JPS61204949A - 半導体装置の製造方法 - Google Patents
半導体装置の製造方法Info
- Publication number
- JPS61204949A JPS61204949A JP60045868A JP4586885A JPS61204949A JP S61204949 A JPS61204949 A JP S61204949A JP 60045868 A JP60045868 A JP 60045868A JP 4586885 A JP4586885 A JP 4586885A JP S61204949 A JPS61204949 A JP S61204949A
- Authority
- JP
- Japan
- Prior art keywords
- groove
- polycrystalline silicon
- silicon
- silicate glass
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H10W10/00—
-
- H10W10/01—
Landscapes
- Local Oxidation Of Silicon (AREA)
- Element Separation (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60045868A JPS61204949A (ja) | 1985-03-08 | 1985-03-08 | 半導体装置の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60045868A JPS61204949A (ja) | 1985-03-08 | 1985-03-08 | 半導体装置の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61204949A true JPS61204949A (ja) | 1986-09-11 |
| JPH0416018B2 JPH0416018B2 (cg-RX-API-DMAC10.html) | 1992-03-19 |
Family
ID=12731180
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60045868A Granted JPS61204949A (ja) | 1985-03-08 | 1985-03-08 | 半導体装置の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61204949A (cg-RX-API-DMAC10.html) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006324644A (ja) * | 2005-04-18 | 2006-11-30 | Nec Electronics Corp | 半導体装置の製造方法 |
-
1985
- 1985-03-08 JP JP60045868A patent/JPS61204949A/ja active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006324644A (ja) * | 2005-04-18 | 2006-11-30 | Nec Electronics Corp | 半導体装置の製造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0416018B2 (cg-RX-API-DMAC10.html) | 1992-03-19 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPH0580148B2 (cg-RX-API-DMAC10.html) | ||
| JPS6376330A (ja) | 半導体装置の製造方法 | |
| JPH02156552A (ja) | 半導体装置およびその製造方法 | |
| JPH0362946A (ja) | 半導体装置及びその製造方法 | |
| JPS61204949A (ja) | 半導体装置の製造方法 | |
| JPS59232437A (ja) | 半導体装置の製造方法 | |
| JPH0416019B2 (cg-RX-API-DMAC10.html) | ||
| JPS63287024A (ja) | 半導体装置の製造方法 | |
| JPS63288042A (ja) | 半導体素子製造方法 | |
| JPS63204746A (ja) | 半導体装置の製造方法 | |
| JPH04150052A (ja) | 半導体装置 | |
| JPH03153031A (ja) | 半導体装置の製造方法 | |
| JP2570729B2 (ja) | 半導体装置の製造方法 | |
| JPH0642510B2 (ja) | 半導体構造の形成方法 | |
| JPS5854651A (ja) | 半導体装置の製造方法 | |
| JPH01282836A (ja) | 半導体装置の製造方法 | |
| JPS6254427A (ja) | 半導体装置の製造方法 | |
| JPS6260231A (ja) | 半導体装置の製造方法 | |
| JPS60235436A (ja) | 半導体装置の製造方法 | |
| JPS6387742A (ja) | 半導体装置の製造方法 | |
| JPH01151244A (ja) | 半導体装置の製造方法 | |
| JPS5994842A (ja) | 半導体装置の製造方法 | |
| JPS6278852A (ja) | 半導体装置の製造方法 | |
| JPS623980B2 (cg-RX-API-DMAC10.html) | ||
| JPH05343347A (ja) | 半導体装置の製造方法 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| S533 | Written request for registration of change of name |
Free format text: JAPANESE INTERMEDIATE CODE: R313533 |
|
| R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
| EXPY | Cancellation because of completion of term |