JPS53148980A - Method of projecting charged particle beam - Google Patents

Method of projecting charged particle beam

Info

Publication number
JPS53148980A
JPS53148980A JP6387377A JP6387377A JPS53148980A JP S53148980 A JPS53148980 A JP S53148980A JP 6387377 A JP6387377 A JP 6387377A JP 6387377 A JP6387377 A JP 6387377A JP S53148980 A JPS53148980 A JP S53148980A
Authority
JP
Japan
Prior art keywords
charged particle
particle beam
projecting charged
projecting
particle
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6387377A
Other languages
Japanese (ja)
Other versions
JPS5424830B2 (en
Inventor
Hidekazu Gotou
Masanori Idesawa
Tateaki Sasaki
Takashi Souma
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
RIKEN Institute of Physical and Chemical Research
Original Assignee
RIKEN Institute of Physical and Chemical Research
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by RIKEN Institute of Physical and Chemical Research filed Critical RIKEN Institute of Physical and Chemical Research
Priority to JP6387377A priority Critical patent/JPS53148980A/en
Priority to US05/909,217 priority patent/US4182958A/en
Priority to GB22798/78A priority patent/GB1605087A/en
Priority to FR7816064A priority patent/FR2393418B1/en
Priority to DE2823829A priority patent/DE2823829C2/en
Publication of JPS53148980A publication Critical patent/JPS53148980A/en
Publication of JPS5424830B2 publication Critical patent/JPS5424830B2/ja
Granted legal-status Critical Current

Links

JP6387377A 1977-05-31 1977-05-31 Method of projecting charged particle beam Granted JPS53148980A (en)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP6387377A JPS53148980A (en) 1977-05-31 1977-05-31 Method of projecting charged particle beam
US05/909,217 US4182958A (en) 1977-05-31 1978-05-25 Method and apparatus for projecting a beam of electrically charged particles
GB22798/78A GB1605087A (en) 1977-05-31 1978-05-25 Method for shaping a beam of electrically charged particles
FR7816064A FR2393418B1 (en) 1977-05-31 1978-05-30 METHOD AND APPARATUS FOR PROJECTING AN ELECTRICIZED PARTICLE BEAM ON A TARGET
DE2823829A DE2823829C2 (en) 1977-05-31 1978-05-31 Method and device for changing the beam cross-section of a beam of electrically charged particles

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6387377A JPS53148980A (en) 1977-05-31 1977-05-31 Method of projecting charged particle beam

Publications (2)

Publication Number Publication Date
JPS53148980A true JPS53148980A (en) 1978-12-26
JPS5424830B2 JPS5424830B2 (en) 1979-08-23

Family

ID=13241842

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6387377A Granted JPS53148980A (en) 1977-05-31 1977-05-31 Method of projecting charged particle beam

Country Status (1)

Country Link
JP (1) JPS53148980A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55165633A (en) * 1979-06-11 1980-12-24 Jeol Ltd Apparatus for electron-beam exposure
JPS58106828A (en) * 1981-12-18 1983-06-25 Fujitsu Ltd Electron beam exposure method
JPH01117325A (en) * 1987-10-30 1989-05-10 Hitachi Ltd Electron beam lithography device

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52143776A (en) * 1976-05-26 1977-11-30 Toshiba Corp Electron beam exposure apparatus

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52143776A (en) * 1976-05-26 1977-11-30 Toshiba Corp Electron beam exposure apparatus

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55165633A (en) * 1979-06-11 1980-12-24 Jeol Ltd Apparatus for electron-beam exposure
JPS5741811B2 (en) * 1979-06-11 1982-09-04
JPS58106828A (en) * 1981-12-18 1983-06-25 Fujitsu Ltd Electron beam exposure method
JPH01117325A (en) * 1987-10-30 1989-05-10 Hitachi Ltd Electron beam lithography device

Also Published As

Publication number Publication date
JPS5424830B2 (en) 1979-08-23

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