JPH0421331B2 - - Google Patents

Info

Publication number
JPH0421331B2
JPH0421331B2 JP63108981A JP10898188A JPH0421331B2 JP H0421331 B2 JPH0421331 B2 JP H0421331B2 JP 63108981 A JP63108981 A JP 63108981A JP 10898188 A JP10898188 A JP 10898188A JP H0421331 B2 JPH0421331 B2 JP H0421331B2
Authority
JP
Japan
Prior art keywords
axis
mask
wafer
pattern
alignment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP63108981A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6432625A (en
Inventor
Yoshitada Oshida
Masataka Shiba
Toshihiko Nakada
Mitsuyoshi Koizumi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP63108981A priority Critical patent/JPS6432625A/ja
Publication of JPS6432625A publication Critical patent/JPS6432625A/ja
Publication of JPH0421331B2 publication Critical patent/JPH0421331B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP63108981A 1988-05-06 1988-05-06 Exposure method for semiconductor Granted JPS6432625A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP63108981A JPS6432625A (en) 1988-05-06 1988-05-06 Exposure method for semiconductor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63108981A JPS6432625A (en) 1988-05-06 1988-05-06 Exposure method for semiconductor

Publications (2)

Publication Number Publication Date
JPS6432625A JPS6432625A (en) 1989-02-02
JPH0421331B2 true JPH0421331B2 (enExample) 1992-04-09

Family

ID=14498555

Family Applications (1)

Application Number Title Priority Date Filing Date
JP63108981A Granted JPS6432625A (en) 1988-05-06 1988-05-06 Exposure method for semiconductor

Country Status (1)

Country Link
JP (1) JPS6432625A (enExample)

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3865483A (en) * 1974-03-21 1975-02-11 Ibm Alignment illumination system
US4326805A (en) * 1980-04-11 1982-04-27 Bell Telephone Laboratories, Incorporated Method and apparatus for aligning mask and wafer members
JPS58112330A (ja) * 1981-12-25 1983-07-04 Nippon Kogaku Kk <Nikon> 投影型露光装置
JPS58162039A (ja) * 1982-03-23 1983-09-26 Nippon Kogaku Kk <Nikon> 投影型露光装置

Also Published As

Publication number Publication date
JPS6432625A (en) 1989-02-02

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