JPS6120331A - レジストベ−ク装置 - Google Patents
レジストベ−ク装置Info
- Publication number
- JPS6120331A JPS6120331A JP14181484A JP14181484A JPS6120331A JP S6120331 A JPS6120331 A JP S6120331A JP 14181484 A JP14181484 A JP 14181484A JP 14181484 A JP14181484 A JP 14181484A JP S6120331 A JPS6120331 A JP S6120331A
- Authority
- JP
- Japan
- Prior art keywords
- hot plate
- clean room
- baking
- resist
- exhaust vent
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000758 substrate Substances 0.000 claims abstract description 16
- 239000003960 organic solvent Substances 0.000 abstract description 3
- 230000000694 effects Effects 0.000 abstract description 2
- 229920000915 polyvinyl chloride Polymers 0.000 abstract 1
- 239000004800 polyvinyl chloride Substances 0.000 abstract 1
- 238000000034 method Methods 0.000 description 8
- 229920002120 photoresistant polymer Polymers 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- SVONRAPFKPVNKG-UHFFFAOYSA-N 2-ethoxyethyl acetate Chemical compound CCOCCOC(C)=O SVONRAPFKPVNKG-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 230000003749 cleanliness Effects 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Landscapes
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Coating Apparatus (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14181484A JPS6120331A (ja) | 1984-07-09 | 1984-07-09 | レジストベ−ク装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14181484A JPS6120331A (ja) | 1984-07-09 | 1984-07-09 | レジストベ−ク装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6120331A true JPS6120331A (ja) | 1986-01-29 |
| JPH0254656B2 JPH0254656B2 (cs) | 1990-11-22 |
Family
ID=15300746
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14181484A Granted JPS6120331A (ja) | 1984-07-09 | 1984-07-09 | レジストベ−ク装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6120331A (cs) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63301522A (ja) * | 1987-01-29 | 1988-12-08 | Tokyo Electron Ltd | 処理装置 |
| US5516626A (en) * | 1990-04-23 | 1996-05-14 | Tadahiro Ohmi | Resist processing method |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS49111482U (cs) * | 1972-11-09 | 1974-09-24 | ||
| JPS5036536A (cs) * | 1973-08-06 | 1975-04-05 | ||
| JPS5735319A (en) * | 1980-08-13 | 1982-02-25 | Hitachi Ltd | Heat treatment device |
| JPS58206123A (ja) * | 1982-05-25 | 1983-12-01 | Toshiba Corp | 半導体製造装置 |
| JPS58196837U (ja) * | 1982-06-24 | 1983-12-27 | 大日本スクリ−ン製造株式会社 | 半導体ウエハの乾燥装置 |
-
1984
- 1984-07-09 JP JP14181484A patent/JPS6120331A/ja active Granted
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS49111482U (cs) * | 1972-11-09 | 1974-09-24 | ||
| JPS5036536A (cs) * | 1973-08-06 | 1975-04-05 | ||
| JPS5735319A (en) * | 1980-08-13 | 1982-02-25 | Hitachi Ltd | Heat treatment device |
| JPS58206123A (ja) * | 1982-05-25 | 1983-12-01 | Toshiba Corp | 半導体製造装置 |
| JPS58196837U (ja) * | 1982-06-24 | 1983-12-27 | 大日本スクリ−ン製造株式会社 | 半導体ウエハの乾燥装置 |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63301522A (ja) * | 1987-01-29 | 1988-12-08 | Tokyo Electron Ltd | 処理装置 |
| US5516626A (en) * | 1990-04-23 | 1996-05-14 | Tadahiro Ohmi | Resist processing method |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0254656B2 (cs) | 1990-11-22 |
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