JPS6115140A - パタ−ン作成方法 - Google Patents

パタ−ン作成方法

Info

Publication number
JPS6115140A
JPS6115140A JP59135203A JP13520384A JPS6115140A JP S6115140 A JPS6115140 A JP S6115140A JP 59135203 A JP59135203 A JP 59135203A JP 13520384 A JP13520384 A JP 13520384A JP S6115140 A JPS6115140 A JP S6115140A
Authority
JP
Japan
Prior art keywords
pattern
mask
wafer
etching
creation method
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59135203A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0526182B2 (enrdf_load_stackoverflow
Inventor
Niwaji Majima
庭司 間島
Hiromichi Watanabe
渡辺　広道
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP59135203A priority Critical patent/JPS6115140A/ja
Publication of JPS6115140A publication Critical patent/JPS6115140A/ja
Publication of JPH0526182B2 publication Critical patent/JPH0526182B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP59135203A 1984-07-02 1984-07-02 パタ−ン作成方法 Granted JPS6115140A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59135203A JPS6115140A (ja) 1984-07-02 1984-07-02 パタ−ン作成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59135203A JPS6115140A (ja) 1984-07-02 1984-07-02 パタ−ン作成方法

Publications (2)

Publication Number Publication Date
JPS6115140A true JPS6115140A (ja) 1986-01-23
JPH0526182B2 JPH0526182B2 (enrdf_load_stackoverflow) 1993-04-15

Family

ID=15146260

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59135203A Granted JPS6115140A (ja) 1984-07-02 1984-07-02 パタ−ン作成方法

Country Status (1)

Country Link
JP (1) JPS6115140A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04350272A (ja) * 1991-01-31 1992-12-04 Kajima Corp 竪型地下駐車場

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5429976A (en) * 1977-08-10 1979-03-06 Nec Home Electronics Ltd Manufacture of semiconductor device
JPS5968737A (ja) * 1982-10-13 1984-04-18 Tokyo Ohka Kogyo Co Ltd ポジ型及びネガ型パタ−ンの同時形成方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5429976A (en) * 1977-08-10 1979-03-06 Nec Home Electronics Ltd Manufacture of semiconductor device
JPS5968737A (ja) * 1982-10-13 1984-04-18 Tokyo Ohka Kogyo Co Ltd ポジ型及びネガ型パタ−ンの同時形成方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04350272A (ja) * 1991-01-31 1992-12-04 Kajima Corp 竪型地下駐車場

Also Published As

Publication number Publication date
JPH0526182B2 (enrdf_load_stackoverflow) 1993-04-15

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Legal Events

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