JPS6111132A - 真空装置 - Google Patents
真空装置Info
- Publication number
- JPS6111132A JPS6111132A JP13014384A JP13014384A JPS6111132A JP S6111132 A JPS6111132 A JP S6111132A JP 13014384 A JP13014384 A JP 13014384A JP 13014384 A JP13014384 A JP 13014384A JP S6111132 A JPS6111132 A JP S6111132A
- Authority
- JP
- Japan
- Prior art keywords
- airtight
- opening
- bellows
- semiconductor wafer
- chamber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000002093 peripheral effect Effects 0.000 claims abstract description 4
- 239000004065 semiconductor Substances 0.000 abstract description 36
- 235000012431 wafers Nutrition 0.000 description 29
- 238000007789 sealing Methods 0.000 description 7
- 239000007789 gas Substances 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 3
- 229910001873 dinitrogen Inorganic materials 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 238000005192 partition Methods 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 238000000034 method Methods 0.000 description 2
- 241000257465 Echinoidea Species 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J3/00—Processes of utilising sub-atmospheric or super-atmospheric pressure to effect chemical or physical change of matter; Apparatus therefor
- B01J3/006—Processes utilising sub-atmospheric pressure; Apparatus therefor
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
- Physical Vapour Deposition (AREA)
- Chemical Vapour Deposition (AREA)
- ing And Chemical Polishing (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13014384A JPS6111132A (ja) | 1984-06-26 | 1984-06-26 | 真空装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13014384A JPS6111132A (ja) | 1984-06-26 | 1984-06-26 | 真空装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6111132A true JPS6111132A (ja) | 1986-01-18 |
| JPH0533093B2 JPH0533093B2 (cg-RX-API-DMAC7.html) | 1993-05-18 |
Family
ID=15026995
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13014384A Granted JPS6111132A (ja) | 1984-06-26 | 1984-06-26 | 真空装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6111132A (cg-RX-API-DMAC7.html) |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5329392U (cg-RX-API-DMAC7.html) * | 1976-08-20 | 1978-03-13 |
-
1984
- 1984-06-26 JP JP13014384A patent/JPS6111132A/ja active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5329392U (cg-RX-API-DMAC7.html) * | 1976-08-20 | 1978-03-13 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0533093B2 (cg-RX-API-DMAC7.html) | 1993-05-18 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP3644036B2 (ja) | 半導体装置の製造方法および半導体製造装置 | |
| KR100373803B1 (ko) | 반도체 처리용 로드록 장치 및 방법 | |
| JPH04308090A (ja) | 気相化学反応生成装置のロードロック機構 | |
| JP3121915B2 (ja) | 封止装置 | |
| JPS6312138B2 (cg-RX-API-DMAC7.html) | ||
| JP2002530858A (ja) | 物理蒸着室および化学蒸着室を共に処理システムに統合するためのバッファ室および統合方法 | |
| JP2000208589A (ja) | 処理装置 | |
| JP2000150613A (ja) | 被処理体の搬送装置 | |
| JPS6111132A (ja) | 真空装置 | |
| US5980684A (en) | Processing apparatus for substrates | |
| JPH0517879Y2 (cg-RX-API-DMAC7.html) | ||
| JPS63128710A (ja) | 反応炉 | |
| JPH0355840A (ja) | 縦型処理装置における処理方法 | |
| JPH0330320A (ja) | 気相化学反応生成装置のロードロック機構 | |
| JP3605692B2 (ja) | 搬送処理方法及び搬送処理装置 | |
| JP3121022B2 (ja) | 減圧処理装置 | |
| JPH04254349A (ja) | マルチチャンバプロセス装置 | |
| JPH05144740A (ja) | 真空処理装置 | |
| JPS6112035A (ja) | 半導体製造装置 | |
| JPH01120811A (ja) | 半導体ウエハ処理装置 | |
| JPS61141115A (ja) | 半導体製造装置 | |
| JPH0355838A (ja) | 縦型処理装置 | |
| EP0635875B1 (en) | Apparatus for heat treatment | |
| JPH028369A (ja) | 真空処理装置 | |
| JPS58113378A (ja) | プラズマ処理装置 |