JPS6116972B2 - - Google Patents

Info

Publication number
JPS6116972B2
JPS6116972B2 JP54062759A JP6275979A JPS6116972B2 JP S6116972 B2 JPS6116972 B2 JP S6116972B2 JP 54062759 A JP54062759 A JP 54062759A JP 6275979 A JP6275979 A JP 6275979A JP S6116972 B2 JPS6116972 B2 JP S6116972B2
Authority
JP
Japan
Prior art keywords
etching
article
molecular weight
polymer
resist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP54062759A
Other languages
English (en)
Japanese (ja)
Other versions
JPS54155826A (en
Inventor
Jon Sutanrei Boden Muure
Deiuitsudo Fueito Yuujin
Furatsuku Tonpuson Rarii
Uorutaa Uirukinsu Junya Kuretasu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AT&T Corp
Original Assignee
AT&T Technologies Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by AT&T Technologies Inc filed Critical AT&T Technologies Inc
Publication of JPS54155826A publication Critical patent/JPS54155826A/ja
Publication of JPS6116972B2 publication Critical patent/JPS6116972B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP6275979A 1978-05-23 1979-05-23 Method of producing radiation sensitive resist and product therefor Granted JPS54155826A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US05/908,791 US4208211A (en) 1978-05-23 1978-05-23 Fabrication based on radiation sensitive resists and related products

Publications (2)

Publication Number Publication Date
JPS54155826A JPS54155826A (en) 1979-12-08
JPS6116972B2 true JPS6116972B2 (OSRAM) 1986-05-02

Family

ID=25426244

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6275979A Granted JPS54155826A (en) 1978-05-23 1979-05-23 Method of producing radiation sensitive resist and product therefor

Country Status (7)

Country Link
US (1) US4208211A (OSRAM)
EP (1) EP0005551B1 (OSRAM)
JP (1) JPS54155826A (OSRAM)
AU (1) AU523178B2 (OSRAM)
CA (1) CA1166885A (OSRAM)
DE (1) DE2966886D1 (OSRAM)
ES (1) ES480851A1 (OSRAM)

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5511217A (en) * 1978-07-10 1980-01-26 Nippon Telegr & Teleph Corp <Ntt> Pattern forming method using radiation sensitive high polymer
US4289573A (en) * 1979-03-30 1981-09-15 International Business Machines Corporation Process for forming microcircuits
US4318976A (en) * 1980-10-27 1982-03-09 Texas Instruments Incorporated High gel rigidity, negative electron beam resists
DE3174780D1 (en) * 1980-11-05 1986-07-10 Nec Corp Radiation-sensitive negative resist
JPS5786830A (en) * 1980-11-20 1982-05-31 Fujitsu Ltd Pattern forming material
JPS5786831A (en) * 1980-11-20 1982-05-31 Fujitsu Ltd Pattern forming material
JPS57109943A (en) * 1980-12-26 1982-07-08 Nippon Telegr & Teleph Corp <Ntt> Formation of submicron pattern using radiation sensitive resist
US4367281A (en) * 1981-01-12 1983-01-04 Toyo Soda Manufacturing Co., Ltd. Fine fabrication process using radiation sensitive resist
DE3109809C2 (de) * 1981-03-13 1986-07-31 Siemens AG, 1000 Berlin und 8000 München Verfahren zur Herstellung von Resiststrukturen
JPS57189134A (en) * 1981-05-16 1982-11-20 Toyo Soda Mfg Co Ltd Formation of pattern using negative type resist material
JPS589141A (ja) * 1981-07-10 1983-01-19 Nippon Telegr & Teleph Corp <Ntt> 放射線感応性ネガ形レジストの感度向上方法
JPS5979247A (ja) * 1982-10-29 1984-05-08 Japan Synthetic Rubber Co Ltd 遠紫外線または電子線感応用レジスト
JPS5866938A (ja) * 1981-10-19 1983-04-21 Hitachi Ltd 遠紫外光感応材料被膜の形成方法
JPS58115433A (ja) * 1981-12-28 1983-07-09 Toppan Printing Co Ltd 水溶性感光材料の製造方法
JPS5923341A (ja) * 1982-07-30 1984-02-06 Japan Synthetic Rubber Co Ltd 樹脂組成物
JPS59116744A (ja) * 1982-12-24 1984-07-05 Japan Synthetic Rubber Co Ltd 感電離放射線樹脂組成物
US4568734A (en) * 1983-02-15 1986-02-04 Eastman Kodak Company Electron-beam and X-ray sensitive polymers and resists
US4515886A (en) * 1983-02-16 1985-05-07 Toyo Soda Manufacturing Co., Ltd. Photosensitive compositions
US4451329A (en) * 1983-08-22 1984-05-29 Wheaton Industries Methods and compositions for producing decorative frosting effects on glass
JPS6060641A (ja) * 1983-09-14 1985-04-08 Japan Synthetic Rubber Co Ltd Ｘ線レジスト
JPS60102628A (ja) * 1983-11-10 1985-06-06 Japan Synthetic Rubber Co Ltd Ｘ線レジスト
DE3409888A1 (de) * 1984-03-17 1985-09-19 Hoechst Ag, 6230 Frankfurt Lichtempfindliches aufzeichnungsmaterial und dessen verwendung in einem verfahren zum herstellen einer druckform oder einer gedruckten schaltung
JPS6247049A (ja) * 1985-08-26 1987-02-28 Hoya Corp パタ−ン形成方法
US5209847A (en) * 1989-10-03 1993-05-11 Nippon Oil And Fats Co., Ltd. Ultrathin membrane of polymethacrylate or polycrotonate and device provided with ultrathin membrane
RU2195047C2 (ru) * 2000-03-21 2002-12-20 Научно-исследовательский институт измерительных систем Способ формирования фоторезистивной маски

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1572062C3 (de) * 1966-01-07 1974-11-07 Kalle Ag, 6202 Wiesbaden-Biebrich Lichtempfindliche Kopierschicht
US3885060A (en) * 1968-08-23 1975-05-20 Hitachi Ltd Production of insolubilized organic polymers
US3953309A (en) * 1972-12-14 1976-04-27 Dynachem Corporation Polymerization compositions and processes having polymeric binding agents
JPS5520572B2 (OSRAM) * 1973-06-25 1980-06-03
US4061799A (en) * 1973-11-05 1977-12-06 Texas Instruments Incorporated Method of patterning styrene diene block copolymer electron beam resists
US3996393A (en) * 1974-03-25 1976-12-07 International Business Machines Corporation Positive polymeric electron beam resists of very great sensitivity
US4056393A (en) * 1974-09-26 1977-11-01 American Can Company Method of recording information using a copolymer of glycidyl methacrylate and allyl glycidyl ether
ZA757984B (en) * 1974-10-04 1976-12-29 Dynachem Corp Polymers for aqueous processed photoresists
FR2290458A1 (fr) * 1974-11-08 1976-06-04 Thomson Csf Resine sensible aux electrons et son application a la realisation de masques de haute resolution pour la fabrication de composants electroniques
JPS5299776A (en) * 1976-02-18 1977-08-22 Hitachi Ltd Radiation sensitive high polymeric material
US4061829A (en) * 1976-04-26 1977-12-06 Bell Telephone Laboratories, Incorporated Negative resist for X-ray and electron beam lithography and method of using same
US4130424A (en) * 1976-08-06 1978-12-19 Bell Telephone Laboratories, Incorporated Process using radiation curable epoxy containing resist and resultant product

Also Published As

Publication number Publication date
DE2966886D1 (en) 1984-05-17
ES480851A1 (es) 1980-09-01
AU4719379A (en) 1979-11-29
US4208211A (en) 1980-06-17
EP0005551A3 (en) 1979-12-12
EP0005551B1 (en) 1984-04-11
AU523178B2 (en) 1982-07-15
CA1166885A (en) 1984-05-08
JPS54155826A (en) 1979-12-08
EP0005551A2 (en) 1979-11-28

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