JPS55165633A - Apparatus for electron-beam exposure - Google Patents

Apparatus for electron-beam exposure

Info

Publication number
JPS55165633A
JPS55165633A JP7390079A JP7390079A JPS55165633A JP S55165633 A JPS55165633 A JP S55165633A JP 7390079 A JP7390079 A JP 7390079A JP 7390079 A JP7390079 A JP 7390079A JP S55165633 A JPS55165633 A JP S55165633A
Authority
JP
Japan
Prior art keywords
hole
blur
mask
rectangular
vicinity
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP7390079A
Other languages
Japanese (ja)
Other versions
JPS5741811B2 (en
Inventor
Hidekazu Goto
Takashi Soma
Masanori Idesawa
Sakae Miyauchi
Kazumitsu Tanaka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
RIKEN Institute of Physical and Chemical Research
Original Assignee
Jeol Ltd
Nihon Denshi KK
RIKEN Institute of Physical and Chemical Research
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jeol Ltd, Nihon Denshi KK, RIKEN Institute of Physical and Chemical Research filed Critical Jeol Ltd
Priority to JP7390079A priority Critical patent/JPS55165633A/en
Publication of JPS55165633A publication Critical patent/JPS55165633A/en
Publication of JPS5741811B2 publication Critical patent/JPS5741811B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/3002—Details
    • H01J37/3007—Electron or ion-optical systems

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)

Abstract

PURPOSE:To greatly decrease the blur in the peripheral portion caused by the first mask for a rectangular beam image; by providing a screening body which defines the electron beam passing through a hole in a mask plate, in the vicinity of or over the upper mask plate of two mask plates. CONSTITUTION:The main cause of the blur of a rectangular beam is the space- charge effect of the electron beam, and said effect is very high especially at the crossover point between masks 13 and 14. The blur is directly proportional to the beam current between the masks 13 and 14. While, the beam, whose shape and size are similar to those of a rectangular hole 14H of the mask 14, is not projected. The maximum pattern of the projection of the beam is such that one side is equal to the longer side of the hole 14H, and the other side is about 1/5 the side of the hole. Therefore, the hole 14H can be a rectangular hole whose ratio of the sides is 1:5. A screening body 15 is provided in the vicinity of the upper mask 13. The screening body 15 is moved as required to define the beam passing through the hole 13H, thereby the beam is projected through the hole 14H again. In this constitution, the beam current in the vicinity of the crossover point is greatly reduced, the blur is decreased, and extremely accurate lithography can be performed.
JP7390079A 1979-06-11 1979-06-11 Apparatus for electron-beam exposure Granted JPS55165633A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7390079A JPS55165633A (en) 1979-06-11 1979-06-11 Apparatus for electron-beam exposure

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7390079A JPS55165633A (en) 1979-06-11 1979-06-11 Apparatus for electron-beam exposure

Publications (2)

Publication Number Publication Date
JPS55165633A true JPS55165633A (en) 1980-12-24
JPS5741811B2 JPS5741811B2 (en) 1982-09-04

Family

ID=13531529

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7390079A Granted JPS55165633A (en) 1979-06-11 1979-06-11 Apparatus for electron-beam exposure

Country Status (1)

Country Link
JP (1) JPS55165633A (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60190716U (en) * 1984-05-25 1985-12-17 三ツ星ベルト株式会社 V-belt with ridges

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53148980A (en) * 1977-05-31 1978-12-26 Rikagaku Kenkyusho Method of projecting charged particle beam

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53148980A (en) * 1977-05-31 1978-12-26 Rikagaku Kenkyusho Method of projecting charged particle beam

Also Published As

Publication number Publication date
JPS5741811B2 (en) 1982-09-04

Similar Documents

Publication Publication Date Title
ATA140487A (en) ARRANGED MARKERS ON MARKERS ARRANGED ON A CARRIER
JPS5283177A (en) Electron beam exposure device
US6284415B1 (en) Charged-particle-beam transfer masks and methods of making
JPS5682552A (en) Two beam one electron gun cathode ray tube
US4136285A (en) Method for irradiating a specimen by corpuscular-beam radiation
JPS5834918A (en) Electron beam exposure
GB1328320A (en) Charged-particle beam-forming and imaging sytems
JPS52143776A (en) Electron beam exposure apparatus
JPS55165633A (en) Apparatus for electron-beam exposure
DE2446789A1 (en) BODY RAY OPTICAL DEVICE FOR BODY RADIATION OF A PREPARATION
JPS52119185A (en) Electron beam exposure equipment
JPH0226342B2 (en)
JPH0877957A (en) Charged particle projector
JPS55165634A (en) Device for exposure to electron beam
JPS63197333A (en) Pattern formation and device therefor
JPS51130222A (en) A process for producing an electron beam resist image
JPS52103966A (en) Deflection unit for charged particle ray exposure device
JPS5251874A (en) Electron beam exposure device
JPS5632726A (en) Method for electron beam lithography
JPS55120134A (en) Apparatus for electron-beam lithography
JPS5722240A (en) Photomask for proximity exposure
JPH04100208A (en) Device and method for making exposure with charged particle beam
JPS5353975A (en) Electronic beam exposure device
ES8103477A1 (en) Accelerated particle lithographic processing.
JPS5357759A (en) Diaphragm for electron beam exposure apparatus