JPS6093336A - レ−ザ微量分析装置 - Google Patents

レ−ザ微量分析装置

Info

Publication number
JPS6093336A
JPS6093336A JP20208883A JP20208883A JPS6093336A JP S6093336 A JPS6093336 A JP S6093336A JP 20208883 A JP20208883 A JP 20208883A JP 20208883 A JP20208883 A JP 20208883A JP S6093336 A JPS6093336 A JP S6093336A
Authority
JP
Japan
Prior art keywords
laser
sample
hole
secondary particles
laser beam
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP20208883A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0447262B2 (enrdf_load_stackoverflow
Inventor
Taku Yamamoto
卓 山本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP20208883A priority Critical patent/JPS6093336A/ja
Priority to DE19843439287 priority patent/DE3439287C2/de
Priority to GB08427104A priority patent/GB2149569B/en
Publication of JPS6093336A publication Critical patent/JPS6093336A/ja
Publication of JPH0447262B2 publication Critical patent/JPH0447262B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00Particle spectrometers or separator tubes
    • H01J49/02Details
    • H01J49/10Ion sources; Ion guns
    • H01J49/16Ion sources; Ion guns using surface ionisation, e.g. field-, thermionic- or photo-emission
    • H01J49/161Ion sources; Ion guns using surface ionisation, e.g. field-, thermionic- or photo-emission using photoionisation, e.g. by laser

Landscapes

  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Other Investigation Or Analysis Of Materials By Electrical Means (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
JP20208883A 1983-10-26 1983-10-26 レ−ザ微量分析装置 Granted JPS6093336A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP20208883A JPS6093336A (ja) 1983-10-26 1983-10-26 レ−ザ微量分析装置
DE19843439287 DE3439287C2 (de) 1983-10-26 1984-10-26 Lasermikrostrahlanalysiergerät
GB08427104A GB2149569B (en) 1983-10-26 1984-10-26 Optical microanalyzer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP20208883A JPS6093336A (ja) 1983-10-26 1983-10-26 レ−ザ微量分析装置

Publications (2)

Publication Number Publication Date
JPS6093336A true JPS6093336A (ja) 1985-05-25
JPH0447262B2 JPH0447262B2 (enrdf_load_stackoverflow) 1992-08-03

Family

ID=16451764

Family Applications (1)

Application Number Title Priority Date Filing Date
JP20208883A Granted JPS6093336A (ja) 1983-10-26 1983-10-26 レ−ザ微量分析装置

Country Status (3)

Country Link
JP (1) JPS6093336A (enrdf_load_stackoverflow)
DE (1) DE3439287C2 (enrdf_load_stackoverflow)
GB (1) GB2149569B (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS639855A (ja) * 1986-06-30 1988-01-16 Rikagaku Kenkyusho 電子計数装置
JPS63146339A (ja) * 1986-12-08 1988-06-18 Shimadzu Corp 飛行時間型質量分析計

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4325724A1 (de) * 1993-07-30 1995-02-02 Paul Dr Debbage Vorrichtung und Verfahren zur Untersuchung eines Objektes und zur Einwirkung auf das Objekt
DE4343076C2 (de) * 1993-12-16 1997-04-03 Phototherm Dr Petry Gmbh Vorrichtung zum photothermischen Prüfen einer Oberfläche eines insbesondere bewegten Gegenstandes
DE19637480C2 (de) * 1996-09-13 2001-02-08 Thorald Bergmann Vorrichtung zur massenspektrometrischen Analyse von Oberflächen
DE10002970B4 (de) * 2000-01-25 2004-09-16 Gkss-Forschungszentrum Geesthacht Gmbh Vorrichtung zur Analyse von in tröpfchenförmigen Flüssigkeitsproben enthaltenen Elementen
GB2400976B (en) * 2000-09-06 2005-02-09 Kratos Analytical Ltd Ion optics system for TOF mass spectrometer
JP4104132B2 (ja) 2003-04-23 2008-06-18 独立行政法人科学技術振興機構 高速粒子発生装置
DE102004044196B4 (de) * 2004-09-14 2019-03-07 Bruker Daltonik Gmbh Massenspektrometer mit einem Lasersystem für die Ionisation einer Probe durch matrixunterstützte Laserdesorption in der massenspektrometrischen Analyse
GB2428868B (en) 2005-10-28 2008-11-19 Thermo Electron Corp Spectrometer for surface analysis and method therefor
CN113921372B (zh) * 2021-12-02 2025-07-11 国开启科量子技术(北京)有限公司 一种激光溅射原子发生装置

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5145586A (enrdf_load_stackoverflow) * 1974-10-16 1976-04-19 Hitachi Ltd

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2141387C3 (de) * 1971-08-18 1975-12-11 Ernst Dr. 8000 Muenchen Remy Verfahren zur auf Mikrobereiche beschränkten Verdampfung, Zerstörung, Anregung und/oder Ionisierung von Probenmaterial sowie Anordnung zur Durchführung des Verfahrens
FR2253410A5 (enrdf_load_stackoverflow) * 1973-12-03 1975-06-27 Inst Nat Sante Rech Med
DE2734918A1 (de) * 1977-08-03 1979-06-21 Leybold Heraeus Gmbh & Co Kg Einrichtung zur analyse von proben
DE2922128A1 (de) * 1979-05-31 1980-12-11 Strahlen Umweltforsch Gmbh Ionenquelle fuer einen massenanalysator
GB2080027B (en) * 1980-07-10 1985-02-27 Hughes Technology Pty Ltd Laser particle generator

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5145586A (enrdf_load_stackoverflow) * 1974-10-16 1976-04-19 Hitachi Ltd

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS639855A (ja) * 1986-06-30 1988-01-16 Rikagaku Kenkyusho 電子計数装置
JPS63146339A (ja) * 1986-12-08 1988-06-18 Shimadzu Corp 飛行時間型質量分析計

Also Published As

Publication number Publication date
DE3439287A1 (de) 1985-05-09
JPH0447262B2 (enrdf_load_stackoverflow) 1992-08-03
DE3439287C2 (de) 1986-02-20
GB2149569A (en) 1985-06-12
GB2149569B (en) 1987-08-26

Similar Documents

Publication Publication Date Title
JP3734366B2 (ja) X線分析装置
US4440475A (en) Electron probe microanalyzer comprising an observation system having double magnification
JPS6093336A (ja) レ−ザ微量分析装置
JPH02114159A (ja) 表面分析方法およびその装置
JPS6180744A (ja) イオンマイクロビ−ム装置
US5039861A (en) Wire shadow emittance scanner
EP0003659A2 (en) Apparatus for and method of analysing materials by means of a beam of charged particles
JP2666871B2 (ja) X線モノクロメータ
JP2884583B2 (ja) X線集光器
JPH07120379A (ja) 高感度反射測定装置用の光学系
JPS5856954B2 (ja) 粒子線マイクロアナライザ−
US4427885A (en) Double focussing mass spectrometer
JPH09145899A (ja) X線集光系
JPWO2017145422A1 (ja) 顕微分析装置
JPH0684492A (ja) 電子顕微鏡
JP7597187B2 (ja) イオン発生装置、質量分析装置及びイオン発生方法
JPS62251641A (ja) 光学的検査装置
JPH11133191A (ja) X線集光装置
JPS6122318A (ja) 集光装置
JPH03165447A (ja) レーザイオン化飛行時間型質量分析計
JP2001266787A (ja) 角度分解・リターディング独立動作型入射レンズシステムを備えた電子分光器及び分光器を用いた分析方法
JPH11326205A (ja) レーザブレイクダウン分光分析装置
JPH0259580B2 (enrdf_load_stackoverflow)
CN117309839A (zh) 拉曼红外复合显微装置
JPH037880Y2 (enrdf_load_stackoverflow)