JPS61160746A - リソグラフイ−法及びリソグラフイ−用マスク保持体 - Google Patents

リソグラフイ−法及びリソグラフイ−用マスク保持体

Info

Publication number
JPS61160746A
JPS61160746A JP60001772A JP177285A JPS61160746A JP S61160746 A JPS61160746 A JP S61160746A JP 60001772 A JP60001772 A JP 60001772A JP 177285 A JP177285 A JP 177285A JP S61160746 A JPS61160746 A JP S61160746A
Authority
JP
Japan
Prior art keywords
film
mask holder
silicon wafer
polyimide
lithography
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP60001772A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0482048B2 (enrdf_load_stackoverflow
Inventor
Hideo Kato
日出夫 加藤
Masaaki Matsushima
正明 松島
Keiko Matsuda
啓子 松田
Hirofumi Shibata
浩文 柴田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP60001772A priority Critical patent/JPS61160746A/ja
Priority to DE19863600169 priority patent/DE3600169A1/de
Publication of JPS61160746A publication Critical patent/JPS61160746A/ja
Priority to US07/170,688 priority patent/US4837123A/en
Publication of JPH0482048B2 publication Critical patent/JPH0482048B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP60001772A 1985-01-07 1985-01-08 リソグラフイ−法及びリソグラフイ−用マスク保持体 Granted JPS61160746A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP60001772A JPS61160746A (ja) 1985-01-08 1985-01-08 リソグラフイ−法及びリソグラフイ−用マスク保持体
DE19863600169 DE3600169A1 (de) 1985-01-07 1986-01-07 Maskenstruktur zur lithographie, verfahren zu ihrer herstellung und lithographisches verfahren
US07/170,688 US4837123A (en) 1985-01-07 1988-03-14 Mask structure for lithography, method of preparation thereof and lithographic method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60001772A JPS61160746A (ja) 1985-01-08 1985-01-08 リソグラフイ−法及びリソグラフイ−用マスク保持体

Publications (2)

Publication Number Publication Date
JPS61160746A true JPS61160746A (ja) 1986-07-21
JPH0482048B2 JPH0482048B2 (enrdf_load_stackoverflow) 1992-12-25

Family

ID=11510862

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60001772A Granted JPS61160746A (ja) 1985-01-07 1985-01-08 リソグラフイ−法及びリソグラフイ−用マスク保持体

Country Status (1)

Country Link
JP (1) JPS61160746A (enrdf_load_stackoverflow)

Also Published As

Publication number Publication date
JPH0482048B2 (enrdf_load_stackoverflow) 1992-12-25

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