JPS61151643A - 光可溶化組成物 - Google Patents

光可溶化組成物

Info

Publication number
JPS61151643A
JPS61151643A JP59279231A JP27923184A JPS61151643A JP S61151643 A JPS61151643 A JP S61151643A JP 59279231 A JP59279231 A JP 59279231A JP 27923184 A JP27923184 A JP 27923184A JP S61151643 A JPS61151643 A JP S61151643A
Authority
JP
Japan
Prior art keywords
compd
acid
compound
generating
silylether
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59279231A
Other languages
English (en)
Japanese (ja)
Other versions
JPH048783B2 (cs
Inventor
Akihiko Kamiya
神谷 明彦
Toshiaki Aoso
利明 青合
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Priority to JP59279231A priority Critical patent/JPS61151643A/ja
Publication of JPS61151643A publication Critical patent/JPS61151643A/ja
Publication of JPH048783B2 publication Critical patent/JPH048783B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/075Silicon-containing compounds
    • G03F7/0757Macromolecular compounds containing Si-O, Si-C or Si-N bonds

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
JP59279231A 1984-12-26 1984-12-26 光可溶化組成物 Granted JPS61151643A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59279231A JPS61151643A (ja) 1984-12-26 1984-12-26 光可溶化組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59279231A JPS61151643A (ja) 1984-12-26 1984-12-26 光可溶化組成物

Publications (2)

Publication Number Publication Date
JPS61151643A true JPS61151643A (ja) 1986-07-10
JPH048783B2 JPH048783B2 (cs) 1992-02-18

Family

ID=17608257

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59279231A Granted JPS61151643A (ja) 1984-12-26 1984-12-26 光可溶化組成物

Country Status (1)

Country Link
JP (1) JPS61151643A (cs)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61166544A (ja) * 1985-01-18 1986-07-28 Fuji Photo Film Co Ltd 光可溶化組成物
JPS61167946A (ja) * 1985-01-22 1986-07-29 Fuji Photo Film Co Ltd 着色光可溶化組成物
JPS61169836A (ja) * 1985-01-22 1986-07-31 Fuji Photo Film Co Ltd 光可溶化組成物
JPS6225751A (ja) * 1985-07-26 1987-02-03 Fuji Photo Film Co Ltd 画像形成方法
JPS63236029A (ja) * 1987-03-25 1988-09-30 Fuji Photo Film Co Ltd 光可溶化組成物
JPH0285859A (ja) * 1988-09-22 1990-03-27 Fuji Photo Film Co Ltd 感光性組成物

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61166544A (ja) * 1985-01-18 1986-07-28 Fuji Photo Film Co Ltd 光可溶化組成物
JPS61167946A (ja) * 1985-01-22 1986-07-29 Fuji Photo Film Co Ltd 着色光可溶化組成物
JPS61169836A (ja) * 1985-01-22 1986-07-31 Fuji Photo Film Co Ltd 光可溶化組成物
JPS6225751A (ja) * 1985-07-26 1987-02-03 Fuji Photo Film Co Ltd 画像形成方法
JPS63236029A (ja) * 1987-03-25 1988-09-30 Fuji Photo Film Co Ltd 光可溶化組成物
JPH0285859A (ja) * 1988-09-22 1990-03-27 Fuji Photo Film Co Ltd 感光性組成物

Also Published As

Publication number Publication date
JPH048783B2 (cs) 1992-02-18

Similar Documents

Publication Publication Date Title
US4752552A (en) Photosolubilizable composition
US4786577A (en) Photo-solubilizable composition admixture with radiation sensitive acid producing compound and silyl ether group containing compound with either urethane, ureido, amido, or ester group
JP2525568B2 (ja) 光可溶化組成物
JPS6037549A (ja) 光可溶化組成物
JPS61169835A (ja) 光可溶化組成物
JPS61169837A (ja) 光可溶化組成物
JPH01124848A (ja) 画像形成方法
JPS60121446A (ja) 光可溶化組成物
JP2599007B2 (ja) ポジ型感光性組成物
JPH047502B2 (cs)
JPS61151643A (ja) 光可溶化組成物
JPS603625A (ja) 光可溶化組成物
US3526503A (en) Photoresist composition
JPS6238450A (ja) 光可溶化組成物
US4326018A (en) Lithographic printing plate
JPS61167945A (ja) 光可溶化組成物
JPS6238452A (ja) 光可溶化組成物
JPS6238453A (ja) 光可溶化組成物
JPS6259949A (ja) 光可溶化組成物
JPS62175735A (ja) 感光性組成物
JPS61166543A (ja) 光可溶化組成物
JP2565331B2 (ja) 感光性組成物
JPH067259B2 (ja) 着色光可溶化組成物
JPS63236029A (ja) 光可溶化組成物
JPS6261047A (ja) 感光性組成物

Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees