JPS61140131A - 薄膜蒸着装置 - Google Patents

薄膜蒸着装置

Info

Publication number
JPS61140131A
JPS61140131A JP59263563A JP26356384A JPS61140131A JP S61140131 A JPS61140131 A JP S61140131A JP 59263563 A JP59263563 A JP 59263563A JP 26356384 A JP26356384 A JP 26356384A JP S61140131 A JPS61140131 A JP S61140131A
Authority
JP
Japan
Prior art keywords
substrate
vapor
film thickness
thin film
region
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59263563A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0347571B2 (cg-RX-API-DMAC10.html
Inventor
Nobuo Tanaka
伸雄 田中
Yoshifumi Minowa
美濃和　芳文
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP59263563A priority Critical patent/JPS61140131A/ja
Publication of JPS61140131A publication Critical patent/JPS61140131A/ja
Publication of JPH0347571B2 publication Critical patent/JPH0347571B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H10P14/22—

Landscapes

  • Crystals, And After-Treatments Of Crystals (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
JP59263563A 1984-12-12 1984-12-12 薄膜蒸着装置 Granted JPS61140131A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59263563A JPS61140131A (ja) 1984-12-12 1984-12-12 薄膜蒸着装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59263563A JPS61140131A (ja) 1984-12-12 1984-12-12 薄膜蒸着装置

Publications (2)

Publication Number Publication Date
JPS61140131A true JPS61140131A (ja) 1986-06-27
JPH0347571B2 JPH0347571B2 (cg-RX-API-DMAC10.html) 1991-07-19

Family

ID=17391281

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59263563A Granted JPS61140131A (ja) 1984-12-12 1984-12-12 薄膜蒸着装置

Country Status (1)

Country Link
JP (1) JPS61140131A (cg-RX-API-DMAC10.html)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7339182B2 (en) 2005-01-06 2008-03-04 Samsung Sdi Co., Ltd. Vacuum evaporator

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6054726B2 (ja) 2011-12-06 2016-12-27 平田機工株式会社 仕分け装置

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
J.APPL.PHYS=1980 *

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7339182B2 (en) 2005-01-06 2008-03-04 Samsung Sdi Co., Ltd. Vacuum evaporator

Also Published As

Publication number Publication date
JPH0347571B2 (cg-RX-API-DMAC10.html) 1991-07-19

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