JPS609870A - テルル低酸化物薄膜の製造方法 - Google Patents

テルル低酸化物薄膜の製造方法

Info

Publication number
JPS609870A
JPS609870A JP58116317A JP11631783A JPS609870A JP S609870 A JPS609870 A JP S609870A JP 58116317 A JP58116317 A JP 58116317A JP 11631783 A JP11631783 A JP 11631783A JP S609870 A JPS609870 A JP S609870A
Authority
JP
Japan
Prior art keywords
thin film
oxide thin
tellurium
low
producing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58116317A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0243822B2 (enrdf_load_stackoverflow
Inventor
Noboru Yamada
昇 山田
Mutsuo Takenaga
睦生 竹永
Kenichi Nishiuchi
健一 西内
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP58116317A priority Critical patent/JPS609870A/ja
Priority to EP84304250A priority patent/EP0130755B1/en
Priority to DE8484304250T priority patent/DE3473670D1/de
Priority to US06/624,571 priority patent/US4659588A/en
Publication of JPS609870A publication Critical patent/JPS609870A/ja
Publication of JPH0243822B2 publication Critical patent/JPH0243822B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Physical Vapour Deposition (AREA)
  • Optical Record Carriers And Manufacture Thereof (AREA)
  • Manufacturing Optical Record Carriers (AREA)
  • Thermal Transfer Or Thermal Recording In General (AREA)
JP58116317A 1983-06-27 1983-06-27 テルル低酸化物薄膜の製造方法 Granted JPS609870A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP58116317A JPS609870A (ja) 1983-06-27 1983-06-27 テルル低酸化物薄膜の製造方法
EP84304250A EP0130755B1 (en) 1983-06-27 1984-06-22 Method of producing optical recording medium
DE8484304250T DE3473670D1 (en) 1983-06-27 1984-06-22 Method of producing optical recording medium
US06/624,571 US4659588A (en) 1983-06-27 1984-06-26 Method of producing optical recording medium

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58116317A JPS609870A (ja) 1983-06-27 1983-06-27 テルル低酸化物薄膜の製造方法

Publications (2)

Publication Number Publication Date
JPS609870A true JPS609870A (ja) 1985-01-18
JPH0243822B2 JPH0243822B2 (enrdf_load_stackoverflow) 1990-10-01

Family

ID=14683993

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58116317A Granted JPS609870A (ja) 1983-06-27 1983-06-27 テルル低酸化物薄膜の製造方法

Country Status (1)

Country Link
JP (1) JPS609870A (enrdf_load_stackoverflow)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62169690A (ja) * 1986-01-22 1987-07-25 Nec Corp 光記録材料
JPH04147435A (ja) * 1990-10-11 1992-05-20 Matsushita Electric Ind Co Ltd 真空蒸着方法
WO2008053792A1 (en) * 2006-11-01 2008-05-08 Panasonic Corporation Information recording medium, its manufacturing method, and sputtering target for forming information recording medium

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62169690A (ja) * 1986-01-22 1987-07-25 Nec Corp 光記録材料
JPH04147435A (ja) * 1990-10-11 1992-05-20 Matsushita Electric Ind Co Ltd 真空蒸着方法
WO2008053792A1 (en) * 2006-11-01 2008-05-08 Panasonic Corporation Information recording medium, its manufacturing method, and sputtering target for forming information recording medium
US7972674B2 (en) 2006-11-01 2011-07-05 Panasonic Corporation Information recording medium, its manufacturing method, and sputtering target for forming information recording medium
JP4892562B2 (ja) * 2006-11-01 2012-03-07 パナソニック株式会社 情報記録媒体、その製造方法および情報記録媒体を形成するためのスパッタリングターゲット

Also Published As

Publication number Publication date
JPH0243822B2 (enrdf_load_stackoverflow) 1990-10-01

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