JPS6079357A - 投影露光装置 - Google Patents

投影露光装置

Info

Publication number
JPS6079357A
JPS6079357A JP58187866A JP18786683A JPS6079357A JP S6079357 A JPS6079357 A JP S6079357A JP 58187866 A JP58187866 A JP 58187866A JP 18786683 A JP18786683 A JP 18786683A JP S6079357 A JPS6079357 A JP S6079357A
Authority
JP
Japan
Prior art keywords
air
pressure
lens
flow rate
valve
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58187866A
Other languages
English (en)
Japanese (ja)
Other versions
JPH043662B2 (https=
Inventor
Shoichi Tanimoto
昭一 谷元
Kazunori Imamura
今村　和則
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Nippon Kogaku KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp, Nippon Kogaku KK filed Critical Nikon Corp
Priority to JP58187866A priority Critical patent/JPS6079357A/ja
Priority to US06/656,746 priority patent/US4690528A/en
Publication of JPS6079357A publication Critical patent/JPS6079357A/ja
Publication of JPH043662B2 publication Critical patent/JPH043662B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
    • G03F7/70891—Temperature

Landscapes

  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Atmospheric Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Projection-Type Copiers In General (AREA)
JP58187866A 1983-10-05 1983-10-07 投影露光装置 Granted JPS6079357A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP58187866A JPS6079357A (ja) 1983-10-07 1983-10-07 投影露光装置
US06/656,746 US4690528A (en) 1983-10-05 1984-10-01 Projection exposure apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58187866A JPS6079357A (ja) 1983-10-07 1983-10-07 投影露光装置

Publications (2)

Publication Number Publication Date
JPS6079357A true JPS6079357A (ja) 1985-05-07
JPH043662B2 JPH043662B2 (https=) 1992-01-23

Family

ID=16213583

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58187866A Granted JPS6079357A (ja) 1983-10-05 1983-10-07 投影露光装置

Country Status (1)

Country Link
JP (1) JPS6079357A (https=)

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60262421A (ja) * 1984-06-11 1985-12-25 Hitachi Ltd 投影露光方法およびその装置
JPS6187124A (ja) * 1984-07-19 1986-05-02 ジ−・シ−・エ−・コ−ポレ−シヨン マイクロリソグラフイ装置
US4716441A (en) * 1985-07-19 1987-12-29 Matsushita Electric Industrial Co., Ltd. Light exposure apparatus
JPS63312638A (ja) * 1987-06-15 1988-12-21 Canon Inc 露光装置
JPH06342755A (ja) * 1993-11-26 1994-12-13 Hitachi Ltd 投影露光方法およびその装置
US5696623A (en) * 1993-08-05 1997-12-09 Fujitsu Limited UV exposure with elongated service lifetime
US5798838A (en) * 1996-02-28 1998-08-25 Nikon Corporation Projection exposure apparatus having function of detecting intensity distribution of spatial image, and method of detecting the same
US5900926A (en) * 1995-10-06 1999-05-04 Nikon Corporation Projection exposure apparatus
JP2008053732A (ja) * 2006-08-24 2008-03-06 Asml Netherlands Bv 露光装置及び露光方法
JP2011520240A (ja) * 2007-08-24 2011-07-14 カール・ツァイス・エスエムティー・ゲーエムベーハー 制御可能な光学素子、熱アクチュエータによる光学素子の操作方法および半導体リソグラフィのための投影露光装置
JP2012195584A (ja) * 2011-03-14 2012-10-11 Asml Netherlands Bv 投影システム、リソグラフィ装置、及びデバイス製造方法
US8508854B2 (en) 2006-09-21 2013-08-13 Carl Zeiss Smt Gmbh Optical element and method

Cited By (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60262421A (ja) * 1984-06-11 1985-12-25 Hitachi Ltd 投影露光方法およびその装置
JPS6187124A (ja) * 1984-07-19 1986-05-02 ジ−・シ−・エ−・コ−ポレ−シヨン マイクロリソグラフイ装置
US4716441A (en) * 1985-07-19 1987-12-29 Matsushita Electric Industrial Co., Ltd. Light exposure apparatus
JPS63312638A (ja) * 1987-06-15 1988-12-21 Canon Inc 露光装置
US5696623A (en) * 1993-08-05 1997-12-09 Fujitsu Limited UV exposure with elongated service lifetime
JPH06342755A (ja) * 1993-11-26 1994-12-13 Hitachi Ltd 投影露光方法およびその装置
US5900926A (en) * 1995-10-06 1999-05-04 Nikon Corporation Projection exposure apparatus
US5798838A (en) * 1996-02-28 1998-08-25 Nikon Corporation Projection exposure apparatus having function of detecting intensity distribution of spatial image, and method of detecting the same
JP2008053732A (ja) * 2006-08-24 2008-03-06 Asml Netherlands Bv 露光装置及び露光方法
US8508854B2 (en) 2006-09-21 2013-08-13 Carl Zeiss Smt Gmbh Optical element and method
US8891172B2 (en) 2006-09-21 2014-11-18 Carl Zeiss Smt Gmbh Optical element and method
JP2011520240A (ja) * 2007-08-24 2011-07-14 カール・ツァイス・エスエムティー・ゲーエムベーハー 制御可能な光学素子、熱アクチュエータによる光学素子の操作方法および半導体リソグラフィのための投影露光装置
US8325322B2 (en) 2007-08-24 2012-12-04 Carl Zeiss Smt Gmbh Optical correction device
JP2012195584A (ja) * 2011-03-14 2012-10-11 Asml Netherlands Bv 投影システム、リソグラフィ装置、及びデバイス製造方法

Also Published As

Publication number Publication date
JPH043662B2 (https=) 1992-01-23

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