JPS6095437A - フオトマスクブランク - Google Patents
フオトマスクブランクInfo
- Publication number
- JPS6095437A JPS6095437A JP58202021A JP20202183A JPS6095437A JP S6095437 A JPS6095437 A JP S6095437A JP 58202021 A JP58202021 A JP 58202021A JP 20202183 A JP20202183 A JP 20202183A JP S6095437 A JPS6095437 A JP S6095437A
- Authority
- JP
- Japan
- Prior art keywords
- film
- nitride
- chromium
- carbide
- oxide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 24
- 239000011651 chromium Substances 0.000 claims description 24
- 229910052804 chromium Inorganic materials 0.000 claims description 23
- 239000000758 substrate Substances 0.000 claims description 9
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 claims description 8
- 229910000423 chromium oxide Inorganic materials 0.000 claims description 8
- 229910003470 tongbaite Inorganic materials 0.000 claims description 8
- UFGZSIPAQKLCGR-UHFFFAOYSA-N chromium carbide Chemical compound [Cr]#C[Cr]C#[Cr] UFGZSIPAQKLCGR-UHFFFAOYSA-N 0.000 claims description 7
- CXOWYMLTGOFURZ-UHFFFAOYSA-N azanylidynechromium Chemical compound [Cr]#N CXOWYMLTGOFURZ-UHFFFAOYSA-N 0.000 claims description 6
- SJKRCWUQJZIWQB-UHFFFAOYSA-N azane;chromium Chemical compound N.[Cr] SJKRCWUQJZIWQB-UHFFFAOYSA-N 0.000 claims 1
- 238000003475 lamination Methods 0.000 claims 1
- 230000003647 oxidation Effects 0.000 abstract description 6
- 238000007254 oxidation reaction Methods 0.000 abstract description 6
- 239000010410 layer Substances 0.000 abstract description 5
- 230000015572 biosynthetic process Effects 0.000 abstract description 3
- 238000004519 manufacturing process Methods 0.000 abstract description 3
- 230000005856 abnormality Effects 0.000 abstract description 2
- 239000011229 interlayer Substances 0.000 abstract description 2
- 239000004065 semiconductor Substances 0.000 abstract description 2
- 150000004767 nitrides Chemical class 0.000 abstract 2
- 238000010030 laminating Methods 0.000 abstract 1
- 239000004576 sand Substances 0.000 abstract 1
- 238000005530 etching Methods 0.000 description 11
- 239000007789 gas Substances 0.000 description 11
- 239000000463 material Substances 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 238000004544 sputter deposition Methods 0.000 description 3
- 238000001771 vacuum deposition Methods 0.000 description 3
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 2
- XMPZTFVPEKAKFH-UHFFFAOYSA-P ceric ammonium nitrate Chemical compound [NH4+].[NH4+].[Ce+4].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O XMPZTFVPEKAKFH-UHFFFAOYSA-P 0.000 description 2
- 229910001882 dioxygen Inorganic materials 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- VLTRZXGMWDSKGL-UHFFFAOYSA-N perchloric acid Chemical compound OCl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-N 0.000 description 2
- 239000005361 soda-lime glass Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 230000002159 abnormal effect Effects 0.000 description 1
- 239000005407 aluminoborosilicate glass Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- -1 chromium carbide nitride Chemical class 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
- 230000002747 voluntary effect Effects 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/88—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof prepared by photographic processes for production of originals simulating relief
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58202021A JPS6095437A (ja) | 1983-10-28 | 1983-10-28 | フオトマスクブランク |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58202021A JPS6095437A (ja) | 1983-10-28 | 1983-10-28 | フオトマスクブランク |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6095437A true JPS6095437A (ja) | 1985-05-28 |
| JPS6237385B2 JPS6237385B2 (enrdf_load_stackoverflow) | 1987-08-12 |
Family
ID=16450604
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58202021A Granted JPS6095437A (ja) | 1983-10-28 | 1983-10-28 | フオトマスクブランク |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6095437A (enrdf_load_stackoverflow) |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02212843A (ja) * | 1989-02-14 | 1990-08-24 | Toppan Printing Co Ltd | フオトマスクブランク、フオトマスクおよびその製法 |
| EP1220034A3 (en) * | 2000-12-26 | 2003-01-08 | Shin-Etsu Chemical Co., Ltd. | Photomask blank and photomask |
| US7264908B2 (en) | 2003-05-16 | 2007-09-04 | Shin-Etsu Chemical Co., Ltd. | Photo mask blank and photo mask |
| WO2008139904A1 (ja) * | 2007-04-27 | 2008-11-20 | Hoya Corporation | フォトマスクブランク及びフォトマスク |
| JP2009198124A (ja) * | 2008-02-22 | 2009-09-03 | Mitsubishi Heavy Ind Ltd | 燃料監視装置、ボイラ設備、燃料油の混合比判定方法 |
| JP2011221377A (ja) * | 2010-04-13 | 2011-11-04 | Ulvac Seimaku Kk | マスクブランクス、フォトマスクの製造方法及びフォトマスク |
| JP2014059575A (ja) * | 2009-03-31 | 2014-04-03 | Hoya Corp | マスクブランクおよび転写用マスク |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002244274A (ja) | 2001-02-13 | 2002-08-30 | Shin Etsu Chem Co Ltd | フォトマスクブランク、フォトマスク及びこれらの製造方法 |
-
1983
- 1983-10-28 JP JP58202021A patent/JPS6095437A/ja active Granted
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02212843A (ja) * | 1989-02-14 | 1990-08-24 | Toppan Printing Co Ltd | フオトマスクブランク、フオトマスクおよびその製法 |
| EP1220034A3 (en) * | 2000-12-26 | 2003-01-08 | Shin-Etsu Chemical Co., Ltd. | Photomask blank and photomask |
| US7264908B2 (en) | 2003-05-16 | 2007-09-04 | Shin-Etsu Chemical Co., Ltd. | Photo mask blank and photo mask |
| WO2008139904A1 (ja) * | 2007-04-27 | 2008-11-20 | Hoya Corporation | フォトマスクブランク及びフォトマスク |
| JP5054766B2 (ja) * | 2007-04-27 | 2012-10-24 | Ｈｏｙａ株式会社 | フォトマスクブランク及びフォトマスク |
| JP2009198124A (ja) * | 2008-02-22 | 2009-09-03 | Mitsubishi Heavy Ind Ltd | 燃料監視装置、ボイラ設備、燃料油の混合比判定方法 |
| JP2014059575A (ja) * | 2009-03-31 | 2014-04-03 | Hoya Corp | マスクブランクおよび転写用マスク |
| JP2011221377A (ja) * | 2010-04-13 | 2011-11-04 | Ulvac Seimaku Kk | マスクブランクス、フォトマスクの製造方法及びフォトマスク |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6237385B2 (enrdf_load_stackoverflow) | 1987-08-12 |
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