JPS61250032A - シラノ−ルオリゴマ−液の製造法 - Google Patents
シラノ−ルオリゴマ−液の製造法Info
- Publication number
- JPS61250032A JPS61250032A JP9112485A JP9112485A JPS61250032A JP S61250032 A JPS61250032 A JP S61250032A JP 9112485 A JP9112485 A JP 9112485A JP 9112485 A JP9112485 A JP 9112485A JP S61250032 A JPS61250032 A JP S61250032A
- Authority
- JP
- Japan
- Prior art keywords
- solvent
- silanol
- oligomer liquid
- liquid
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000007788 liquid Substances 0.000 title claims abstract description 18
- SCPYDCQAZCOKTP-UHFFFAOYSA-N silanol Chemical compound [SiH3]O SCPYDCQAZCOKTP-UHFFFAOYSA-N 0.000 title claims description 13
- 239000002904 solvent Substances 0.000 claims abstract description 23
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 claims abstract description 22
- XPDGHGYGTJOTBC-UHFFFAOYSA-N methoxy(methyl)silicon Chemical compound CO[Si]C XPDGHGYGTJOTBC-UHFFFAOYSA-N 0.000 claims abstract description 10
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 6
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 claims abstract description 5
- 150000001408 amides Chemical class 0.000 claims abstract description 4
- 239000003054 catalyst Substances 0.000 claims abstract description 4
- -1 methanol ester Chemical class 0.000 claims abstract description 3
- 238000004519 manufacturing process Methods 0.000 claims description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract description 26
- 239000000377 silicon dioxide Substances 0.000 abstract description 13
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 abstract description 12
- 238000009833 condensation Methods 0.000 abstract description 5
- 230000005494 condensation Effects 0.000 abstract description 5
- 239000011521 glass Substances 0.000 abstract description 3
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 abstract description 2
- 230000003301 hydrolyzing effect Effects 0.000 abstract 2
- 229920001296 polysiloxane Polymers 0.000 abstract 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 8
- 125000003545 alkoxy group Chemical group 0.000 description 7
- 238000006243 chemical reaction Methods 0.000 description 5
- 239000011248 coating agent Substances 0.000 description 5
- 238000000576 coating method Methods 0.000 description 5
- 150000004756 silanes Chemical class 0.000 description 5
- 239000000758 substrate Substances 0.000 description 5
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical group [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 4
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 4
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 4
- 238000006460 hydrolysis reaction Methods 0.000 description 4
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 235000019441 ethanol Nutrition 0.000 description 3
- 238000010304 firing Methods 0.000 description 3
- 230000007062 hydrolysis Effects 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 239000000843 powder Substances 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 2
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 2
- 239000004327 boric acid Substances 0.000 description 2
- 125000004432 carbon atom Chemical group C* 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 229910000039 hydrogen halide Inorganic materials 0.000 description 2
- 239000012433 hydrogen halide Substances 0.000 description 2
- 230000001771 impaired effect Effects 0.000 description 2
- ARYZCSRUUPFYMY-UHFFFAOYSA-N methoxysilane Chemical compound CO[SiH3] ARYZCSRUUPFYMY-UHFFFAOYSA-N 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 2
- 150000004819 silanols Chemical class 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- DLYUQMMRRRQYAE-UHFFFAOYSA-N tetraphosphorus decaoxide Chemical compound O1P(O2)(=O)OP3(=O)OP1(=O)OP2(=O)O3 DLYUQMMRRRQYAE-UHFFFAOYSA-N 0.000 description 2
- 238000000862 absorption spectrum Methods 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 230000001476 alcoholic effect Effects 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 229910052810 boron oxide Inorganic materials 0.000 description 1
- 238000001354 calcination Methods 0.000 description 1
- 239000007809 chemical reaction catalyst Substances 0.000 description 1
- 239000000306 component Substances 0.000 description 1
- 238000007334 copolymerization reaction Methods 0.000 description 1
- JKWMSGQKBLHBQQ-UHFFFAOYSA-N diboron trioxide Chemical compound O=BOB=O JKWMSGQKBLHBQQ-UHFFFAOYSA-N 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000008030 elimination Effects 0.000 description 1
- 238000003379 elimination reaction Methods 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 210000004709 eyebrow Anatomy 0.000 description 1
- 238000004817 gas chromatography Methods 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 230000015654 memory Effects 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 150000007522 mineralic acids Chemical class 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 125000005372 silanol group Chemical group 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 1
- ZUEKXCXHTXJYAR-UHFFFAOYSA-N tetrapropan-2-yl silicate Chemical compound CC(C)O[Si](OC(C)C)(OC(C)C)OC(C)C ZUEKXCXHTXJYAR-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/28—Surface treatment of glass, not in the form of fibres or filaments, by coating with organic material
- C03C17/30—Surface treatment of glass, not in the form of fibres or filaments, by coating with organic material with silicon-containing compounds
Landscapes
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Paints Or Removers (AREA)
- Silicon Polymers (AREA)
- Formation Of Insulating Films (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9112485A JPS61250032A (ja) | 1985-04-30 | 1985-04-30 | シラノ−ルオリゴマ−液の製造法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9112485A JPS61250032A (ja) | 1985-04-30 | 1985-04-30 | シラノ−ルオリゴマ−液の製造法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61250032A true JPS61250032A (ja) | 1986-11-07 |
| JPS6346095B2 JPS6346095B2 (enrdf_load_html_response) | 1988-09-13 |
Family
ID=14017773
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9112485A Granted JPS61250032A (ja) | 1985-04-30 | 1985-04-30 | シラノ−ルオリゴマ−液の製造法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61250032A (enrdf_load_html_response) |
Cited By (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62230828A (ja) * | 1985-12-17 | 1987-10-09 | Sumitomo Chem Co Ltd | 半導体用絶縁膜形成塗布液 |
| JPH0366730A (ja) * | 1989-07-28 | 1991-03-22 | Dow Corning Corp | シラン加水分解物溶液並びにその調製方法及び使用方法 |
| JPH03221577A (ja) * | 1990-01-26 | 1991-09-30 | Sumitomo Chem Co Ltd | 絶縁膜形成用塗布液 |
| WO1992021632A3 (en) * | 1991-05-31 | 1993-04-01 | Minnesota Mining & Mfg | Method for treating fluoroaluminosilicate glass |
| WO1996009993A1 (de) * | 1994-09-27 | 1996-04-04 | Metallgesellschaft Aktiengesellschaft | Mischung zum behandeln von siliciumhaltigen substraten |
| US5874367A (en) * | 1992-07-04 | 1999-02-23 | Trikon Technologies Limited | Method of treating a semi-conductor wafer |
| WO2016104765A1 (ja) * | 2014-12-26 | 2016-06-30 | 日東電工株式会社 | 塗料およびその製造方法 |
| JP2017025277A (ja) * | 2014-12-26 | 2017-02-02 | 日東電工株式会社 | 塗料およびその製造方法 |
| JP2017061641A (ja) * | 2015-09-25 | 2017-03-30 | 日本ペイント・オートモーティブコーティングス株式会社 | カチオン電着塗料組成物 |
| CN107011763A (zh) * | 2015-12-08 | 2017-08-04 | 赢创德固赛有限公司 | 含[3‑(2,3‑二羟基丙‑1‑氧基)丙基]硅醇低聚物的含水组合物、制备法及用途 |
| US10472483B2 (en) | 2014-12-26 | 2019-11-12 | Nitto Denko Corporation | Silicone porous body and method of producing the same |
| US11460610B2 (en) | 2015-07-31 | 2022-10-04 | Nitto Denko Corporation | Optical laminate, method of producing optical laminate, optical element, and image display |
| US11505667B2 (en) | 2014-12-26 | 2022-11-22 | Nitto Denko Corporation | Laminated film roll and method of producing the same |
| US11524481B2 (en) | 2015-09-07 | 2022-12-13 | Nitto Denko Corporation | Low refractive index layer, laminated film, method for producing low refractive index layer, method for producing laminated film, optical element, and image display device |
| US11536877B2 (en) | 2015-08-24 | 2022-12-27 | Nitto Denko Corporation | Laminated optical film, method of producing laminated optical film, optical element, and image display |
| US11618807B2 (en) | 2014-12-26 | 2023-04-04 | Nitto Denko Corporation | Film with void spaces bonded through catalysis and method of producing the same |
| US11674004B2 (en) | 2015-07-31 | 2023-06-13 | Nitto Denko Corporation | Laminated film, optical element, and image display |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5739659A (en) * | 1980-08-21 | 1982-03-04 | Nec Corp | Calling out system for private branch of exchanger |
| JPS58171455A (ja) * | 1982-03-16 | 1983-10-08 | アンステイテユ・ナシヨナル・ド・ルシエルシエ・シミク・アプリケ | 固体表面上で透明被覆またはワニスを作るのに好適な基礎液体組成物 |
| JPS58179232A (ja) * | 1973-10-11 | 1983-10-20 | ゼネラル・エレクトリツク・カンパニイ | 線状ポリシロキサンの製法 |
-
1985
- 1985-04-30 JP JP9112485A patent/JPS61250032A/ja active Granted
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58179232A (ja) * | 1973-10-11 | 1983-10-20 | ゼネラル・エレクトリツク・カンパニイ | 線状ポリシロキサンの製法 |
| JPS5739659A (en) * | 1980-08-21 | 1982-03-04 | Nec Corp | Calling out system for private branch of exchanger |
| JPS58171455A (ja) * | 1982-03-16 | 1983-10-08 | アンステイテユ・ナシヨナル・ド・ルシエルシエ・シミク・アプリケ | 固体表面上で透明被覆またはワニスを作るのに好適な基礎液体組成物 |
Cited By (23)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62230828A (ja) * | 1985-12-17 | 1987-10-09 | Sumitomo Chem Co Ltd | 半導体用絶縁膜形成塗布液 |
| JPH0366730A (ja) * | 1989-07-28 | 1991-03-22 | Dow Corning Corp | シラン加水分解物溶液並びにその調製方法及び使用方法 |
| JPH03221577A (ja) * | 1990-01-26 | 1991-09-30 | Sumitomo Chem Co Ltd | 絶縁膜形成用塗布液 |
| WO1992021632A3 (en) * | 1991-05-31 | 1993-04-01 | Minnesota Mining & Mfg | Method for treating fluoroaluminosilicate glass |
| US5874367A (en) * | 1992-07-04 | 1999-02-23 | Trikon Technologies Limited | Method of treating a semi-conductor wafer |
| US6287989B1 (en) | 1992-07-04 | 2001-09-11 | Trikon Technologies Limited | Method of treating a semiconductor wafer in a chamber using hydrogen peroxide and silicon containing gas or vapor |
| WO1996009993A1 (de) * | 1994-09-27 | 1996-04-04 | Metallgesellschaft Aktiengesellschaft | Mischung zum behandeln von siliciumhaltigen substraten |
| BE1008724A3 (nl) * | 1994-09-27 | 1996-07-02 | Couttenier Andre | Samenstelling voor het beschermen en waterafstotend maken van een siliciumhoudend substraat. |
| JPH10506144A (ja) * | 1994-09-27 | 1998-06-16 | メタルゲゼルシャフト・アクチエンゲゼルシャフト | ケイ素含有基体を処理するための混合物 |
| JP2017025277A (ja) * | 2014-12-26 | 2017-02-02 | 日東電工株式会社 | 塗料およびその製造方法 |
| WO2016104765A1 (ja) * | 2014-12-26 | 2016-06-30 | 日東電工株式会社 | 塗料およびその製造方法 |
| US11618807B2 (en) | 2014-12-26 | 2023-04-04 | Nitto Denko Corporation | Film with void spaces bonded through catalysis and method of producing the same |
| US10472483B2 (en) | 2014-12-26 | 2019-11-12 | Nitto Denko Corporation | Silicone porous body and method of producing the same |
| US10494546B2 (en) | 2014-12-26 | 2019-12-03 | Nitto Denko Corporation | Coating material and method of producing the same |
| US10815355B2 (en) | 2014-12-26 | 2020-10-27 | Nitto Denko Corporation | Silicone porous body and method of producing the same |
| US11505667B2 (en) | 2014-12-26 | 2022-11-22 | Nitto Denko Corporation | Laminated film roll and method of producing the same |
| US11674004B2 (en) | 2015-07-31 | 2023-06-13 | Nitto Denko Corporation | Laminated film, optical element, and image display |
| US11460610B2 (en) | 2015-07-31 | 2022-10-04 | Nitto Denko Corporation | Optical laminate, method of producing optical laminate, optical element, and image display |
| US11536877B2 (en) | 2015-08-24 | 2022-12-27 | Nitto Denko Corporation | Laminated optical film, method of producing laminated optical film, optical element, and image display |
| US11524481B2 (en) | 2015-09-07 | 2022-12-13 | Nitto Denko Corporation | Low refractive index layer, laminated film, method for producing low refractive index layer, method for producing laminated film, optical element, and image display device |
| JP2017061641A (ja) * | 2015-09-25 | 2017-03-30 | 日本ペイント・オートモーティブコーティングス株式会社 | カチオン電着塗料組成物 |
| CN107011763B (zh) * | 2015-12-08 | 2022-09-02 | 赢创运营有限公司 | 含[3-(2,3-二羟基丙-1-氧基)丙基]硅醇低聚物的含水组合物、制备法及用途 |
| CN107011763A (zh) * | 2015-12-08 | 2017-08-04 | 赢创德固赛有限公司 | 含[3‑(2,3‑二羟基丙‑1‑氧基)丙基]硅醇低聚物的含水组合物、制备法及用途 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6346095B2 (enrdf_load_html_response) | 1988-09-13 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPS61250032A (ja) | シラノ−ルオリゴマ−液の製造法 | |
| US6361871B1 (en) | Composition of organofluorine-functional silanes and/or siloxanes, process for preparing it and its use | |
| JPH021778A (ja) | 半導体の表面保護又は層間絶縁用酸化物被膜形成用塗布液および酸化物被膜の製造法 | |
| US20010024685A1 (en) | Method for forming a protective coating and substrates coated with the same | |
| JP4518421B2 (ja) | 低いｋ誘電性フィルムの製造方法 | |
| JP5640310B2 (ja) | 組成物、反射防止膜基板、並びに、太陽電池システム | |
| JP2621760B2 (ja) | コーティング用組成物 | |
| US5271768A (en) | Coating for forming an oxide coating | |
| JP3208040B2 (ja) | シリカ系被膜形成用塗布液および被膜付基材 | |
| JPH03287627A (ja) | ポリシロキサン | |
| JPH1112542A (ja) | シリカ系被膜形成用塗布液、シリカ系被膜及びそれを用いた半導体装置 | |
| JP2001040094A (ja) | エポキシ基含有シリコーン樹脂 | |
| JPH05214296A (ja) | 酸化物被膜形成用塗布液および酸化物被膜の製造法 | |
| JPH06293879A (ja) | 酸化物被膜形成用塗布液および酸化物被膜の製造法 | |
| JPH07173434A (ja) | 酸化物被膜形成用塗布液および酸化物被膜の製造法 | |
| JP2001262062A (ja) | シリカ系被膜形成用塗布液、シリカ系被膜の製造法、シリカ系被膜、これを用いた半導体素子及び多層配線板 | |
| JP2000336312A (ja) | シリカ系被膜形成用塗布液、シリカ系被膜の製造法及び半導体装置 | |
| JPH1112540A (ja) | シリカ系被膜形成用塗布液、シリカ系被膜及びそれを用いた半導体装置 | |
| JP3341463B2 (ja) | 硬化性組成物 | |
| ES2267119T3 (es) | Procedimiento para la fabricacion de revestimientos sobre substratos y un material de revestimiento correspondiente. | |
| JP2890893B2 (ja) | シリカ系被膜形成用塗布液 | |
| KR100315629B1 (ko) | 실리카계 바인더 및 그의 제조 방법 | |
| JPS6155164A (ja) | シリカ被膜の形成方法 | |
| JPH06172709A (ja) | 酸化物被膜形成用塗布液および酸化物被膜の製造法 | |
| JPS63159801A (ja) | 反射防止ガラスおよびその製造方法 |