JPS61250163A - 多層薄膜の製造方法および装置 - Google Patents
多層薄膜の製造方法および装置Info
- Publication number
- JPS61250163A JPS61250163A JP8886985A JP8886985A JPS61250163A JP S61250163 A JPS61250163 A JP S61250163A JP 8886985 A JP8886985 A JP 8886985A JP 8886985 A JP8886985 A JP 8886985A JP S61250163 A JPS61250163 A JP S61250163A
- Authority
- JP
- Japan
- Prior art keywords
- substrate holder
- holder electrode
- target material
- substrate
- sputtering
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000010409 thin film Substances 0.000 title claims abstract description 36
- 238000000034 method Methods 0.000 title claims abstract description 25
- 238000004519 manufacturing process Methods 0.000 title claims description 20
- 239000000758 substrate Substances 0.000 claims abstract description 87
- 239000010408 film Substances 0.000 claims abstract description 64
- 238000004544 sputter deposition Methods 0.000 claims abstract description 40
- 239000000463 material Substances 0.000 claims abstract description 13
- 239000013077 target material Substances 0.000 claims description 39
- 238000001514 detection method Methods 0.000 claims description 7
- 238000012937 correction Methods 0.000 claims description 6
- 230000008020 evaporation Effects 0.000 claims description 2
- 238000001704 evaporation Methods 0.000 claims description 2
- 239000010410 layer Substances 0.000 description 23
- 238000009826 distribution Methods 0.000 description 21
- 238000010586 diagram Methods 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 238000007796 conventional method Methods 0.000 description 2
- 238000010894 electron beam technology Methods 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 230000000737 periodic effect Effects 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229910000555 a15 phase Inorganic materials 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 238000012552 review Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 230000001360 synchronised effect Effects 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8886985A JPS61250163A (ja) | 1985-04-26 | 1985-04-26 | 多層薄膜の製造方法および装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8886985A JPS61250163A (ja) | 1985-04-26 | 1985-04-26 | 多層薄膜の製造方法および装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61250163A true JPS61250163A (ja) | 1986-11-07 |
| JPH0156141B2 JPH0156141B2 (enrdf_load_stackoverflow) | 1989-11-29 |
Family
ID=13955015
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8886985A Granted JPS61250163A (ja) | 1985-04-26 | 1985-04-26 | 多層薄膜の製造方法および装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61250163A (enrdf_load_stackoverflow) |
Cited By (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63274756A (ja) * | 1987-04-28 | 1988-11-11 | Toda Kogyo Corp | 真空蒸着多層薄膜形成装置 |
| JPS63274761A (ja) * | 1987-04-28 | 1988-11-11 | Toda Kogyo Corp | 真空蒸着多層薄膜形成装置 |
| JPH01123065A (ja) * | 1987-11-05 | 1989-05-16 | Fuji Electric Co Ltd | 薄膜形成装置 |
| JPH01301851A (ja) * | 1988-05-30 | 1989-12-06 | Sanyo Shinku Kogyo Kk | スパッタリングによる透明導電膜の製造装置 |
| JPH02107757A (ja) * | 1988-10-15 | 1990-04-19 | Koji Hashimoto | アモルファス超格子合金の作製法 |
| JP2006150160A (ja) * | 2004-11-25 | 2006-06-15 | Hosokawa Funtai Gijutsu Kenkyusho:Kk | 粉体膜形成装置 |
| JP2006219753A (ja) * | 2005-02-14 | 2006-08-24 | Shincron:Kk | 薄膜形成装置 |
| JP2008257239A (ja) * | 2008-03-31 | 2008-10-23 | Hoya Corp | 位相シフトマスクブランクの製造方法、及び位相シフトマスクブランクの製造装置 |
| WO2010073711A1 (ja) * | 2008-12-26 | 2010-07-01 | キヤノンアネルバ株式会社 | スパッタリング装置、スパッタリング方法及び電子デバイスの製造方法 |
| US8012314B2 (en) | 2000-09-12 | 2011-09-06 | Hoya Corporation | Manufacturing method and apparatus of phase shift mask blank |
| WO2017110464A1 (ja) * | 2015-12-24 | 2017-06-29 | コニカミノルタ株式会社 | 成膜装置および成膜方法 |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0737667B2 (ja) * | 1990-01-25 | 1995-04-26 | 工業技術院長 | 薄膜堆積方法 |
| JP4521606B2 (ja) * | 2000-02-29 | 2010-08-11 | 株式会社昭和真空 | 薄膜製造装置に於ける膜厚分布制御方法及びその装置 |
| EP3626281A4 (en) | 2017-05-17 | 2020-06-03 | Asahi Kasei Medical Co., Ltd. | PHOSPHORADIC SORTS FOR BLOOD TREATMENT, BLOOD TREATMENT SYSTEM AND BLOOD TREATMENT METHOD |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4912838A (enrdf_load_stackoverflow) * | 1972-05-15 | 1974-02-04 |
-
1985
- 1985-04-26 JP JP8886985A patent/JPS61250163A/ja active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4912838A (enrdf_load_stackoverflow) * | 1972-05-15 | 1974-02-04 |
Cited By (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63274761A (ja) * | 1987-04-28 | 1988-11-11 | Toda Kogyo Corp | 真空蒸着多層薄膜形成装置 |
| JPS63274756A (ja) * | 1987-04-28 | 1988-11-11 | Toda Kogyo Corp | 真空蒸着多層薄膜形成装置 |
| JPH01123065A (ja) * | 1987-11-05 | 1989-05-16 | Fuji Electric Co Ltd | 薄膜形成装置 |
| JPH01301851A (ja) * | 1988-05-30 | 1989-12-06 | Sanyo Shinku Kogyo Kk | スパッタリングによる透明導電膜の製造装置 |
| JPH02107757A (ja) * | 1988-10-15 | 1990-04-19 | Koji Hashimoto | アモルファス超格子合金の作製法 |
| US8012314B2 (en) | 2000-09-12 | 2011-09-06 | Hoya Corporation | Manufacturing method and apparatus of phase shift mask blank |
| JP2006150160A (ja) * | 2004-11-25 | 2006-06-15 | Hosokawa Funtai Gijutsu Kenkyusho:Kk | 粉体膜形成装置 |
| JP2006219753A (ja) * | 2005-02-14 | 2006-08-24 | Shincron:Kk | 薄膜形成装置 |
| JP2008257239A (ja) * | 2008-03-31 | 2008-10-23 | Hoya Corp | 位相シフトマスクブランクの製造方法、及び位相シフトマスクブランクの製造装置 |
| WO2010073711A1 (ja) * | 2008-12-26 | 2010-07-01 | キヤノンアネルバ株式会社 | スパッタリング装置、スパッタリング方法及び電子デバイスの製造方法 |
| JP2011149104A (ja) * | 2008-12-26 | 2011-08-04 | Canon Anelva Corp | スパッタリング装置、スパッタリング方法及び電子デバイスの製造方法 |
| JP4739464B2 (ja) * | 2008-12-26 | 2011-08-03 | キヤノンアネルバ株式会社 | スパッタリング装置、スパッタリング方法及び電子デバイスの製造方法 |
| CN102227514A (zh) * | 2008-12-26 | 2011-10-26 | 佳能安内华股份有限公司 | 溅射装置、溅射方法和电子器件制造方法 |
| US8906208B2 (en) | 2008-12-26 | 2014-12-09 | Canon Anelva Corporation | Sputtering apparatus, sputtering method, and electronic device manufacturing method |
| WO2017110464A1 (ja) * | 2015-12-24 | 2017-06-29 | コニカミノルタ株式会社 | 成膜装置および成膜方法 |
| JPWO2017110464A1 (ja) * | 2015-12-24 | 2018-10-18 | コニカミノルタ株式会社 | 成膜装置および成膜方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0156141B2 (enrdf_load_stackoverflow) | 1989-11-29 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |