JPS6124815B2 - - Google Patents
Info
- Publication number
- JPS6124815B2 JPS6124815B2 JP52091077A JP9107777A JPS6124815B2 JP S6124815 B2 JPS6124815 B2 JP S6124815B2 JP 52091077 A JP52091077 A JP 52091077A JP 9107777 A JP9107777 A JP 9107777A JP S6124815 B2 JPS6124815 B2 JP S6124815B2
- Authority
- JP
- Japan
- Prior art keywords
- patterns
- charged particle
- pattern
- exposure
- exposure amount
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Electron Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9107777A JPS5425596A (en) | 1977-07-29 | 1977-07-29 | Method of projecting charged particle beam |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9107777A JPS5425596A (en) | 1977-07-29 | 1977-07-29 | Method of projecting charged particle beam |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5425596A JPS5425596A (en) | 1979-02-26 |
| JPS6124815B2 true JPS6124815B2 (enExample) | 1986-06-12 |
Family
ID=14016435
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9107777A Granted JPS5425596A (en) | 1977-07-29 | 1977-07-29 | Method of projecting charged particle beam |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5425596A (enExample) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS54105971A (en) * | 1978-02-07 | 1979-08-20 | Jeol Ltd | Electron beam exposure method |
| EP0053225B1 (en) * | 1980-11-28 | 1985-03-13 | International Business Machines Corporation | Electron beam system and method |
| JPS62206829A (ja) * | 1986-03-06 | 1987-09-11 | Nec Corp | 荷電粒子線描画装置 |
| JPH0330313A (ja) * | 1989-06-27 | 1991-02-08 | Matsushita Electric Ind Co Ltd | 微細パターン形成方法 |
| US9460260B2 (en) * | 2014-02-21 | 2016-10-04 | Mapper Lithography Ip B.V. | Enhanced stitching by overlap dose and feature reduction |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5424833A (en) * | 1977-07-26 | 1979-02-24 | Mitsubishi Chem Ind Ltd | Polyoxyethylene glycol complex of rare earth element |
-
1977
- 1977-07-29 JP JP9107777A patent/JPS5425596A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5425596A (en) | 1979-02-26 |
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