JPS61185745A - ポジ型フオトレジスト現像液組成物 - Google Patents

ポジ型フオトレジスト現像液組成物

Info

Publication number
JPS61185745A
JPS61185745A JP2699485A JP2699485A JPS61185745A JP S61185745 A JPS61185745 A JP S61185745A JP 2699485 A JP2699485 A JP 2699485A JP 2699485 A JP2699485 A JP 2699485A JP S61185745 A JPS61185745 A JP S61185745A
Authority
JP
Japan
Prior art keywords
ethylene glycol
ammonium hydroxide
quaternary ammonium
polyethylene glycol
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2699485A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0555859B2 (enExample
Inventor
Kazuyuki Saito
斉藤　和行
Chiharu Kato
千晴 加藤
Masanobu Ueha
上羽　正信
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Tama Kagaku Kogyo Co Ltd
Original Assignee
Toshiba Corp
Tama Kagaku Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tama Kagaku Kogyo Co Ltd filed Critical Toshiba Corp
Priority to JP2699485A priority Critical patent/JPS61185745A/ja
Publication of JPS61185745A publication Critical patent/JPS61185745A/ja
Publication of JPH0555859B2 publication Critical patent/JPH0555859B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/322—Aqueous alkaline compositions

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2699485A 1985-02-14 1985-02-14 ポジ型フオトレジスト現像液組成物 Granted JPS61185745A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2699485A JPS61185745A (ja) 1985-02-14 1985-02-14 ポジ型フオトレジスト現像液組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2699485A JPS61185745A (ja) 1985-02-14 1985-02-14 ポジ型フオトレジスト現像液組成物

Publications (2)

Publication Number Publication Date
JPS61185745A true JPS61185745A (ja) 1986-08-19
JPH0555859B2 JPH0555859B2 (enExample) 1993-08-18

Family

ID=12208710

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2699485A Granted JPS61185745A (ja) 1985-02-14 1985-02-14 ポジ型フオトレジスト現像液組成物

Country Status (1)

Country Link
JP (1) JPS61185745A (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0474010A1 (de) * 1990-08-29 1992-03-11 Hoechst Aktiengesellschaft Entwicklerzusammensetzung für bestrahlte, strahlungsempfindliche, positiv und negativ arbeitende sowie umkehrbare reprographische Schichten und Verfahren zur Entwicklung solcher Schichten
JPH04343360A (ja) * 1991-05-21 1992-11-30 Toray Ind Inc 水なし平版印刷版用現像液

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50158280A (enExample) * 1974-06-10 1975-12-22
JPS54116227A (en) * 1978-03-01 1979-09-10 Fujitsu Ltd Formation method for positive type resist image
JPS589413A (ja) * 1981-07-09 1983-01-19 Victor Co Of Japan Ltd 音声信号伝送回路
JPS61167948A (ja) * 1985-01-21 1986-07-29 Mitsubishi Chem Ind Ltd ポジ型感光性組成物用現像液

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50158280A (enExample) * 1974-06-10 1975-12-22
JPS54116227A (en) * 1978-03-01 1979-09-10 Fujitsu Ltd Formation method for positive type resist image
JPS589413A (ja) * 1981-07-09 1983-01-19 Victor Co Of Japan Ltd 音声信号伝送回路
JPS61167948A (ja) * 1985-01-21 1986-07-29 Mitsubishi Chem Ind Ltd ポジ型感光性組成物用現像液

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0474010A1 (de) * 1990-08-29 1992-03-11 Hoechst Aktiengesellschaft Entwicklerzusammensetzung für bestrahlte, strahlungsempfindliche, positiv und negativ arbeitende sowie umkehrbare reprographische Schichten und Verfahren zur Entwicklung solcher Schichten
JPH05142785A (ja) * 1990-08-29 1993-06-11 Hoechst Ag 照射された感放射線ポジ作動性およびネガ作動性および反転性の複写層用現像液組成物およびかかる層の現像法
JPH04343360A (ja) * 1991-05-21 1992-11-30 Toray Ind Inc 水なし平版印刷版用現像液

Also Published As

Publication number Publication date
JPH0555859B2 (enExample) 1993-08-18

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