JPH0480377B2 - - Google Patents
Info
- Publication number
- JPH0480377B2 JPH0480377B2 JP59182589A JP18258984A JPH0480377B2 JP H0480377 B2 JPH0480377 B2 JP H0480377B2 JP 59182589 A JP59182589 A JP 59182589A JP 18258984 A JP18258984 A JP 18258984A JP H0480377 B2 JPH0480377 B2 JP H0480377B2
- Authority
- JP
- Japan
- Prior art keywords
- resist
- pattern
- vinylphenol
- dry etching
- etching resistance
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59182589A JPS6161154A (ja) | 1984-09-03 | 1984-09-03 | 微細ネガレジストパターン形成方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59182589A JPS6161154A (ja) | 1984-09-03 | 1984-09-03 | 微細ネガレジストパターン形成方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6161154A JPS6161154A (ja) | 1986-03-28 |
| JPH0480377B2 true JPH0480377B2 (OSRAM) | 1992-12-18 |
Family
ID=16120931
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59182589A Granted JPS6161154A (ja) | 1984-09-03 | 1984-09-03 | 微細ネガレジストパターン形成方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6161154A (OSRAM) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4849320A (en) * | 1986-05-10 | 1989-07-18 | Ciba-Geigy Corporation | Method of forming images |
| JPH0821532B2 (ja) * | 1986-09-16 | 1996-03-04 | 松下電子工業株式会社 | 半導体装置の製造方法 |
| JPH0821533B2 (ja) * | 1986-11-26 | 1996-03-04 | 松下電子工業株式会社 | 半導体装置の製造方法 |
| JPH0740543B2 (ja) * | 1987-02-17 | 1995-05-01 | 松下電子工業株式会社 | 半導体装置の製造方法 |
| GB8715435D0 (en) * | 1987-07-01 | 1987-08-05 | Ciba Geigy Ag | Forming images |
| JPS6489424A (en) * | 1987-09-30 | 1989-04-03 | Matsushita Electronics Corp | Resist-pattern forming method |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1375461A (OSRAM) * | 1972-05-05 | 1974-11-27 | ||
| JPS5241050B2 (OSRAM) * | 1974-03-27 | 1977-10-15 | ||
| JPS50141404A (OSRAM) * | 1974-04-30 | 1975-11-13 |
-
1984
- 1984-09-03 JP JP59182589A patent/JPS6161154A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6161154A (ja) | 1986-03-28 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |