JPS6117798B2 - - Google Patents
Info
- Publication number
- JPS6117798B2 JPS6117798B2 JP1761282A JP1761282A JPS6117798B2 JP S6117798 B2 JPS6117798 B2 JP S6117798B2 JP 1761282 A JP1761282 A JP 1761282A JP 1761282 A JP1761282 A JP 1761282A JP S6117798 B2 JPS6117798 B2 JP S6117798B2
- Authority
- JP
- Japan
- Prior art keywords
- single crystal
- crystal
- melt
- liquid
- grown
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B27/00—Single-crystal growth under a protective fluid
- C30B27/02—Single-crystal growth under a protective fluid by pulling from a melt
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1761282A JPS58135626A (ja) | 1982-02-08 | 1982-02-08 | 化合物半導体単結晶の製造方法及び製造装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1761282A JPS58135626A (ja) | 1982-02-08 | 1982-02-08 | 化合物半導体単結晶の製造方法及び製造装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS58135626A JPS58135626A (ja) | 1983-08-12 |
| JPS6117798B2 true JPS6117798B2 (enExample) | 1986-05-09 |
Family
ID=11948701
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1761282A Granted JPS58135626A (ja) | 1982-02-08 | 1982-02-08 | 化合物半導体単結晶の製造方法及び製造装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS58135626A (enExample) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59116195A (ja) * | 1982-12-23 | 1984-07-04 | Toshiba Corp | 化合物半導体単結晶の製造方法 |
| JPS6046993A (ja) * | 1983-08-23 | 1985-03-14 | Sumitomo Electric Ind Ltd | 単結晶引上装置 |
| JPS6046998A (ja) * | 1983-08-26 | 1985-03-14 | Sumitomo Electric Ind Ltd | 単結晶引上方法及びそのための装置 |
| JPS6090897A (ja) * | 1983-10-25 | 1985-05-22 | Nippon Telegr & Teleph Corp <Ntt> | 化合物半導体単結晶の製造方法および製造装置 |
| JPS60210591A (ja) * | 1984-04-05 | 1985-10-23 | Hitachi Cable Ltd | 半絶縁性GaAs単結晶の製造方法 |
| JPS60264390A (ja) * | 1984-06-08 | 1985-12-27 | Sumitomo Electric Ind Ltd | 単結晶の育成方法 |
| JPS6131381A (ja) * | 1984-07-20 | 1986-02-13 | Nippon Telegr & Teleph Corp <Ntt> | 化合物半導体結晶の引き上げ製造方法 |
| DE68917054T2 (de) * | 1988-08-19 | 1995-01-05 | Mitsubishi Materials Corp | Verfahren zur Einkristallzüchtung von zersetzbaren Halbleiter-Verbindungen. |
-
1982
- 1982-02-08 JP JP1761282A patent/JPS58135626A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS58135626A (ja) | 1983-08-12 |
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