JPS5919322A - クロムマスクの修正方法 - Google Patents

クロムマスクの修正方法

Info

Publication number
JPS5919322A
JPS5919322A JP57129285A JP12928582A JPS5919322A JP S5919322 A JPS5919322 A JP S5919322A JP 57129285 A JP57129285 A JP 57129285A JP 12928582 A JP12928582 A JP 12928582A JP S5919322 A JPS5919322 A JP S5919322A
Authority
JP
Japan
Prior art keywords
chromium
resist
deposited
film
exposed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP57129285A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6228463B2 (enrdf_load_stackoverflow
Inventor
Akira Shirakawa
白川　明
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sanyo Electric Co Ltd
Sanyo Denki Co Ltd
Original Assignee
Sanyo Electric Co Ltd
Sanyo Denki Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sanyo Electric Co Ltd, Sanyo Denki Co Ltd filed Critical Sanyo Electric Co Ltd
Priority to JP57129285A priority Critical patent/JPS5919322A/ja
Publication of JPS5919322A publication Critical patent/JPS5919322A/ja
Publication of JPS6228463B2 publication Critical patent/JPS6228463B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/72—Repair or correction of mask defects

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP57129285A 1982-07-23 1982-07-23 クロムマスクの修正方法 Granted JPS5919322A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57129285A JPS5919322A (ja) 1982-07-23 1982-07-23 クロムマスクの修正方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57129285A JPS5919322A (ja) 1982-07-23 1982-07-23 クロムマスクの修正方法

Publications (2)

Publication Number Publication Date
JPS5919322A true JPS5919322A (ja) 1984-01-31
JPS6228463B2 JPS6228463B2 (enrdf_load_stackoverflow) 1987-06-20

Family

ID=15005794

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57129285A Granted JPS5919322A (ja) 1982-07-23 1982-07-23 クロムマスクの修正方法

Country Status (1)

Country Link
JP (1) JPS5919322A (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6269269A (ja) * 1985-09-21 1987-03-30 Mitsubishi Electric Corp 露光用マスク
KR100356794B1 (ko) * 1999-12-17 2002-10-19 주식회사 하이닉스반도체 반도체 소자의 마스크 형성방법

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6269269A (ja) * 1985-09-21 1987-03-30 Mitsubishi Electric Corp 露光用マスク
KR100356794B1 (ko) * 1999-12-17 2002-10-19 주식회사 하이닉스반도체 반도체 소자의 마스크 형성방법

Also Published As

Publication number Publication date
JPS6228463B2 (enrdf_load_stackoverflow) 1987-06-20

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