JPS5425596A - Method of projecting charged particle beam - Google Patents

Method of projecting charged particle beam

Info

Publication number
JPS5425596A
JPS5425596A JP9107777A JP9107777A JPS5425596A JP S5425596 A JPS5425596 A JP S5425596A JP 9107777 A JP9107777 A JP 9107777A JP 9107777 A JP9107777 A JP 9107777A JP S5425596 A JPS5425596 A JP S5425596A
Authority
JP
Japan
Prior art keywords
charged particle
particle beam
projecting charged
projecting
particle
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP9107777A
Other languages
Japanese (ja)
Other versions
JPS6124815B2 (en
Inventor
Masanori Idesawa
Hidekazu Gotou
Takashi Souma
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
RIKEN Institute of Physical and Chemical Research
Original Assignee
RIKEN Institute of Physical and Chemical Research
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by RIKEN Institute of Physical and Chemical Research filed Critical RIKEN Institute of Physical and Chemical Research
Priority to JP9107777A priority Critical patent/JPS5425596A/en
Publication of JPS5425596A publication Critical patent/JPS5425596A/en
Publication of JPS6124815B2 publication Critical patent/JPS6124815B2/ja
Granted legal-status Critical Current

Links

JP9107777A 1977-07-29 1977-07-29 Method of projecting charged particle beam Granted JPS5425596A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9107777A JPS5425596A (en) 1977-07-29 1977-07-29 Method of projecting charged particle beam

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9107777A JPS5425596A (en) 1977-07-29 1977-07-29 Method of projecting charged particle beam

Publications (2)

Publication Number Publication Date
JPS5425596A true JPS5425596A (en) 1979-02-26
JPS6124815B2 JPS6124815B2 (en) 1986-06-12

Family

ID=14016435

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9107777A Granted JPS5425596A (en) 1977-07-29 1977-07-29 Method of projecting charged particle beam

Country Status (1)

Country Link
JP (1) JPS5425596A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54105971A (en) * 1978-02-07 1979-08-20 Jeol Ltd Electron beam exposure method
JPS5793528A (en) * 1980-11-28 1982-06-10 Ibm Electron beam device
JPS62206829A (en) * 1986-03-06 1987-09-11 Nec Corp Charged-particle beam lithography device
JPH0330313A (en) * 1989-06-27 1991-02-08 Matsushita Electric Ind Co Ltd Fine pattern formation
JP2017506435A (en) * 2014-02-21 2017-03-02 マッパー・リソグラフィー・アイピー・ビー．ブイ． Improved stitching by overlapping dose and feature reduction

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5424833A (en) * 1977-07-26 1979-02-24 Mitsubishi Chem Ind Ltd Polyoxyethylene glycol complex of rare earth element

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5424833A (en) * 1977-07-26 1979-02-24 Mitsubishi Chem Ind Ltd Polyoxyethylene glycol complex of rare earth element

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS54105971A (en) * 1978-02-07 1979-08-20 Jeol Ltd Electron beam exposure method
JPS5619094B2 (en) * 1978-02-07 1981-05-06
JPS5793528A (en) * 1980-11-28 1982-06-10 Ibm Electron beam device
JPS62206829A (en) * 1986-03-06 1987-09-11 Nec Corp Charged-particle beam lithography device
JPH0330313A (en) * 1989-06-27 1991-02-08 Matsushita Electric Ind Co Ltd Fine pattern formation
JP2017506435A (en) * 2014-02-21 2017-03-02 マッパー・リソグラフィー・アイピー・ビー．ブイ． Improved stitching by overlapping dose and feature reduction

Also Published As

Publication number Publication date
JPS6124815B2 (en) 1986-06-12

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