JPS61158810A - 高純度シリカゾルの製造法 - Google Patents
高純度シリカゾルの製造法Info
- Publication number
- JPS61158810A JPS61158810A JP27810684A JP27810684A JPS61158810A JP S61158810 A JPS61158810 A JP S61158810A JP 27810684 A JP27810684 A JP 27810684A JP 27810684 A JP27810684 A JP 27810684A JP S61158810 A JPS61158810 A JP S61158810A
- Authority
- JP
- Japan
- Prior art keywords
- acid
- solution
- silica
- liquid
- sol
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 title claims abstract description 54
- 238000004519 manufacturing process Methods 0.000 title description 3
- 239000000243 solution Substances 0.000 claims abstract description 63
- 239000002253 acid Substances 0.000 claims abstract description 36
- 239000012535 impurity Substances 0.000 claims abstract description 25
- 239000002245 particle Substances 0.000 claims abstract description 24
- 239000000084 colloidal system Substances 0.000 claims abstract description 22
- 238000000108 ultra-filtration Methods 0.000 claims abstract description 20
- NWUYHJFMYQTDRP-UHFFFAOYSA-N 1,2-bis(ethenyl)benzene;1-ethenyl-2-ethylbenzene;styrene Chemical compound C=CC1=CC=CC=C1.CCC1=CC=CC=C1C=C.C=CC1=CC=CC=C1C=C NWUYHJFMYQTDRP-UHFFFAOYSA-N 0.000 claims abstract description 16
- 229910052910 alkali metal silicate Inorganic materials 0.000 claims abstract description 16
- 230000002378 acidificating effect Effects 0.000 claims abstract description 14
- 239000012528 membrane Substances 0.000 claims abstract description 14
- 238000000034 method Methods 0.000 claims abstract description 14
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 claims abstract description 10
- 239000003729 cation exchange resin Substances 0.000 claims abstract description 10
- 239000007864 aqueous solution Substances 0.000 claims abstract description 7
- 150000001412 amines Chemical class 0.000 claims abstract description 4
- 229910021529 ammonia Inorganic materials 0.000 claims abstract description 4
- 235000012239 silicon dioxide Nutrition 0.000 claims description 33
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims description 18
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims description 8
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 claims description 5
- 150000007524 organic acids Chemical class 0.000 claims description 3
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 claims description 2
- 150000007513 acids Chemical class 0.000 claims description 2
- 229910052783 alkali metal Inorganic materials 0.000 claims description 2
- 150000001340 alkali metals Chemical class 0.000 claims description 2
- 229910017604 nitric acid Inorganic materials 0.000 claims description 2
- 235000005985 organic acids Nutrition 0.000 claims 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract description 53
- 239000000377 silicon dioxide Substances 0.000 abstract description 25
- 239000007788 liquid Substances 0.000 abstract description 23
- 238000010306 acid treatment Methods 0.000 abstract description 9
- 239000003456 ion exchange resin Substances 0.000 abstract description 6
- 229920003303 ion-exchange polymer Polymers 0.000 abstract description 6
- 230000000694 effects Effects 0.000 abstract description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 11
- 239000002994 raw material Substances 0.000 description 9
- 239000003513 alkali Substances 0.000 description 7
- 238000002360 preparation method Methods 0.000 description 7
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 4
- 239000003153 chemical reaction reagent Substances 0.000 description 4
- 238000002386 leaching Methods 0.000 description 4
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 3
- 235000011114 ammonium hydroxide Nutrition 0.000 description 3
- 238000001914 filtration Methods 0.000 description 3
- 150000002500 ions Chemical class 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 230000008929 regeneration Effects 0.000 description 3
- 238000011069 regeneration method Methods 0.000 description 3
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 239000004115 Sodium Silicate Substances 0.000 description 2
- 239000003957 anion exchange resin Substances 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 238000001879 gelation Methods 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 239000010453 quartz Substances 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 229910052911 sodium silicate Inorganic materials 0.000 description 2
- 239000007858 starting material Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 description 1
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 1
- 239000003082 abrasive agent Substances 0.000 description 1
- 150000004703 alkoxides Chemical class 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000013522 chelant Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 239000002612 dispersion medium Substances 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000000706 filtrate Substances 0.000 description 1
- 238000010304 firing Methods 0.000 description 1
- 238000004108 freeze drying Methods 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 239000012774 insulation material Substances 0.000 description 1
- PAZHGORSDKKUPI-UHFFFAOYSA-N lithium metasilicate Chemical compound [Li+].[Li+].[O-][Si]([O-])=O PAZHGORSDKKUPI-UHFFFAOYSA-N 0.000 description 1
- 229910052912 lithium silicate Inorganic materials 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229920002492 poly(sulfone) Polymers 0.000 description 1
- 235000019353 potassium silicate Nutrition 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 230000001172 regenerating effect Effects 0.000 description 1
- 239000005049 silicon tetrachloride Substances 0.000 description 1
- 235000019795 sodium metasilicate Nutrition 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000012607 strong cation exchange resin Substances 0.000 description 1
- 230000001502 supplementing effect Effects 0.000 description 1
- 235000012431 wafers Nutrition 0.000 description 1
Landscapes
- Silicon Compounds (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP27810684A JPS61158810A (ja) | 1984-12-28 | 1984-12-28 | 高純度シリカゾルの製造法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP27810684A JPS61158810A (ja) | 1984-12-28 | 1984-12-28 | 高純度シリカゾルの製造法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61158810A true JPS61158810A (ja) | 1986-07-18 |
| JPH0454617B2 JPH0454617B2 (enrdf_load_stackoverflow) | 1992-08-31 |
Family
ID=17592710
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP27810684A Granted JPS61158810A (ja) | 1984-12-28 | 1984-12-28 | 高純度シリカゾルの製造法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61158810A (enrdf_load_stackoverflow) |
Cited By (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05310258A (ja) * | 1992-04-27 | 1993-11-22 | Yamato Esuron Kk | 絞り出し容器 |
| US5780664A (en) * | 1993-08-17 | 1998-07-14 | Asahi Kasei Kogyo Kabushi Kaisha | Ammoxidation catalyst composition |
| WO1999036358A1 (en) * | 1998-01-15 | 1999-07-22 | Cabot Corporation | Continuous production of silica via ion exchange |
| JP2003089786A (ja) * | 2001-09-19 | 2003-03-28 | Nippon Chem Ind Co Ltd | 研磨剤用高純度コロイダルシリカ |
| JP2006213541A (ja) * | 2005-02-02 | 2006-08-17 | Catalysts & Chem Ind Co Ltd | 高純度水性シリカゾルの製造方法 |
| JP2012501958A (ja) * | 2008-09-12 | 2012-01-26 | ナルコ カンパニー | 調整可能な多孔率及び表面形態を有する含シリカ物質並びにその合成方法 |
| WO2013039212A1 (ja) * | 2011-09-16 | 2013-03-21 | 日産化学工業株式会社 | 精製された活性珪酸液及びシリカゾルの製造方法 |
| JP2014094845A (ja) * | 2012-11-08 | 2014-05-22 | Agc Si-Tech Co Ltd | 鱗片状シリカ粒子の製造方法 |
| JP2015516940A (ja) * | 2012-04-26 | 2015-06-18 | ヘレーウス クヴァルツグラース ゲゼルシャフト ミット ベシュレンクテル ハフツング ウント コンパニー コマンディートゲゼルシャフトＨｅｒａｅｕｓ Ｑｕａｒｚｇｌａｓ ＧｍｂＨ ＆ Ｃｏ． ＫＧ | ＳｉＯ２顆粒の製造方法 |
| US9550683B2 (en) | 2007-03-27 | 2017-01-24 | Fuso Chemical Co., Ltd. | Colloidal silica, and method for production thereof |
| KR20180034424A (ko) | 2015-07-31 | 2018-04-04 | 가부시키가이샤 후지미인코퍼레이티드 | 실리카 졸의 제조 방법 |
| WO2018163929A1 (ja) | 2017-03-08 | 2018-09-13 | 三菱マテリアル株式会社 | 低屈折率膜形成用液組成物及びこれを用いた低屈折率膜の形成方法 |
| KR20190132640A (ko) | 2017-03-30 | 2019-11-28 | 가부시키가이샤 후지미인코퍼레이티드 | 실리카졸의 제조 방법 |
| US11518682B2 (en) | 2019-03-28 | 2022-12-06 | Fujimi Incorporated | Method for producing silica sol |
-
1984
- 1984-12-28 JP JP27810684A patent/JPS61158810A/ja active Granted
Cited By (25)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05310258A (ja) * | 1992-04-27 | 1993-11-22 | Yamato Esuron Kk | 絞り出し容器 |
| US5780664A (en) * | 1993-08-17 | 1998-07-14 | Asahi Kasei Kogyo Kabushi Kaisha | Ammoxidation catalyst composition |
| WO1999036358A1 (en) * | 1998-01-15 | 1999-07-22 | Cabot Corporation | Continuous production of silica via ion exchange |
| JP2003089786A (ja) * | 2001-09-19 | 2003-03-28 | Nippon Chem Ind Co Ltd | 研磨剤用高純度コロイダルシリカ |
| JP2006213541A (ja) * | 2005-02-02 | 2006-08-17 | Catalysts & Chem Ind Co Ltd | 高純度水性シリカゾルの製造方法 |
| US9550683B2 (en) | 2007-03-27 | 2017-01-24 | Fuso Chemical Co., Ltd. | Colloidal silica, and method for production thereof |
| JP2012501958A (ja) * | 2008-09-12 | 2012-01-26 | ナルコ カンパニー | 調整可能な多孔率及び表面形態を有する含シリカ物質並びにその合成方法 |
| WO2013039212A1 (ja) * | 2011-09-16 | 2013-03-21 | 日産化学工業株式会社 | 精製された活性珪酸液及びシリカゾルの製造方法 |
| US10400147B2 (en) | 2011-09-16 | 2019-09-03 | Nissan Chemical Industries, Ltd. | Method for producing purified active silicic acid solution and silica sol |
| JPWO2013039212A1 (ja) * | 2011-09-16 | 2015-03-26 | 日産化学工業株式会社 | 精製された活性珪酸液及びシリカゾルの製造方法 |
| US10550300B2 (en) | 2011-09-16 | 2020-02-04 | Nissan Chemical Industries, Ltd. | Method for producing purified active silicic acid solution and silica sol |
| JP2016216344A (ja) * | 2011-09-16 | 2016-12-22 | 日産化学工業株式会社 | 精製された活性珪酸液及びシリカゾルの製造方法 |
| CN103748037A (zh) * | 2011-09-16 | 2014-04-23 | 日产化学工业株式会社 | 被纯化了的活性硅酸液和硅溶胶的制造方法 |
| TWI576146B (zh) * | 2011-09-16 | 2017-04-01 | 日產化學工業股份有限公司 | 經精製的活性矽酸液及二氧化矽溶膠之製造方法 |
| JP2015516940A (ja) * | 2012-04-26 | 2015-06-18 | ヘレーウス クヴァルツグラース ゲゼルシャフト ミット ベシュレンクテル ハフツング ウント コンパニー コマンディートゲゼルシャフトＨｅｒａｅｕｓ Ｑｕａｒｚｇｌａｓ ＧｍｂＨ ＆ Ｃｏ． ＫＧ | ＳｉＯ２顆粒の製造方法 |
| JP2014094845A (ja) * | 2012-11-08 | 2014-05-22 | Agc Si-Tech Co Ltd | 鱗片状シリカ粒子の製造方法 |
| KR20180034424A (ko) | 2015-07-31 | 2018-04-04 | 가부시키가이샤 후지미인코퍼레이티드 | 실리카 졸의 제조 방법 |
| US10604411B2 (en) | 2015-07-31 | 2020-03-31 | Fujimi Incorporated | Method for producing silica sol |
| US11001501B2 (en) | 2015-07-31 | 2021-05-11 | Fujimi Incorporated | Method for producing silica sol |
| KR20230162140A (ko) | 2015-07-31 | 2023-11-28 | 가부시키가이샤 후지미인코퍼레이티드 | 실리카 졸의 제조 방법 |
| WO2018163929A1 (ja) | 2017-03-08 | 2018-09-13 | 三菱マテリアル株式会社 | 低屈折率膜形成用液組成物及びこれを用いた低屈折率膜の形成方法 |
| KR20190132640A (ko) | 2017-03-30 | 2019-11-28 | 가부시키가이샤 후지미인코퍼레이티드 | 실리카졸의 제조 방법 |
| US12371331B2 (en) | 2017-03-30 | 2025-07-29 | Fujimi Incorporated | Method for producing silica sol |
| US11518682B2 (en) | 2019-03-28 | 2022-12-06 | Fujimi Incorporated | Method for producing silica sol |
| US11767224B2 (en) | 2019-03-28 | 2023-09-26 | Fujimi Incorporated | Method for producing silica sol |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0454617B2 (enrdf_load_stackoverflow) | 1992-08-31 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| EXPY | Cancellation because of completion of term |