JPS6113222B2 - - Google Patents
Info
- Publication number
- JPS6113222B2 JPS6113222B2 JP52115485A JP11548577A JPS6113222B2 JP S6113222 B2 JPS6113222 B2 JP S6113222B2 JP 52115485 A JP52115485 A JP 52115485A JP 11548577 A JP11548577 A JP 11548577A JP S6113222 B2 JPS6113222 B2 JP S6113222B2
- Authority
- JP
- Japan
- Prior art keywords
- compound
- rays
- layer
- bismuth oxide
- silicon
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000000034 method Methods 0.000 claims description 20
- 239000000463 material Substances 0.000 claims description 18
- 239000013078 crystal Substances 0.000 claims description 16
- 229910000416 bismuth oxide Inorganic materials 0.000 claims description 15
- 150000001875 compounds Chemical class 0.000 claims description 12
- -1 bismuth oxide compound Chemical class 0.000 claims description 10
- 238000004519 manufacturing process Methods 0.000 claims description 9
- 230000005855 radiation Effects 0.000 claims description 8
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 7
- 229910052732 germanium Inorganic materials 0.000 claims description 7
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 claims description 7
- 229910052760 oxygen Inorganic materials 0.000 claims description 7
- 239000001301 oxygen Substances 0.000 claims description 7
- 229910052710 silicon Inorganic materials 0.000 claims description 7
- 239000010703 silicon Substances 0.000 claims description 7
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 6
- 229910052782 aluminium Inorganic materials 0.000 claims description 6
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 6
- 239000000758 substrate Substances 0.000 claims description 6
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 claims description 4
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 4
- 239000011230 binding agent Substances 0.000 claims description 4
- 229910052733 gallium Inorganic materials 0.000 claims description 4
- 239000000203 mixture Substances 0.000 claims description 4
- 239000002904 solvent Substances 0.000 claims description 4
- 229910052719 titanium Inorganic materials 0.000 claims description 4
- 239000010936 titanium Substances 0.000 claims description 4
- 229910015902 Bi 2 O 3 Inorganic materials 0.000 claims description 3
- 239000000654 additive Substances 0.000 claims description 2
- 230000000996 additive effect Effects 0.000 claims description 2
- 238000005266 casting Methods 0.000 claims description 2
- 239000000126 substance Substances 0.000 claims 2
- 239000004020 conductor Substances 0.000 claims 1
- 239000010410 layer Substances 0.000 description 25
- TYIXMATWDRGMPF-UHFFFAOYSA-N dibismuth;oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Bi+3].[Bi+3] TYIXMATWDRGMPF-UHFFFAOYSA-N 0.000 description 5
- CJJMLLCUQDSZIZ-UHFFFAOYSA-N oxobismuth Chemical class [Bi]=O CJJMLLCUQDSZIZ-UHFFFAOYSA-N 0.000 description 4
- 238000005245 sintering Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- 239000011888 foil Substances 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 239000000843 powder Substances 0.000 description 3
- 238000005507 spraying Methods 0.000 description 3
- 238000007792 addition Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000010410 dusting Methods 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 230000035945 sensitivity Effects 0.000 description 2
- 238000012935 Averaging Methods 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 238000007606 doctor blade method Methods 0.000 description 1
- 230000005251 gamma ray Effects 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 238000006862 quantum yield reaction Methods 0.000 description 1
- 229910052711 selenium Inorganic materials 0.000 description 1
- 239000011669 selenium Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01T—MEASUREMENT OF NUCLEAR OR X-RADIATION
- G01T1/00—Measuring X-radiation, gamma radiation, corpuscular radiation, or cosmic radiation
- G01T1/16—Measuring radiation intensity
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G5/00—Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
- G03G5/02—Charge-receiving layers
- G03G5/04—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor
- G03G5/08—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor characterised by the photoconductive material being inorganic
- G03G5/082—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor characterised by the photoconductive material being inorganic and not being incorporated in a bonding material, e.g. vacuum deposited
Landscapes
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Inorganic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- High Energy & Nuclear Physics (AREA)
- Molecular Biology (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Measurement Of Radiation (AREA)
- Photoreceptors In Electrophotography (AREA)
- Compositions Of Oxide Ceramics (AREA)
- Light Receiving Elements (AREA)
- Combination Of More Than One Step In Electrophotography (AREA)
- Apparatus For Radiation Diagnosis (AREA)
- Developing Agents For Electrophotography (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE2644168A DE2644168C3 (de) | 1976-09-30 | 1976-09-30 | Verwendung einer kristallinen Wismutoxid-Verbindung der Zusammensetzung Bi↓10↓-14X↓1↓O↓n↓, sowie Vorrichtungen hierzu und Verfahren zu deren Herstellung |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5343531A JPS5343531A (en) | 1978-04-19 |
| JPS6113222B2 true JPS6113222B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1986-04-12 |
Family
ID=5989329
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11548577A Granted JPS5343531A (en) | 1976-09-30 | 1977-09-26 | Method of and device for using bismuth oxide compound |
Country Status (5)
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006124272A (ja) * | 2004-09-28 | 2006-05-18 | Fuji Photo Film Co Ltd | 放射線撮像パネルを構成する光導電層の製造方法 |
| JP2007012842A (ja) * | 2005-06-30 | 2007-01-18 | Fujifilm Holdings Corp | 光導電層および放射線撮像パネル |
Families Citing this family (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2415086A1 (fr) * | 1978-01-24 | 1979-08-17 | Thomson Csf | Materiau polycristallin de formule bi12sio20, procede de fabrication dudit materiau, et dispositif de detection de radiations utilisant ce materiau |
| JPS563754U (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * | 1979-06-21 | 1981-01-13 | ||
| JPS565549A (en) * | 1979-06-27 | 1981-01-21 | Fuji Photo Film Co Ltd | Electrophotograhic recording material |
| DE3116233A1 (de) * | 1981-04-23 | 1982-11-11 | Siemens AG, 1000 Berlin und 8000 München | "anordnung zum herstellen eines koerperschnittbildes" |
| JPS5815586A (ja) * | 1981-07-22 | 1983-01-28 | Cosmo Co Ltd | ビスブレ−カ−タ−ルを原料とするブロ−ンアスフアルトの製造法 |
| JPS5858553A (ja) * | 1981-10-01 | 1983-04-07 | Fuji Photo Film Co Ltd | Ｘ線電子写真感光体およびその製造方法 |
| DE3151155A1 (de) * | 1981-12-23 | 1983-06-30 | Siemens AG, 1000 Berlin und 8000 München | Roengtenbildwandlungseinrichtung |
| DE3235076A1 (de) * | 1982-09-22 | 1984-03-22 | Siemens AG, 1000 Berlin und 8000 München | Aufnahme- und auslesevorrichtung fuer roentgenstrahlen |
| FR2601499B1 (fr) * | 1986-07-08 | 1988-09-30 | Thomson Csf | Detecteur d'image a photoconducteur a memoire |
| DE69015715T2 (de) * | 1989-07-11 | 1995-08-17 | Sony Corp | Verfahren zur Wärmebehandlung eines optischen Oxidkristalles und Wärmebehandlungsvorrichtung dafür. |
| JP4252918B2 (ja) * | 2004-03-24 | 2009-04-08 | 富士フイルム株式会社 | 放射線撮像パネルを構成する光導電層の製造方法 |
| US20060051287A1 (en) * | 2004-09-03 | 2006-03-09 | Fuji Photo Film Co., Ltd. | Processes for producing Bi12MO20 precursors, Bi12MO20 particles, and photo-conductor layers |
| JP2006240953A (ja) * | 2005-03-07 | 2006-09-14 | Fuji Photo Film Co Ltd | Ｂｉ１２ＴｉＯ２０焼結体および光導電層 |
| JP4782445B2 (ja) * | 2005-03-09 | 2011-09-28 | 富士フイルム株式会社 | Ｂｉ１２ＭＯ２０粉体の製造方法および放射線撮像パネルを構成する光導電層 |
| JP2006261202A (ja) * | 2005-03-15 | 2006-09-28 | Fuji Photo Film Co Ltd | 放射線撮像パネルを構成する光導電層および放射線撮像パネル |
| JP2006261203A (ja) * | 2005-03-15 | 2006-09-28 | Fuji Photo Film Co Ltd | 放射線撮像パネルを構成する光導電層および放射線撮像パネル |
| JP2007005623A (ja) * | 2005-06-24 | 2007-01-11 | Fujifilm Holdings Corp | 放射線撮像パネルを構成する光導電層および放射線撮像パネル |
| EP2100947A1 (en) | 2008-03-14 | 2009-09-16 | The Procter and Gamble Company | Automatic dishwashing detergent composition |
| DE102009013301A1 (de) * | 2009-03-16 | 2010-09-30 | Siemens Aktiengesellschaft | Röntgen- oder Gammadetektorarray |
| CA2803827C (en) | 2010-07-07 | 2014-04-08 | University Health Network | Fiber optic radiochromic dosimeter probe and method to make the same |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE814193C (de) * | 1950-02-21 | 1951-09-20 | Immanuel Dipl-Ing Dr Broser | Verfahren zur Erzielung einer bestimmten Abhaengigkeit zwischen absorbierter Energie und Photostrom an groesseren einheitlichen Kristallen oder kristallinen Schichten aus Chalkogeniden von Zn, Cd, Hg oder einem Gemisch aus diesen |
| US2862815A (en) * | 1953-10-01 | 1958-12-02 | Rca Corp | Electrophotographic member |
| US3507646A (en) * | 1965-12-27 | 1970-04-21 | Xerox Corp | Electrophotographic process using a single phase photoconductive glass imaging layer |
| US3470100A (en) * | 1966-01-25 | 1969-09-30 | Bell Telephone Labor Inc | Growth of piezoelectric bismuth oxide |
| US3864725A (en) * | 1971-03-09 | 1975-02-04 | Innotech Corp | Photoconductive junction device employing a glassy amorphous material as an active layer |
| US3754965A (en) * | 1971-04-05 | 1973-08-28 | Varian Associates | A method for making an electrophotographic plate |
| US3830648A (en) * | 1971-04-05 | 1974-08-20 | Varian Associates | Photoconductor-glass binder plate with insulating resin in pores |
| US3936397A (en) * | 1974-02-01 | 1976-02-03 | Owens-Illinois, Inc. | Semiconductive glass-ceramic articles |
| FR2305743A1 (fr) * | 1975-03-25 | 1976-10-22 | Thomson Csf | Dispositif de detection de rayons x |
-
1976
- 1976-09-30 DE DE2644168A patent/DE2644168C3/de not_active Expired
-
1977
- 1977-09-26 JP JP11548577A patent/JPS5343531A/ja active Granted
- 1977-09-27 FR FR7729037A patent/FR2366583A1/fr active Granted
- 1977-09-28 US US05/837,197 patent/US4227084A/en not_active Expired - Lifetime
- 1977-09-29 GB GB40463/77A patent/GB1551549A/en not_active Expired
-
1979
- 1979-03-02 US US06/016,830 patent/US4254200A/en not_active Expired - Lifetime
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006124272A (ja) * | 2004-09-28 | 2006-05-18 | Fuji Photo Film Co Ltd | 放射線撮像パネルを構成する光導電層の製造方法 |
| JP2007012842A (ja) * | 2005-06-30 | 2007-01-18 | Fujifilm Holdings Corp | 光導電層および放射線撮像パネル |
Also Published As
| Publication number | Publication date |
|---|---|
| US4254200A (en) | 1981-03-03 |
| FR2366583B1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1981-05-08 |
| GB1551549A (en) | 1979-08-30 |
| DE2644168A1 (de) | 1978-04-06 |
| US4227084A (en) | 1980-10-07 |
| FR2366583A1 (fr) | 1978-04-28 |
| DE2644168B2 (de) | 1980-10-02 |
| JPS5343531A (en) | 1978-04-19 |
| DE2644168C3 (de) | 1981-06-11 |
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