JPS6123270B2 - - Google Patents

Info

Publication number
JPS6123270B2
JPS6123270B2 JP53093966A JP9396678A JPS6123270B2 JP S6123270 B2 JPS6123270 B2 JP S6123270B2 JP 53093966 A JP53093966 A JP 53093966A JP 9396678 A JP9396678 A JP 9396678A JP S6123270 B2 JPS6123270 B2 JP S6123270B2
Authority
JP
Japan
Prior art keywords
thin film
jig
chamber
substrate
vacuum
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP53093966A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5521553A (en
Inventor
Yoshihiro Hirota
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Anelva Corp
Original Assignee
Canon Anelva Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Anelva Corp filed Critical Canon Anelva Corp
Priority to JP9396678A priority Critical patent/JPS5521553A/ja
Publication of JPS5521553A publication Critical patent/JPS5521553A/ja
Publication of JPS6123270B2 publication Critical patent/JPS6123270B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
JP9396678A 1978-08-01 1978-08-01 Device for fabricating film Granted JPS5521553A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9396678A JPS5521553A (en) 1978-08-01 1978-08-01 Device for fabricating film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9396678A JPS5521553A (en) 1978-08-01 1978-08-01 Device for fabricating film

Publications (2)

Publication Number Publication Date
JPS5521553A JPS5521553A (en) 1980-02-15
JPS6123270B2 true JPS6123270B2 (enExample) 1986-06-05

Family

ID=14097137

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9396678A Granted JPS5521553A (en) 1978-08-01 1978-08-01 Device for fabricating film

Country Status (1)

Country Link
JP (1) JPS5521553A (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0673348B2 (ja) * 1991-06-14 1994-09-14 株式会社半導体エネルギー研究所 プラズマ処理装置のクリーニング方法
JPH08195348A (ja) * 1995-08-28 1996-07-30 Semiconductor Energy Lab Co Ltd 半導体装置製造装置
JP2918194B2 (ja) * 1995-12-01 1999-07-12 株式会社半導体エネルギー研究所 プラズマ処理装置およびプラズマ処理方法
KR100390576B1 (ko) * 2001-07-31 2003-07-07 한국과학기술원 박막제조장치
JP2018090867A (ja) * 2016-12-06 2018-06-14 東京エレクトロン株式会社 基板上に膜を形成する方法、及び、成膜システム

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5222073B2 (enExample) * 1973-06-13 1977-06-15

Also Published As

Publication number Publication date
JPS5521553A (en) 1980-02-15

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