JPS6228463B2 - - Google Patents
Info
- Publication number
- JPS6228463B2 JPS6228463B2 JP12928582A JP12928582A JPS6228463B2 JP S6228463 B2 JPS6228463 B2 JP S6228463B2 JP 12928582 A JP12928582 A JP 12928582A JP 12928582 A JP12928582 A JP 12928582A JP S6228463 B2 JPS6228463 B2 JP S6228463B2
- Authority
- JP
- Japan
- Prior art keywords
- chromium
- mask
- defects
- deposited
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 43
- 229910052804 chromium Inorganic materials 0.000 claims description 38
- 239000011651 chromium Substances 0.000 claims description 38
- 230000007547 defect Effects 0.000 claims description 21
- 238000000034 method Methods 0.000 claims description 11
- 239000011521 glass Substances 0.000 claims description 8
- 230000002950 deficient Effects 0.000 claims description 6
- 239000000758 substrate Substances 0.000 claims description 6
- 238000000151 deposition Methods 0.000 claims description 3
- 229920002120 photoresistant polymer Polymers 0.000 claims description 3
- 229910052751 metal Inorganic materials 0.000 description 8
- 239000002184 metal Substances 0.000 description 8
- 230000001678 irradiating effect Effects 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- 239000002253 acid Substances 0.000 description 1
- 150000001844 chromium Chemical class 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 230000002708 enhancing effect Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/72—Repair or correction of mask defects
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57129285A JPS5919322A (ja) | 1982-07-23 | 1982-07-23 | クロムマスクの修正方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57129285A JPS5919322A (ja) | 1982-07-23 | 1982-07-23 | クロムマスクの修正方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5919322A JPS5919322A (ja) | 1984-01-31 |
| JPS6228463B2 true JPS6228463B2 (enrdf_load_stackoverflow) | 1987-06-20 |
Family
ID=15005794
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP57129285A Granted JPS5919322A (ja) | 1982-07-23 | 1982-07-23 | クロムマスクの修正方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5919322A (enrdf_load_stackoverflow) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6269269A (ja) * | 1985-09-21 | 1987-03-30 | Mitsubishi Electric Corp | 露光用マスク |
| KR100356794B1 (ko) * | 1999-12-17 | 2002-10-19 | 주식회사 하이닉스반도체 | 반도체 소자의 마스크 형성방법 |
-
1982
- 1982-07-23 JP JP57129285A patent/JPS5919322A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5919322A (ja) | 1984-01-31 |
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