JPS6117416A - 高純度シリカおよびその製造方法 - Google Patents

高純度シリカおよびその製造方法

Info

Publication number
JPS6117416A
JPS6117416A JP13645784A JP13645784A JPS6117416A JP S6117416 A JPS6117416 A JP S6117416A JP 13645784 A JP13645784 A JP 13645784A JP 13645784 A JP13645784 A JP 13645784A JP S6117416 A JPS6117416 A JP S6117416A
Authority
JP
Japan
Prior art keywords
silica
reaction
acid
mineral acid
less
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP13645784A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0121093B2 (enExample
Inventor
Hiroyuki Kashiwase
弘之 柏瀬
Genichi Sato
源一 佐藤
Yutaka Konose
豊 木ノ瀬
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Chemical Industrial Co Ltd
Original Assignee
Nippon Chemical Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Chemical Industrial Co Ltd filed Critical Nippon Chemical Industrial Co Ltd
Priority to JP13645784A priority Critical patent/JPS6117416A/ja
Publication of JPS6117416A publication Critical patent/JPS6117416A/ja
Publication of JPH0121093B2 publication Critical patent/JPH0121093B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Silicon Compounds (AREA)
JP13645784A 1984-07-03 1984-07-03 高純度シリカおよびその製造方法 Granted JPS6117416A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13645784A JPS6117416A (ja) 1984-07-03 1984-07-03 高純度シリカおよびその製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13645784A JPS6117416A (ja) 1984-07-03 1984-07-03 高純度シリカおよびその製造方法

Publications (2)

Publication Number Publication Date
JPS6117416A true JPS6117416A (ja) 1986-01-25
JPH0121093B2 JPH0121093B2 (enExample) 1989-04-19

Family

ID=15175557

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13645784A Granted JPS6117416A (ja) 1984-07-03 1984-07-03 高純度シリカおよびその製造方法

Country Status (1)

Country Link
JP (1) JPS6117416A (enExample)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4683128A (en) * 1985-06-27 1987-07-28 Nitto Chemical Industry Co., Ltd. Process for manufacturing high purity silica
FR2636938A1 (fr) * 1987-05-25 1990-03-30 Kawatetsu Mining Cy Ltd Procede de production de silice tres pure
JP2003171115A (ja) * 2001-09-25 2003-06-17 Mitsubishi Chemicals Corp シリカ
WO2006131065A1 (en) * 2005-06-10 2006-12-14 Degussa Wellink Silica (Nanping) Co. Ltd. A process for producing silica, sodium sulfite and sodium hydrogen sulfite with sodium sulfate
KR20140033179A (ko) * 2011-07-04 2014-03-17 다이헤이요 세멘토 가부시키가이샤 실리카와 카본을 포함하는 입자 및 실리카와 카본의 혼합물의 제조 방법

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5039296A (enExample) * 1973-08-10 1975-04-11
JPS56116647A (en) * 1980-02-20 1981-09-12 Hitachi Ltd Manufacturing of silica-alumina type filler for semiconductor memory element covering resin
JPS57195151A (en) * 1981-05-27 1982-11-30 Denki Kagaku Kogyo Kk Low-radioactive resin composition
JPS57212224A (en) * 1981-06-24 1982-12-27 Nitto Electric Ind Co Ltd Epoxy resin composition for encapsulation of semiconductor
JPS5947744A (ja) * 1982-09-10 1984-03-17 Toshiba Ceramics Co Ltd Ｉｃパツケ−ジ用フイラ−材
JPS5954632A (ja) * 1982-09-21 1984-03-29 Mitsubishi Metal Corp 石英ガラス粉末の製造法

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5039296A (enExample) * 1973-08-10 1975-04-11
JPS56116647A (en) * 1980-02-20 1981-09-12 Hitachi Ltd Manufacturing of silica-alumina type filler for semiconductor memory element covering resin
JPS57195151A (en) * 1981-05-27 1982-11-30 Denki Kagaku Kogyo Kk Low-radioactive resin composition
JPS57212224A (en) * 1981-06-24 1982-12-27 Nitto Electric Ind Co Ltd Epoxy resin composition for encapsulation of semiconductor
JPS5947744A (ja) * 1982-09-10 1984-03-17 Toshiba Ceramics Co Ltd Ｉｃパツケ−ジ用フイラ−材
JPS5954632A (ja) * 1982-09-21 1984-03-29 Mitsubishi Metal Corp 石英ガラス粉末の製造法

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4683128A (en) * 1985-06-27 1987-07-28 Nitto Chemical Industry Co., Ltd. Process for manufacturing high purity silica
FR2636938A1 (fr) * 1987-05-25 1990-03-30 Kawatetsu Mining Cy Ltd Procede de production de silice tres pure
JP2003171115A (ja) * 2001-09-25 2003-06-17 Mitsubishi Chemicals Corp シリカ
WO2006131065A1 (en) * 2005-06-10 2006-12-14 Degussa Wellink Silica (Nanping) Co. Ltd. A process for producing silica, sodium sulfite and sodium hydrogen sulfite with sodium sulfate
KR20140033179A (ko) * 2011-07-04 2014-03-17 다이헤이요 세멘토 가부시키가이샤 실리카와 카본을 포함하는 입자 및 실리카와 카본의 혼합물의 제조 방법

Also Published As

Publication number Publication date
JPH0121093B2 (enExample) 1989-04-19

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