JPS5567136A - Method and device for controlling electron beam - Google Patents
Method and device for controlling electron beamInfo
- Publication number
- JPS5567136A JPS5567136A JP14012878A JP14012878A JPS5567136A JP S5567136 A JPS5567136 A JP S5567136A JP 14012878 A JP14012878 A JP 14012878A JP 14012878 A JP14012878 A JP 14012878A JP S5567136 A JPS5567136 A JP S5567136A
- Authority
- JP
- Japan
- Prior art keywords
- signal
- converter
- controller
- electron beam
- clock pulses
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/302—Controlling tubes by external information, e.g. programme control
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Beam Exposure (AREA)
Abstract
PURPOSE:To shorten the time of exposure to a beam, by obtaining a difference signal A(1-B) from a signal A for applying a reference frequency and a signal AB produced by multiplying the signal A by another B for applying a frequency compensation coefficient and by using clock pulses of frequency corresponding to the difference signal. CONSTITUTION:An electron beam control system comprises a digital controller 11, D-A converters 14, 15 of 12 bits and 8 bits respectively, a subtraction circuit 16, a V-F converter 17 and an electron beam controller 12. Control signals are applied from the controller 11 such as a digital computer to the converter 14 and the other 15 which is set with a compensation coefficient. A signal voltage A is supplied from the converter 14 to the other 15 so that the converter 15 produces a multiplied signal AB. The signals AB, A are applied to the circuit 16, which performs subtraction to generate a signal A(1-B). This signal is changed by the converter 17 into clock pulses of frequency corresponding to the signal. The clock pulses are supplied to the controller 12 to regulate the time of exposure to a beam.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14012878A JPS5567136A (en) | 1978-11-14 | 1978-11-14 | Method and device for controlling electron beam |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14012878A JPS5567136A (en) | 1978-11-14 | 1978-11-14 | Method and device for controlling electron beam |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5567136A true JPS5567136A (en) | 1980-05-21 |
Family
ID=15261541
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14012878A Pending JPS5567136A (en) | 1978-11-14 | 1978-11-14 | Method and device for controlling electron beam |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5567136A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS573726A (en) * | 1980-06-09 | 1982-01-09 | Sumitomo Electric Ind Ltd | Preparation of glass capillary |
| JPS62125617A (en) * | 1985-11-26 | 1987-06-06 | Toshiba Corp | Charged beam lithography method |
| JP2007001811A (en) * | 2005-06-24 | 2007-01-11 | Sumitomo Metal Ind Ltd | Method and apparatus for manufacturing quartz glass tube |
-
1978
- 1978-11-14 JP JP14012878A patent/JPS5567136A/en active Pending
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS573726A (en) * | 1980-06-09 | 1982-01-09 | Sumitomo Electric Ind Ltd | Preparation of glass capillary |
| JPS6323142B2 (en) * | 1980-06-09 | 1988-05-14 | Sumitomo Electric Industries | |
| JPS62125617A (en) * | 1985-11-26 | 1987-06-06 | Toshiba Corp | Charged beam lithography method |
| JP2007001811A (en) * | 2005-06-24 | 2007-01-11 | Sumitomo Metal Ind Ltd | Method and apparatus for manufacturing quartz glass tube |
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