JPH0254656B2 - - Google Patents
Info
- Publication number
- JPH0254656B2 JPH0254656B2 JP59141814A JP14181484A JPH0254656B2 JP H0254656 B2 JPH0254656 B2 JP H0254656B2 JP 59141814 A JP59141814 A JP 59141814A JP 14181484 A JP14181484 A JP 14181484A JP H0254656 B2 JPH0254656 B2 JP H0254656B2
- Authority
- JP
- Japan
- Prior art keywords
- hot plate
- resist
- baking
- substrate
- clean room
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Landscapes
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Coating Apparatus (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14181484A JPS6120331A (ja) | 1984-07-09 | 1984-07-09 | レジストベ−ク装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14181484A JPS6120331A (ja) | 1984-07-09 | 1984-07-09 | レジストベ−ク装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6120331A JPS6120331A (ja) | 1986-01-29 |
| JPH0254656B2 true JPH0254656B2 (cs) | 1990-11-22 |
Family
ID=15300746
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14181484A Granted JPS6120331A (ja) | 1984-07-09 | 1984-07-09 | レジストベ−ク装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6120331A (cs) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH06103665B2 (ja) * | 1987-01-29 | 1994-12-14 | 東京エレクトロン株式会社 | 処理装置 |
| JPH0427113A (ja) * | 1990-04-23 | 1992-01-30 | Tadahiro Omi | レジスト処理装置、レジスト処理方法及びレジストパターン |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5633654Y2 (cs) * | 1972-11-09 | 1981-08-10 | ||
| JPS567744B2 (cs) * | 1973-08-06 | 1981-02-19 | ||
| JPS5735319A (en) * | 1980-08-13 | 1982-02-25 | Hitachi Ltd | Heat treatment device |
| JPS58206123A (ja) * | 1982-05-25 | 1983-12-01 | Toshiba Corp | 半導体製造装置 |
| JPS58196837U (ja) * | 1982-06-24 | 1983-12-27 | 大日本スクリ−ン製造株式会社 | 半導体ウエハの乾燥装置 |
-
1984
- 1984-07-09 JP JP14181484A patent/JPS6120331A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6120331A (ja) | 1986-01-29 |
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