JPS6116314A - 高周波電源装置 - Google Patents

高周波電源装置

Info

Publication number
JPS6116314A
JPS6116314A JP59136836A JP13683684A JPS6116314A JP S6116314 A JPS6116314 A JP S6116314A JP 59136836 A JP59136836 A JP 59136836A JP 13683684 A JP13683684 A JP 13683684A JP S6116314 A JPS6116314 A JP S6116314A
Authority
JP
Japan
Prior art keywords
power
circuit
wave power
high frequency
reflected wave
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59136836A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0576045B2 (enExample
Inventor
Koichi Nakazawa
中沢　弘一
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP59136836A priority Critical patent/JPS6116314A/ja
Publication of JPS6116314A publication Critical patent/JPS6116314A/ja
Publication of JPH0576045B2 publication Critical patent/JPH0576045B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03F—AMPLIFIERS
    • H03F1/00—Details of amplifiers with only discharge tubes, only semiconductor devices or only unspecified devices as amplifying elements
    • H03F1/52—Circuit arrangements for protecting such amplifiers

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Amplifiers (AREA)
  • Control Of Electrical Variables (AREA)
JP59136836A 1984-07-02 1984-07-02 高周波電源装置 Granted JPS6116314A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59136836A JPS6116314A (ja) 1984-07-02 1984-07-02 高周波電源装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59136836A JPS6116314A (ja) 1984-07-02 1984-07-02 高周波電源装置

Publications (2)

Publication Number Publication Date
JPS6116314A true JPS6116314A (ja) 1986-01-24
JPH0576045B2 JPH0576045B2 (enExample) 1993-10-21

Family

ID=15184637

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59136836A Granted JPS6116314A (ja) 1984-07-02 1984-07-02 高周波電源装置

Country Status (1)

Country Link
JP (1) JPS6116314A (enExample)

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63190564A (ja) * 1987-01-30 1988-08-08 Shindengen Electric Mfg Co Ltd Ｒｆ発生装置
JPH01123622A (ja) * 1987-11-09 1989-05-16 Kao Corp 非イオン界面活性剤の強アルカリ性水溶液
JPH11162697A (ja) * 1997-11-28 1999-06-18 Mc Electronics Kk プラズマ生成用の螺旋共振装置
US7221102B2 (en) 2003-02-07 2007-05-22 Daihen Corporation High-frequency power supply device
JP2007266006A (ja) * 2007-06-20 2007-10-11 Hitachi Kokusai Electric Inc プラズマリアクター
JP2009021240A (ja) * 2008-07-03 2009-01-29 Hitachi Kokusai Electric Inc プラズマ処理装置
JP2009238516A (ja) * 2008-03-26 2009-10-15 Daihen Corp 高周波電源装置
JP2011023356A (ja) * 2010-07-29 2011-02-03 Hitachi Kokusai Electric Inc プラズマ処理装置及び基板処理方法
JP2012119088A (ja) * 2010-11-29 2012-06-21 Canon Anelva Corp プラズマ処理装置
JP2014518482A (ja) * 2011-06-27 2014-07-28 テザート−スペースコム ゲーエムベーハー アンド ツェーオー．カーゲー 高周波電力増幅器を終端不良から保護する方法及び装置
JP2014167902A (ja) * 2013-01-31 2014-09-11 Daihen Corp 高周波電源装置
JP2014209420A (ja) * 2012-12-28 2014-11-06 株式会社ダイヘン 高周波電源装置

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57174910A (en) * 1981-04-20 1982-10-27 Oki Electric Ind Co Ltd Overload protecting system for high frequency power amplifier
JPS57194500A (en) * 1981-05-26 1982-11-30 Tokyo Shibaura Electric Co High frequency heat controller for plasma
JPS5873848A (ja) * 1981-10-27 1983-05-04 Shimadzu Corp 高周波誘導結合プラズマ安定装置

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57174910A (en) * 1981-04-20 1982-10-27 Oki Electric Ind Co Ltd Overload protecting system for high frequency power amplifier
JPS57194500A (en) * 1981-05-26 1982-11-30 Tokyo Shibaura Electric Co High frequency heat controller for plasma
JPS5873848A (ja) * 1981-10-27 1983-05-04 Shimadzu Corp 高周波誘導結合プラズマ安定装置

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63190564A (ja) * 1987-01-30 1988-08-08 Shindengen Electric Mfg Co Ltd Ｒｆ発生装置
JPH01123622A (ja) * 1987-11-09 1989-05-16 Kao Corp 非イオン界面活性剤の強アルカリ性水溶液
JPH11162697A (ja) * 1997-11-28 1999-06-18 Mc Electronics Kk プラズマ生成用の螺旋共振装置
US7221102B2 (en) 2003-02-07 2007-05-22 Daihen Corporation High-frequency power supply device
JP2007266006A (ja) * 2007-06-20 2007-10-11 Hitachi Kokusai Electric Inc プラズマリアクター
JP2009238516A (ja) * 2008-03-26 2009-10-15 Daihen Corp 高周波電源装置
JP2009021240A (ja) * 2008-07-03 2009-01-29 Hitachi Kokusai Electric Inc プラズマ処理装置
JP2011023356A (ja) * 2010-07-29 2011-02-03 Hitachi Kokusai Electric Inc プラズマ処理装置及び基板処理方法
JP2012119088A (ja) * 2010-11-29 2012-06-21 Canon Anelva Corp プラズマ処理装置
JP2014518482A (ja) * 2011-06-27 2014-07-28 テザート−スペースコム ゲーエムベーハー アンド ツェーオー．カーゲー 高周波電力増幅器を終端不良から保護する方法及び装置
JP2014209420A (ja) * 2012-12-28 2014-11-06 株式会社ダイヘン 高周波電源装置
JP2014167902A (ja) * 2013-01-31 2014-09-11 Daihen Corp 高周波電源装置

Also Published As

Publication number Publication date
JPH0576045B2 (enExample) 1993-10-21

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