JPS6116758B2 - - Google Patents
Info
- Publication number
- JPS6116758B2 JPS6116758B2 JP54133566A JP13356679A JPS6116758B2 JP S6116758 B2 JPS6116758 B2 JP S6116758B2 JP 54133566 A JP54133566 A JP 54133566A JP 13356679 A JP13356679 A JP 13356679A JP S6116758 B2 JPS6116758 B2 JP S6116758B2
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- film
- polycrystalline
- protective film
- manufacturing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
- Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
- Recrystallisation Techniques (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13356679A JPS5659694A (en) | 1979-10-18 | 1979-10-18 | Manufacture of thin film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13356679A JPS5659694A (en) | 1979-10-18 | 1979-10-18 | Manufacture of thin film |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5659694A JPS5659694A (en) | 1981-05-23 |
| JPS6116758B2 true JPS6116758B2 (enExample) | 1986-05-01 |
Family
ID=15107792
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13356679A Granted JPS5659694A (en) | 1979-10-18 | 1979-10-18 | Manufacture of thin film |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5659694A (enExample) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57208124A (en) * | 1981-06-18 | 1982-12-21 | Fujitsu Ltd | Manufacture of semiconductor device |
| JPS5812320A (ja) * | 1981-07-15 | 1983-01-24 | Fujitsu Ltd | 半導体装置の製造方法 |
| JPS5855395A (ja) * | 1981-09-30 | 1983-04-01 | Toshiba Corp | シリコン単結晶膜の成長方法 |
| JPS58112333A (ja) * | 1981-12-26 | 1983-07-04 | Fujitsu Ltd | 半導体装置の製造方法 |
| JPS6017583Y2 (ja) * | 1982-07-23 | 1985-05-29 | フシマン株式会社 | 自力式パイロツト作動型調整弁 |
| JPS60200887A (ja) * | 1984-03-23 | 1985-10-11 | Nippon Sheet Glass Co Ltd | 磁性薄膜の製造方法 |
| JPH0824103B2 (ja) * | 1984-11-26 | 1996-03-06 | ソニー株式会社 | 薄膜トランジスタの製造方法 |
| JPS6384013A (ja) * | 1986-09-27 | 1988-04-14 | Agency Of Ind Science & Technol | 半導体結晶層の製造方法 |
| US5643801A (en) | 1992-11-06 | 1997-07-01 | Semiconductor Energy Laboratory Co., Ltd. | Laser processing method and alignment |
-
1979
- 1979-10-18 JP JP13356679A patent/JPS5659694A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5659694A (en) | 1981-05-23 |
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