JPS61220332A - エッチング終点判定方法 - Google Patents

エッチング終点判定方法

Info

Publication number
JPS61220332A
JPS61220332A JP60060619A JP6061985A JPS61220332A JP S61220332 A JPS61220332 A JP S61220332A JP 60060619 A JP60060619 A JP 60060619A JP 6061985 A JP6061985 A JP 6061985A JP S61220332 A JPS61220332 A JP S61220332A
Authority
JP
Japan
Prior art keywords
end point
etching
electric signal
point determination
digital data
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP60060619A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0455329B2 (en:Method
Inventor
Keiji Tada
多田　啓司
Masato Matsuoka
松岡　真人
Tomoyoshi Nishihara
西原　伴良
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP60060619A priority Critical patent/JPS61220332A/ja
Publication of JPS61220332A publication Critical patent/JPS61220332A/ja
Publication of JPH0455329B2 publication Critical patent/JPH0455329B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H10P50/00—

Landscapes

  • Drying Of Semiconductors (AREA)
JP60060619A 1985-03-27 1985-03-27 エッチング終点判定方法 Granted JPS61220332A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60060619A JPS61220332A (ja) 1985-03-27 1985-03-27 エッチング終点判定方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60060619A JPS61220332A (ja) 1985-03-27 1985-03-27 エッチング終点判定方法

Publications (2)

Publication Number Publication Date
JPS61220332A true JPS61220332A (ja) 1986-09-30
JPH0455329B2 JPH0455329B2 (en:Method) 1992-09-03

Family

ID=13147473

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60060619A Granted JPS61220332A (ja) 1985-03-27 1985-03-27 エッチング終点判定方法

Country Status (1)

Country Link
JP (1) JPS61220332A (en:Method)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01226153A (ja) * 1988-03-07 1989-09-08 Hitachi Ltd エッチング終点判定装置
JPH01235336A (ja) * 1988-03-16 1989-09-20 Hitachi Ltd エッチング終点判定装置
JPH01241127A (ja) * 1988-03-23 1989-09-26 Hitachi Ltd エッチング終点判定方法
JPH0348423A (ja) * 1989-07-17 1991-03-01 Hitachi Ltd 終点判定方法および装置
JPH05267224A (ja) * 1992-03-19 1993-10-15 Nec Yamaguchi Ltd ドライエッチング装置
US5374327A (en) * 1992-04-28 1994-12-20 Tokyo Electron Limited Plasma processing method

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5563830A (en) * 1978-11-08 1980-05-14 Chiyou Lsi Gijutsu Kenkyu Kumiai End point detection method and its apparatus
JPS56133466A (en) * 1980-03-24 1981-10-19 Anelva Corp Plasma spectrum monitoring apparatus
JPS58215030A (ja) * 1982-06-08 1983-12-14 Kokusai Electric Co Ltd 半導体基板のドライエツチング終了時点検出装置
JPS58216423A (ja) * 1982-06-10 1983-12-16 Hitachi Ltd エツチング終点検出装置

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5563830A (en) * 1978-11-08 1980-05-14 Chiyou Lsi Gijutsu Kenkyu Kumiai End point detection method and its apparatus
JPS56133466A (en) * 1980-03-24 1981-10-19 Anelva Corp Plasma spectrum monitoring apparatus
JPS58215030A (ja) * 1982-06-08 1983-12-14 Kokusai Electric Co Ltd 半導体基板のドライエツチング終了時点検出装置
JPS58216423A (ja) * 1982-06-10 1983-12-16 Hitachi Ltd エツチング終点検出装置

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01226153A (ja) * 1988-03-07 1989-09-08 Hitachi Ltd エッチング終点判定装置
JPH01235336A (ja) * 1988-03-16 1989-09-20 Hitachi Ltd エッチング終点判定装置
JPH01241127A (ja) * 1988-03-23 1989-09-26 Hitachi Ltd エッチング終点判定方法
JPH0348423A (ja) * 1989-07-17 1991-03-01 Hitachi Ltd 終点判定方法および装置
JPH05267224A (ja) * 1992-03-19 1993-10-15 Nec Yamaguchi Ltd ドライエッチング装置
US5374327A (en) * 1992-04-28 1994-12-20 Tokyo Electron Limited Plasma processing method

Also Published As

Publication number Publication date
JPH0455329B2 (en:Method) 1992-09-03

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