JPS61237430A - 半導体蒸気乾燥洗浄用石英容器 - Google Patents

半導体蒸気乾燥洗浄用石英容器

Info

Publication number
JPS61237430A
JPS61237430A JP60078399A JP7839985A JPS61237430A JP S61237430 A JPS61237430 A JP S61237430A JP 60078399 A JP60078399 A JP 60078399A JP 7839985 A JP7839985 A JP 7839985A JP S61237430 A JPS61237430 A JP S61237430A
Authority
JP
Japan
Prior art keywords
cleaning
quartz container
quartz
vapor drying
container
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP60078399A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0515060B2 (https=
Inventor
Masaki Kusuhara
昌樹 楠原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Wakomu KK
Original Assignee
Wakomu KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Wakomu KK filed Critical Wakomu KK
Priority to JP60078399A priority Critical patent/JPS61237430A/ja
Priority to US06/821,545 priority patent/US4736758A/en
Priority to EP86101834A priority patent/EP0198169B1/en
Priority to AT86101834T priority patent/ATE75784T1/de
Priority to DE8686101834T priority patent/DE3685148D1/de
Publication of JPS61237430A publication Critical patent/JPS61237430A/ja
Priority to US07/108,555 priority patent/US4777970A/en
Publication of JPH0515060B2 publication Critical patent/JPH0515060B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0402—Apparatus for fluid treatment
    • H10P72/0406—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H10P72/0408—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for drying
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D12/00—Displacing liquid, e.g. from wet solids or from dispersions of liquids or from solids in liquids, by means of another liquid
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
    • C23G5/00—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents
    • C23G5/02—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents using organic solvents
    • C23G5/04—Apparatus
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F26—DRYING
    • F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
    • F26B21/00—Arrangements for supplying or controlling air or other gases for drying solid materials or objects
    • F26B21/40—Arrangements for supplying or controlling air or other gases for drying solid materials or objects using gases other than air
    • F26B21/471—Arrangements for supplying or controlling air or other gases for drying solid materials or objects using gases other than air condensing vapours onto the surface of the materials to be dried

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Engineering & Computer Science (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Dispersion Chemistry (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
JP60078399A 1985-04-15 1985-04-15 半導体蒸気乾燥洗浄用石英容器 Granted JPS61237430A (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP60078399A JPS61237430A (ja) 1985-04-15 1985-04-15 半導体蒸気乾燥洗浄用石英容器
US06/821,545 US4736758A (en) 1985-04-15 1986-01-21 Vapor drying apparatus
EP86101834A EP0198169B1 (en) 1985-04-15 1986-02-13 Vapor drying apparatus
AT86101834T ATE75784T1 (de) 1985-04-15 1986-02-13 Einrichtung zum dampftrocknen.
DE8686101834T DE3685148D1 (de) 1985-04-15 1986-02-13 Einrichtung zum dampftrocknen.
US07/108,555 US4777970A (en) 1985-04-15 1987-10-14 Vapor drying apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60078399A JPS61237430A (ja) 1985-04-15 1985-04-15 半導体蒸気乾燥洗浄用石英容器

Publications (2)

Publication Number Publication Date
JPS61237430A true JPS61237430A (ja) 1986-10-22
JPH0515060B2 JPH0515060B2 (https=) 1993-02-26

Family

ID=13660943

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60078399A Granted JPS61237430A (ja) 1985-04-15 1985-04-15 半導体蒸気乾燥洗浄用石英容器

Country Status (1)

Country Link
JP (1) JPS61237430A (https=)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63105329U (https=) * 1986-12-25 1988-07-08
US5431179A (en) * 1993-02-16 1995-07-11 Tokyo Electron Limited Wafer drying apparatus and fire-extinguishing method therefor
US5443540A (en) * 1992-12-25 1995-08-22 Tokyo Electron Limited Apparatus and method for drying substrates
JPH07312358A (ja) * 1995-01-31 1995-11-28 Sony Corp 洗浄装置
JP2012154599A (ja) * 2011-01-28 2012-08-16 Dainippon Screen Mfg Co Ltd 蒸気発生装置

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5420014A (en) * 1977-07-18 1979-02-15 Denki Kagaku Kogyo Kk Method of making molten silicate base container
JPS5617996A (en) * 1979-07-12 1981-02-20 Heraeus Schott Quarzschmelze Crucible for semiconductor art and manufacture thereof
JPS5910046U (ja) * 1982-07-12 1984-01-21 トヨタ自動車株式会社 シヤシダイナモメ−タ用車輪固定治具
JPS59189581A (ja) * 1983-04-11 1984-10-27 株式会社渡辺商行 可燃性液体加熱装置

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5420014A (en) * 1977-07-18 1979-02-15 Denki Kagaku Kogyo Kk Method of making molten silicate base container
JPS5617996A (en) * 1979-07-12 1981-02-20 Heraeus Schott Quarzschmelze Crucible for semiconductor art and manufacture thereof
JPS5910046U (ja) * 1982-07-12 1984-01-21 トヨタ自動車株式会社 シヤシダイナモメ−タ用車輪固定治具
JPS59189581A (ja) * 1983-04-11 1984-10-27 株式会社渡辺商行 可燃性液体加熱装置

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63105329U (https=) * 1986-12-25 1988-07-08
US5443540A (en) * 1992-12-25 1995-08-22 Tokyo Electron Limited Apparatus and method for drying substrates
US5431179A (en) * 1993-02-16 1995-07-11 Tokyo Electron Limited Wafer drying apparatus and fire-extinguishing method therefor
JPH07312358A (ja) * 1995-01-31 1995-11-28 Sony Corp 洗浄装置
JP2012154599A (ja) * 2011-01-28 2012-08-16 Dainippon Screen Mfg Co Ltd 蒸気発生装置

Also Published As

Publication number Publication date
JPH0515060B2 (https=) 1993-02-26

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