JPS6098623A - 投影式露光方法及びその装置 - Google Patents

投影式露光方法及びその装置

Info

Publication number
JPS6098623A
JPS6098623A JP58205817A JP20581783A JPS6098623A JP S6098623 A JPS6098623 A JP S6098623A JP 58205817 A JP58205817 A JP 58205817A JP 20581783 A JP20581783 A JP 20581783A JP S6098623 A JPS6098623 A JP S6098623A
Authority
JP
Japan
Prior art keywords
pattern
image
alignment
mask
semiconductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58205817A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6360525B2 (enExample
Inventor
Yoshisada Oshida
良忠 押田
Masataka Shiba
正孝 芝
Toshihiko Nakada
俊彦 中田
Mitsuyoshi Koizumi
小泉　光義
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP58205817A priority Critical patent/JPS6098623A/ja
Publication of JPS6098623A publication Critical patent/JPS6098623A/ja
Publication of JPS6360525B2 publication Critical patent/JPS6360525B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7049—Technique, e.g. interferometric

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP58205817A 1983-11-04 1983-11-04 投影式露光方法及びその装置 Granted JPS6098623A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58205817A JPS6098623A (ja) 1983-11-04 1983-11-04 投影式露光方法及びその装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58205817A JPS6098623A (ja) 1983-11-04 1983-11-04 投影式露光方法及びその装置

Publications (2)

Publication Number Publication Date
JPS6098623A true JPS6098623A (ja) 1985-06-01
JPS6360525B2 JPS6360525B2 (enExample) 1988-11-24

Family

ID=16513188

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58205817A Granted JPS6098623A (ja) 1983-11-04 1983-11-04 投影式露光方法及びその装置

Country Status (1)

Country Link
JP (1) JPS6098623A (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6373102A (ja) * 1986-09-17 1988-04-02 Fujitsu Ltd 微細パタ−ンの位置合わせ方法

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03142828A (ja) * 1989-10-27 1991-06-18 Tokyo Electron Ltd 処理装置

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56157033A (en) * 1980-04-11 1981-12-04 Western Electric Co Method and device for positioning mask and wafer
JPS58112330A (ja) * 1981-12-25 1983-07-04 Nippon Kogaku Kk <Nikon> 投影型露光装置

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56157033A (en) * 1980-04-11 1981-12-04 Western Electric Co Method and device for positioning mask and wafer
JPS58112330A (ja) * 1981-12-25 1983-07-04 Nippon Kogaku Kk <Nikon> 投影型露光装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6373102A (ja) * 1986-09-17 1988-04-02 Fujitsu Ltd 微細パタ−ンの位置合わせ方法

Also Published As

Publication number Publication date
JPS6360525B2 (enExample) 1988-11-24

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