JPS6086830A - フオトマスクのパタ−ン修正方法 - Google Patents
フオトマスクのパタ−ン修正方法Info
- Publication number
- JPS6086830A JPS6086830A JP58195424A JP19542483A JPS6086830A JP S6086830 A JPS6086830 A JP S6086830A JP 58195424 A JP58195424 A JP 58195424A JP 19542483 A JP19542483 A JP 19542483A JP S6086830 A JPS6086830 A JP S6086830A
- Authority
- JP
- Japan
- Prior art keywords
- pattern
- resist
- negative photoresist
- film pattern
- white defect
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 title claims description 19
- 239000010409 thin film Substances 0.000 claims abstract description 43
- 230000007547 defect Effects 0.000 claims abstract description 30
- 239000011521 glass Substances 0.000 claims abstract description 15
- 239000000758 substrate Substances 0.000 claims abstract description 15
- 229910052751 metal Inorganic materials 0.000 claims description 45
- 239000002184 metal Substances 0.000 claims description 45
- 229920002120 photoresistant polymer Polymers 0.000 claims description 24
- 239000010408 film Substances 0.000 claims description 17
- 238000011161 development Methods 0.000 claims description 8
- 239000011248 coating agent Substances 0.000 claims description 4
- 238000000576 coating method Methods 0.000 claims description 4
- 238000002715 modification method Methods 0.000 claims description 2
- 238000004380 ashing Methods 0.000 abstract description 2
- 239000003795 chemical substances by application Substances 0.000 abstract 1
- 208000028659 discharge Diseases 0.000 description 11
- 238000012937 correction Methods 0.000 description 5
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 5
- 239000010931 gold Substances 0.000 description 5
- 229910052737 gold Inorganic materials 0.000 description 5
- 230000007423 decrease Effects 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 238000007738 vacuum evaporation Methods 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 1
- 239000005407 aluminoborosilicate glass Substances 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 238000005422 blasting Methods 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 229910000423 chromium oxide Inorganic materials 0.000 description 1
- 210000001520 comb Anatomy 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 239000005361 soda-lime glass Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 230000002747 voluntary effect Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/72—Repair or correction of mask defects
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58195424A JPS6086830A (ja) | 1983-10-19 | 1983-10-19 | フオトマスクのパタ−ン修正方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58195424A JPS6086830A (ja) | 1983-10-19 | 1983-10-19 | フオトマスクのパタ−ン修正方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6086830A true JPS6086830A (ja) | 1985-05-16 |
| JPS6235667B2 JPS6235667B2 (enrdf_load_stackoverflow) | 1987-08-03 |
Family
ID=16340840
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58195424A Granted JPS6086830A (ja) | 1983-10-19 | 1983-10-19 | フオトマスクのパタ−ン修正方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6086830A (enrdf_load_stackoverflow) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4950498A (en) * | 1986-02-24 | 1990-08-21 | Seiko Instruments Inc. | Process for repairing pattern film |
-
1983
- 1983-10-19 JP JP58195424A patent/JPS6086830A/ja active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4950498A (en) * | 1986-02-24 | 1990-08-21 | Seiko Instruments Inc. | Process for repairing pattern film |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6235667B2 (enrdf_load_stackoverflow) | 1987-08-03 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPS62218585A (ja) | フオトマスクの製造方法 | |
| JPS6086830A (ja) | フオトマスクのパタ−ン修正方法 | |
| JP3061790B1 (ja) | マスク製造方法及びパタ―ン形成方法 | |
| JPS62210467A (ja) | レジスト塗布方法 | |
| JPS6159506B2 (enrdf_load_stackoverflow) | ||
| JP7461206B2 (ja) | フォトマスクの製造方法 | |
| JPS58184146A (ja) | マスク基板の製造方法 | |
| JPH03271738A (ja) | フォトマスクの製造方法 | |
| JPS63218959A (ja) | ホトマスクパタ−ンの修正方法 | |
| JPH0266545A (ja) | 薄膜パターンの欠落欠陥部修正方法 | |
| JPS6228463B2 (enrdf_load_stackoverflow) | ||
| JP3484557B2 (ja) | 位相シフトフォトマスクの製造方法 | |
| JPH0551893B2 (enrdf_load_stackoverflow) | ||
| JP2025035716A (ja) | 位相シフトマスクの製造方法及び位相シフトマスク | |
| JPH06260382A (ja) | 半導体装置の製造方法 | |
| JPS63231348A (ja) | フオトマスク | |
| JPH01154060A (ja) | フォトマスクの製造方法 | |
| JPH05134395A (ja) | 位相シフトフオトマスクの欠陥修正法 | |
| JPS6235666B2 (enrdf_load_stackoverflow) | ||
| JPS63138735A (ja) | 微細パタ−ンの形成方法 | |
| JPH0553323A (ja) | 回路基板の製造方法 | |
| JPH01283926A (ja) | 露光方法 | |
| JPS6332935A (ja) | パタ−ン反転方法 | |
| JPH0281048A (ja) | パターン形成方法及びその材料 | |
| JPH02236548A (ja) | フォトマスク基板のエッチング方法およびエッチング装置 |