JPS61114585A - 電気的結線構造及びその形成方法 - Google Patents
電気的結線構造及びその形成方法Info
- Publication number
- JPS61114585A JPS61114585A JP60194027A JP19402785A JPS61114585A JP S61114585 A JPS61114585 A JP S61114585A JP 60194027 A JP60194027 A JP 60194027A JP 19402785 A JP19402785 A JP 19402785A JP S61114585 A JPS61114585 A JP S61114585A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- structure according
- electrical connection
- connection structure
- forming
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N60/00—Superconducting devices
- H10N60/01—Manufacture or treatment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/48—Manufacture or treatment of parts, e.g. containers, prior to assembly of the devices, using processes not provided for in a single one of the groups H01L21/18 - H01L21/326 or H10D48/04 - H10D48/07
- H01L21/4814—Conductive parts
- H01L21/4846—Leads on or in insulating or insulated substrates, e.g. metallisation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/52—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
- H01L23/538—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames the interconnection structure between a plurality of semiconductor chips being formed on, or in, insulating substrates
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N60/00—Superconducting devices
- H10N60/01—Manufacture or treatment
- H10N60/0912—Manufacture or treatment of Josephson-effect devices
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N60/00—Superconducting devices
- H10N60/10—Junction-based devices
- H10N60/12—Josephson-effect devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/46—Manufacturing multilayer circuits
- H05K3/4644—Manufacturing multilayer circuits by building the multilayer layer by layer, i.e. build-up multilayer circuits
- H05K3/4647—Manufacturing multilayer circuits by building the multilayer layer by layer, i.e. build-up multilayer circuits by applying an insulating layer around previously made via studs
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Ceramic Engineering (AREA)
- Superconductor Devices And Manufacturing Methods Thereof (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US06/668,537 US4751563A (en) | 1984-11-05 | 1984-11-05 | Microminiaturized electrical interconnection device and its method of fabrication |
| US668537 | 1984-11-05 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61114585A true JPS61114585A (ja) | 1986-06-02 |
| JPH036675B2 JPH036675B2 (enExample) | 1991-01-30 |
Family
ID=24682719
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60194027A Granted JPS61114585A (ja) | 1984-11-05 | 1985-09-04 | 電気的結線構造及びその形成方法 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US4751563A (enExample) |
| EP (1) | EP0180808B1 (enExample) |
| JP (1) | JPS61114585A (enExample) |
| DE (1) | DE3578634D1 (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2019046557A (ja) * | 2017-08-30 | 2019-03-22 | 国立研究開発法人理化学研究所 | 高温超伝導線材の接続体 |
Families Citing this family (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4740700A (en) * | 1986-09-02 | 1988-04-26 | Hughes Aircraft Company | Thermally insulative and electrically conductive interconnect and process for making same |
| US4926237A (en) * | 1988-04-04 | 1990-05-15 | Motorola, Inc. | Device metallization, device and method |
| US5137461A (en) * | 1988-06-21 | 1992-08-11 | International Business Machines Corporation | Separable electrical connection technology |
| US5185073A (en) * | 1988-06-21 | 1993-02-09 | International Business Machines Corporation | Method of fabricating nendritic materials |
| US4966885A (en) * | 1989-08-25 | 1990-10-30 | At&T Bell Laboratories | Method of producing a device comprising a metal oxide superconductor layer |
| US5118299A (en) * | 1990-05-07 | 1992-06-02 | International Business Machines Corporation | Cone electrical contact |
| EP0478466B1 (en) * | 1990-09-27 | 1995-11-08 | Sumitomo Electric Industries, Ltd. | A superconducting device and a method for manufacturing the same |
| DE69127418T2 (de) * | 1990-09-27 | 1998-03-12 | Sumitomo Electric Industries | Herstellungsverfahren eines supraleitenden Bauelements mit extrem dünnem supraleitenden Kanal aus supraleitendem Oxidmaterial |
| US5236896A (en) * | 1990-10-08 | 1993-08-17 | Sumitomo Electric Industries, Ltd. | Superconducting device having an extremely thin superconducting channel formed of oxide superconductor material |
| US5105537A (en) * | 1990-10-12 | 1992-04-21 | International Business Machines Corporation | Method for making a detachable electrical contact |
| FI950805A7 (fi) * | 1994-02-24 | 1995-08-25 | Shimadzu Corp | Suprajohtava tunneliliitos ja menetelmä sen valmistamiseksi |
| US5863868A (en) * | 1996-04-08 | 1999-01-26 | Trw Inc. | Superconductive quantum interference device for digital logic circuits |
| US6184062B1 (en) | 1999-01-19 | 2001-02-06 | International Business Machines Corporation | Process for forming cone shaped solder for chip interconnection |
| US6198113B1 (en) | 1999-04-22 | 2001-03-06 | Acorn Technologies, Inc. | Electrostatically operated tunneling transistor |
| US6347901B1 (en) | 1999-11-01 | 2002-02-19 | International Business Machines Corporation | Solder interconnect techniques |
| US7615402B1 (en) | 2000-07-07 | 2009-11-10 | Acorn Technologies, Inc. | Electrostatically operated tunneling transistor |
| KR100413828B1 (ko) * | 2001-12-13 | 2004-01-03 | 삼성전자주식회사 | 반도체 장치 및 그 형성방법 |
| RU2293400C1 (ru) * | 2005-06-30 | 2007-02-10 | Федеральное Государственное Унитарное Предприятие "Нижегородский Научно-Исследовательский Институт Радиотехники" | Способ изготовления тонкопленочной структуры гибридной интегральной микросхемы сверхвысокочастотного диапазона |
| US7615385B2 (en) | 2006-09-20 | 2009-11-10 | Hypres, Inc | Double-masking technique for increasing fabrication yield in superconducting electronics |
| US9692147B1 (en) * | 2015-12-22 | 2017-06-27 | Intel Corporation | Small form factor sockets and connectors |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3689780A (en) * | 1969-08-14 | 1972-09-05 | Hans Walter Meissner | Control of flow across a weak link in superconductive and superfluid devices |
| JPS5144871B2 (enExample) * | 1971-09-25 | 1976-12-01 | ||
| US4197332A (en) * | 1977-10-26 | 1980-04-08 | International Business Machines Corporation | Sub 100A range line width pattern fabrication |
| US4224630A (en) * | 1978-08-25 | 1980-09-23 | Sperry Corporation | Multiple weak-link SQUID |
| US4430790A (en) * | 1980-05-20 | 1984-02-14 | Rikagaku Kenkyusho | Method of making a Josephson junction |
| US4415606A (en) * | 1983-01-10 | 1983-11-15 | Ncr Corporation | Method of reworking upper metal in multilayer metal integrated circuits |
-
1984
- 1984-11-05 US US06/668,537 patent/US4751563A/en not_active Expired - Fee Related
-
1985
- 1985-09-04 JP JP60194027A patent/JPS61114585A/ja active Granted
- 1985-10-11 EP EP85112906A patent/EP0180808B1/en not_active Expired
- 1985-10-11 DE DE8585112906T patent/DE3578634D1/de not_active Expired - Lifetime
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2019046557A (ja) * | 2017-08-30 | 2019-03-22 | 国立研究開発法人理化学研究所 | 高温超伝導線材の接続体 |
| US11177588B2 (en) | 2017-08-30 | 2021-11-16 | Riken | High-temperature superconducting wire connection assembly |
Also Published As
| Publication number | Publication date |
|---|---|
| US4751563A (en) | 1988-06-14 |
| EP0180808A3 (en) | 1987-05-13 |
| DE3578634D1 (de) | 1990-08-16 |
| EP0180808A2 (en) | 1986-05-14 |
| JPH036675B2 (enExample) | 1991-01-30 |
| EP0180808B1 (en) | 1990-07-11 |
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