JPS6091652A - 基板搬送装置 - Google Patents
基板搬送装置Info
- Publication number
- JPS6091652A JPS6091652A JP58198375A JP19837583A JPS6091652A JP S6091652 A JPS6091652 A JP S6091652A JP 58198375 A JP58198375 A JP 58198375A JP 19837583 A JP19837583 A JP 19837583A JP S6091652 A JPS6091652 A JP S6091652A
- Authority
- JP
- Japan
- Prior art keywords
- chamber
- members
- holder
- lift
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/30—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations
- H10P72/34—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
- H10P72/3411—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading involving loading and unloading of wafers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/50—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for positioning, orientation or alignment
Landscapes
- Special Conveying (AREA)
- Transmission Devices (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58198375A JPS6091652A (ja) | 1983-10-25 | 1983-10-25 | 基板搬送装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58198375A JPS6091652A (ja) | 1983-10-25 | 1983-10-25 | 基板搬送装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6091652A true JPS6091652A (ja) | 1985-05-23 |
| JPS6335102B2 JPS6335102B2 (enExample) | 1988-07-13 |
Family
ID=16390063
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58198375A Granted JPS6091652A (ja) | 1983-10-25 | 1983-10-25 | 基板搬送装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6091652A (enExample) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH033006A (ja) * | 1989-05-31 | 1991-01-09 | Rika Kogyo Kk | 調節計 |
| WO1994015117A1 (fr) * | 1992-12-28 | 1994-07-07 | Yoshiki Industrial Co., Ltd. | Levier presentant un point de support fixe, un point de force oscillant et un point d'application oscillant, et machine-outil utilisant ce levier |
-
1983
- 1983-10-25 JP JP58198375A patent/JPS6091652A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6335102B2 (enExample) | 1988-07-13 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US5478195A (en) | Process and apparatus for transferring an object and for processing semiconductor wafers | |
| JPS60115216A (ja) | 真空処理方法及び装置 | |
| JP3761905B2 (ja) | 真空チャンバ、真空チャンバ装置、工作物の移送方法及び移送装置、並びに工作物の処理方法 | |
| JPH09176857A (ja) | ワークピースを表面処理するための真空装置 | |
| JPH08213446A (ja) | 処理装置 | |
| EP0211292A2 (en) | Molecular beam epitaxy apparatus | |
| US5259942A (en) | Device for transferring a workpiece into and out from a vacuum chamber | |
| JPS6091652A (ja) | 基板搬送装置 | |
| JPS6169966A (ja) | 真空処理装置 | |
| JP3323601B2 (ja) | 工作物を真空雰囲気で搬送するためのチャンバ、複合チャンバ、及び工作物を真空設備内部で搬送する方法 | |
| JPS609103B2 (ja) | 連続スパッタ装置 | |
| JPH02140948A (ja) | 真空処理装置 | |
| JPH09291360A (ja) | 基板搬送装置 | |
| JPS61246381A (ja) | 真空処理装置 | |
| JPH06264240A (ja) | 真空設備のためのチャンバおよび複合チャンバ、ならびに1つ以上の工作物を送り込む方法 | |
| US5017073A (en) | Transport system for conveying workpiece between first and second media | |
| JPS61196537A (ja) | 真空処理装置 | |
| JPS60238133A (ja) | 真空処理装置 | |
| JPS58153345A (ja) | 試料移送装置 | |
| JPS5935505B2 (ja) | 半導体装置の製造装置 | |
| JP2981682B2 (ja) | 連続成膜方式の真空蒸着装置 | |
| FR2607406A1 (fr) | Procede de traitement d'un objet dans une atmosphere de haute proprete et conteneur pour la mise en oeuvre de ce procede | |
| JPS6123270B2 (enExample) | ||
| JP2714548B2 (ja) | 真空処理装置及び真空処理装置の使用方法 | |
| JP2883597B2 (ja) | 真空処理装置及び半導体基板処理方法 |