JPS61223836A - 感光性樹脂組成物および感光性樹脂組成物積層体 - Google Patents

感光性樹脂組成物および感光性樹脂組成物積層体

Info

Publication number
JPS61223836A
JPS61223836A JP6610685A JP6610685A JPS61223836A JP S61223836 A JPS61223836 A JP S61223836A JP 6610685 A JP6610685 A JP 6610685A JP 6610685 A JP6610685 A JP 6610685A JP S61223836 A JPS61223836 A JP S61223836A
Authority
JP
Japan
Prior art keywords
resin composition
photosensitive resin
group
compound
compd
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6610685A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0528827B2 (enrdf_load_stackoverflow
Inventor
Yoshitaka Minami
好隆 南
Hajime Kakumaru
肇 角丸
Kazutaka Masaoka
正岡 和隆
Hiromi Furubayashi
寛巳 古林
Hideo Nakasaki
中崎 日出夫
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Resonac Corp
Original Assignee
Hitachi Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd filed Critical Hitachi Chemical Co Ltd
Priority to JP6610685A priority Critical patent/JPS61223836A/ja
Publication of JPS61223836A publication Critical patent/JPS61223836A/ja
Publication of JPH0528827B2 publication Critical patent/JPH0528827B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/0073Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
    • H05K3/0076Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the composition of the mask

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Polymerisation Methods In General (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
JP6610685A 1985-03-29 1985-03-29 感光性樹脂組成物および感光性樹脂組成物積層体 Granted JPS61223836A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6610685A JPS61223836A (ja) 1985-03-29 1985-03-29 感光性樹脂組成物および感光性樹脂組成物積層体

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6610685A JPS61223836A (ja) 1985-03-29 1985-03-29 感光性樹脂組成物および感光性樹脂組成物積層体

Publications (2)

Publication Number Publication Date
JPS61223836A true JPS61223836A (ja) 1986-10-04
JPH0528827B2 JPH0528827B2 (enrdf_load_stackoverflow) 1993-04-27

Family

ID=13306305

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6610685A Granted JPS61223836A (ja) 1985-03-29 1985-03-29 感光性樹脂組成物および感光性樹脂組成物積層体

Country Status (1)

Country Link
JP (1) JPS61223836A (enrdf_load_stackoverflow)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0233148A (ja) * 1988-07-22 1990-02-02 Toyo Ink Mfg Co Ltd 感光性樹脂組成物
JPH0243552A (ja) * 1988-08-04 1990-02-14 Fuji Photo Film Co Ltd 光重合性組成物
JP2000347391A (ja) * 1999-03-29 2000-12-15 Hitachi Chem Co Ltd 感光性樹脂組成物、これを用いた感光性エレメント、レジストパターンの製造法及びプリント配線板の製造法
CN106918993A (zh) * 2015-10-26 2017-07-04 旭化成株式会社 感光性树脂组合物、感光性树脂层叠体以及保护图案形成方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61198146A (ja) * 1985-02-27 1986-09-02 Hitachi Chem Co Ltd 感光性樹脂組成物および感光性エレメント

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61198146A (ja) * 1985-02-27 1986-09-02 Hitachi Chem Co Ltd 感光性樹脂組成物および感光性エレメント

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0233148A (ja) * 1988-07-22 1990-02-02 Toyo Ink Mfg Co Ltd 感光性樹脂組成物
JPH0243552A (ja) * 1988-08-04 1990-02-14 Fuji Photo Film Co Ltd 光重合性組成物
JP2000347391A (ja) * 1999-03-29 2000-12-15 Hitachi Chem Co Ltd 感光性樹脂組成物、これを用いた感光性エレメント、レジストパターンの製造法及びプリント配線板の製造法
CN106918993A (zh) * 2015-10-26 2017-07-04 旭化成株式会社 感光性树脂组合物、感光性树脂层叠体以及保护图案形成方法

Also Published As

Publication number Publication date
JPH0528827B2 (enrdf_load_stackoverflow) 1993-04-27

Similar Documents

Publication Publication Date Title
US6228560B1 (en) Photosensitive resin composition and photosensitive element using the same
US4980266A (en) Photosensitive resin composition
JPS61223836A (ja) 感光性樹脂組成物および感光性樹脂組成物積層体
JP2677916B2 (ja) 感光性樹脂組成物及びこれを用いた感光性エレメント
JPS61272228A (ja) 光硬化性樹脂組成物
JPH0334056B2 (enrdf_load_stackoverflow)
JPS5824035B2 (ja) 感光性エレメント
JPS60225841A (ja) 感光性樹脂組成物
JPH01309050A (ja) 感光性樹脂組成物および感光性フイルム
JPS5948752A (ja) 感光性樹脂組成物
JPS60115626A (ja) 感光性樹脂組成物
JPH02311846A (ja) 感光性樹脂組成物及びこれを用いた感光性積層体
JPS61260237A (ja) 感光性樹脂組成物
JPH02191955A (ja) 感光性樹脂組成物及びこれを用いた感光性エレメント
JP3415688B2 (ja) 感光性樹脂組成物及びこれを用いた感光性フィルム
JPH10123714A (ja) 感光性樹脂組成物及び感光性フィルム
JP2003035953A (ja) 高密度・高解像度用の感光性樹脂組成物及びその用途
JPH0411856B2 (enrdf_load_stackoverflow)
JPH04172457A (ja) 感光性樹脂組成物及びこれを用いた積層体
JPH02302403A (ja) 感光性樹脂組成物及びこれを用いた感光性フイルム
JPH03122647A (ja) 感光性樹脂組成物およびこれを用いた感光性フイルム
KR100247705B1 (ko) 디아민 화합물을 함유하는 감광성 수지 조성물 및 이를 도포한 감광성 필름
JPS58163937A (ja) 感光性樹脂組成物
JPS6156341A (ja) 感光性樹脂組成物
JPS61198146A (ja) 感光性樹脂組成物および感光性エレメント

Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term