JPS54105971A - Electron beam exposure method - Google Patents

Electron beam exposure method

Info

Publication number
JPS54105971A
JPS54105971A JP1281078A JP1281078A JPS54105971A JP S54105971 A JPS54105971 A JP S54105971A JP 1281078 A JP1281078 A JP 1281078A JP 1281078 A JP1281078 A JP 1281078A JP S54105971 A JPS54105971 A JP S54105971A
Authority
JP
Japan
Prior art keywords
electron beam
constitution
overlap
computer
vibrations
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1281078A
Other languages
Japanese (ja)
Other versions
JPS5619094B2 (en
Inventor
Tetsuo Yuasa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
Original Assignee
Jeol Ltd
Nihon Denshi KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jeol Ltd, Nihon Denshi KK filed Critical Jeol Ltd
Priority to JP1281078A priority Critical patent/JPS54105971A/en
Publication of JPS54105971A publication Critical patent/JPS54105971A/en
Publication of JPS5619094B2 publication Critical patent/JPS5619094B2/ja
Granted legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3174—Particle-beam lithography, e.g. electron beam lithography

Abstract

PURPOSE:To improve both the overlap and the connection for the patterns formed by projecting the electron beam of the desired cross-sectional form while giving the beam the vibrations in the fixed direction via the high frequency. CONSTITUTION:The electron beam given from electronic gun 2 is shaped into the desired cross-sectional form via mask 3 and then projected and image-formed on test sample 1 through electronic lens 4, deflector unit 5X of the X direction and deflector 5Y of the X direction each. In such constitution, the deflecting signals from computer 8 are applied to both unit 5X and 5Y via D-A converter 6X and 6Y plus additional amplifier 7X and 7Y each. In addition, the output given from high-frequency oscillator 9 is applied to amplifier 7X and 7Y via gate circuit 10X and 10Y which open and close by the signal sent from computer 8, thus giving vibrations to the electron beam on sample 1. In such way, both the overlap and connection can be facilitated for plural patterns with no expansion there.
JP1281078A 1978-02-07 1978-02-07 Electron beam exposure method Granted JPS54105971A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1281078A JPS54105971A (en) 1978-02-07 1978-02-07 Electron beam exposure method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1281078A JPS54105971A (en) 1978-02-07 1978-02-07 Electron beam exposure method

Publications (2)

Publication Number Publication Date
JPS54105971A true JPS54105971A (en) 1979-08-20
JPS5619094B2 JPS5619094B2 (en) 1981-05-06

Family

ID=11815736

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1281078A Granted JPS54105971A (en) 1978-02-07 1978-02-07 Electron beam exposure method

Country Status (1)

Country Link
JP (1) JPS54105971A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63196038A (en) * 1987-02-09 1988-08-15 Nec Corp Device and method of energy beam lithography

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50145865A (en) * 1974-04-18 1975-11-22
JPS5425596A (en) * 1977-07-29 1979-02-26 Rikagaku Kenkyusho Method of projecting charged particle beam

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50145865A (en) * 1974-04-18 1975-11-22
JPS5425596A (en) * 1977-07-29 1979-02-26 Rikagaku Kenkyusho Method of projecting charged particle beam

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63196038A (en) * 1987-02-09 1988-08-15 Nec Corp Device and method of energy beam lithography

Also Published As

Publication number Publication date
JPS5619094B2 (en) 1981-05-06

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