JPS61100941A - 半導体素子の検査データ分析装置 - Google Patents
半導体素子の検査データ分析装置Info
- Publication number
- JPS61100941A JPS61100941A JP59221199A JP22119984A JPS61100941A JP S61100941 A JPS61100941 A JP S61100941A JP 59221199 A JP59221199 A JP 59221199A JP 22119984 A JP22119984 A JP 22119984A JP S61100941 A JPS61100941 A JP S61100941A
- Authority
- JP
- Japan
- Prior art keywords
- inspection
- wafer
- defective
- inspection data
- data
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H10P74/00—
Landscapes
- Testing Of Individual Semiconductor Devices (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59221199A JPS61100941A (ja) | 1984-10-23 | 1984-10-23 | 半導体素子の検査データ分析装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59221199A JPS61100941A (ja) | 1984-10-23 | 1984-10-23 | 半導体素子の検査データ分析装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61100941A true JPS61100941A (ja) | 1986-05-19 |
| JPH0370903B2 JPH0370903B2 (enExample) | 1991-11-11 |
Family
ID=16763020
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59221199A Granted JPS61100941A (ja) | 1984-10-23 | 1984-10-23 | 半導体素子の検査データ分析装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61100941A (enExample) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01170864A (ja) * | 1987-12-25 | 1989-07-05 | Tokyo Electron Ltd | テープキャリヤの検査装置 |
| JPH0661314A (ja) * | 1992-02-03 | 1994-03-04 | American Teleph & Telegr Co <Att> | 半導体ウェーハ上の欠陥集積回路の特徴付け方法 |
| US6202037B1 (en) * | 1998-02-26 | 2001-03-13 | Mitsubishi Denki Kabushiki Kaisha | Quality management system and recording medium |
| KR100499163B1 (ko) * | 1997-12-11 | 2005-09-30 | 삼성전자주식회사 | 웨이퍼 디펙트 분류 방법 |
| CN107037345A (zh) * | 2016-02-02 | 2017-08-11 | 上海和辉光电有限公司 | 晶圆测试时自我检测的方法及其晶圆测试制具 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS53104168A (en) * | 1977-02-23 | 1978-09-11 | Hitachi Ltd | Semiconductor pellet bonding method |
| JPS58165337A (ja) * | 1982-03-26 | 1983-09-30 | Hitachi Ltd | 半導体製造プラントにおける不良解析方法 |
-
1984
- 1984-10-23 JP JP59221199A patent/JPS61100941A/ja active Granted
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS53104168A (en) * | 1977-02-23 | 1978-09-11 | Hitachi Ltd | Semiconductor pellet bonding method |
| JPS58165337A (ja) * | 1982-03-26 | 1983-09-30 | Hitachi Ltd | 半導体製造プラントにおける不良解析方法 |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01170864A (ja) * | 1987-12-25 | 1989-07-05 | Tokyo Electron Ltd | テープキャリヤの検査装置 |
| JPH0661314A (ja) * | 1992-02-03 | 1994-03-04 | American Teleph & Telegr Co <Att> | 半導体ウェーハ上の欠陥集積回路の特徴付け方法 |
| KR100499163B1 (ko) * | 1997-12-11 | 2005-09-30 | 삼성전자주식회사 | 웨이퍼 디펙트 분류 방법 |
| US6202037B1 (en) * | 1998-02-26 | 2001-03-13 | Mitsubishi Denki Kabushiki Kaisha | Quality management system and recording medium |
| CN107037345A (zh) * | 2016-02-02 | 2017-08-11 | 上海和辉光电有限公司 | 晶圆测试时自我检测的方法及其晶圆测试制具 |
| CN107037345B (zh) * | 2016-02-02 | 2019-09-17 | 上海和辉光电有限公司 | 晶圆测试时自我检测的方法及其晶圆测试制具 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0370903B2 (enExample) | 1991-11-11 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP4077951B2 (ja) | 欠陥解析方法、記録媒体及び工程管理方法 | |
| US6334097B1 (en) | Method of determining lethality of defects in circuit pattern inspection method of selecting defects to be reviewed and inspection system of circuit patterns involved with the methods | |
| JP3370379B2 (ja) | 半導体装置の製造方法 | |
| JPH11111796A (ja) | 不良解析方法及びその装置 | |
| JP4611369B2 (ja) | デバイスの製造方法 | |
| US20030158679A1 (en) | Anomaly detection system | |
| JPS61100941A (ja) | 半導体素子の検査データ分析装置 | |
| US12062166B2 (en) | Method and system for diagnosing a semiconductor wafer | |
| JPH11186354A (ja) | 半導体集積回路の検査解析装置及びその方法並びにその制御プログラムを記録した記録媒体 | |
| US7079966B2 (en) | Method of qualifying a process tool with wafer defect maps | |
| US6136618A (en) | Semiconductor device manufacturing process diagnosis system suitable for diagnoses of manufacturing process of logic LSI composed of a plurality of logic circuit blocks and diagnosis method thereof | |
| JP4866263B2 (ja) | 電子デバイスの品質管理方法および電子デバイスの品質管理システム | |
| JPH11219997A (ja) | 電子デバイス検査システム及び電子デバイスの製造方法 | |
| US7855088B2 (en) | Method for manufacturing integrated circuits by guardbanding die regions | |
| JP4276503B2 (ja) | 半導体不良原因絞込み方法 | |
| KR100472776B1 (ko) | 반도체 장치의 웨이퍼 결함 검사 방법 | |
| TW202328665A (zh) | 分析缺陷的方法 | |
| JP3808575B2 (ja) | 歩留まり解析方法及びその装置 | |
| KR100606189B1 (ko) | 반도체 웨이퍼의 불량 해석 방법 | |
| JPS6298739A (ja) | 半導体プロセス異常診断方式 | |
| JP4633349B2 (ja) | 電子デバイスを製造するための欠陥解析方法及びそのプログラム | |
| JPH02208563A (ja) | 鋼材の評価装置 | |
| JP5015227B2 (ja) | 欠陥解析方法、プログラム及び電子デバイスの製造方法 | |
| TWI681357B (zh) | 用於基板缺陷分析之裝置及方法 | |
| JP2752454B2 (ja) | ディスプレイ装置の検査方法 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |