JPH0334056B2 - - Google Patents

Info

Publication number
JPH0334056B2
JPH0334056B2 JP56201841A JP20184181A JPH0334056B2 JP H0334056 B2 JPH0334056 B2 JP H0334056B2 JP 56201841 A JP56201841 A JP 56201841A JP 20184181 A JP20184181 A JP 20184181A JP H0334056 B2 JPH0334056 B2 JP H0334056B2
Authority
JP
Japan
Prior art keywords
resin composition
photosensitive resin
film
polymer
weight
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP56201841A
Other languages
English (en)
Japanese (ja)
Other versions
JPS58102230A (ja
Inventor
Takashi Yamadera
Nobuyuki Hayashi
Kazutaka Masaoka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Resonac Corp
Original Assignee
Hitachi Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd filed Critical Hitachi Chemical Co Ltd
Priority to JP20184181A priority Critical patent/JPS58102230A/ja
Publication of JPS58102230A publication Critical patent/JPS58102230A/ja
Publication of JPH0334056B2 publication Critical patent/JPH0334056B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
JP20184181A 1981-12-15 1981-12-15 感光性樹脂組成物 Granted JPS58102230A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP20184181A JPS58102230A (ja) 1981-12-15 1981-12-15 感光性樹脂組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP20184181A JPS58102230A (ja) 1981-12-15 1981-12-15 感光性樹脂組成物

Publications (2)

Publication Number Publication Date
JPS58102230A JPS58102230A (ja) 1983-06-17
JPH0334056B2 true JPH0334056B2 (enrdf_load_stackoverflow) 1991-05-21

Family

ID=16447775

Family Applications (1)

Application Number Title Priority Date Filing Date
JP20184181A Granted JPS58102230A (ja) 1981-12-15 1981-12-15 感光性樹脂組成物

Country Status (1)

Country Link
JP (1) JPS58102230A (enrdf_load_stackoverflow)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6051833A (ja) * 1983-07-01 1985-03-23 Toray Ind Inc 感光性樹脂組成物
US4952481A (en) * 1985-02-12 1990-08-28 Napp Systems (Usa), Inc. Photosensitive resin composition
NZ215095A (en) 1985-02-12 1989-04-26 Napp Systems Inc Photosensitive resin compositions
JPS62295046A (ja) * 1986-06-16 1987-12-22 Hitachi Chem Co Ltd 感光性樹脂組成物
DE3743455A1 (de) * 1987-12-22 1989-07-06 Hoechst Ag Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial
CN1089453C (zh) * 1994-12-27 2002-08-21 东丽株式会社 感光性树脂组合物

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS509177A (enrdf_load_stackoverflow) * 1973-05-29 1975-01-30
JPS5839841B2 (ja) * 1974-08-05 1983-09-01 旭化成株式会社 ヒカリジユウゴウセイソセイブツ
JPS5522481A (en) * 1978-08-07 1980-02-18 Sumikin Kozai Kogyo Kk Press cut end face straightening device of tubular material
JPS5638458A (en) * 1979-09-05 1981-04-13 Toray Ind Inc Formation of resist pattern
JPS57192420A (en) * 1981-04-27 1982-11-26 Hitachi Chem Co Ltd Photopolymer composition
JPS5893046A (ja) * 1981-11-28 1983-06-02 Hitachi Chem Co Ltd 感光性エレメント
JPS5876827A (ja) * 1981-10-30 1983-05-10 Hitachi Chem Co Ltd 感光性樹脂組成物

Also Published As

Publication number Publication date
JPS58102230A (ja) 1983-06-17

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