ibm | Method of forming aluminum silicon conductor structure without projection |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0242486Y2 (US20030199744A1-20031023-C00003.png) * | 1984-10-19 | 1990-11-13 | ||
JPS6378817A (ja) * | 1986-09-20 | 1988-04-08 | Ota Sheet:Kk | 幌支持用フレ−ム |
JPH02103862U (US20030199744A1-20031023-C00003.png) * | 1989-02-03 | 1990-08-17 |
Also Published As
Publication number | Publication date |
---|---|
JPS5568653A (en) | 1980-05-23 |
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