JPS6064437A - 鉛系パツシベ−シヨンガラスのエツチング液 - Google Patents
鉛系パツシベ−シヨンガラスのエツチング液Info
- Publication number
- JPS6064437A JPS6064437A JP58172191A JP17219183A JPS6064437A JP S6064437 A JPS6064437 A JP S6064437A JP 58172191 A JP58172191 A JP 58172191A JP 17219183 A JP17219183 A JP 17219183A JP S6064437 A JPS6064437 A JP S6064437A
- Authority
- JP
- Japan
- Prior art keywords
- glass
- etching
- acetic acid
- lead
- etching liquid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P50/00—Etching of wafers, substrates or parts of devices
Landscapes
- Weting (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58172191A JPS6064437A (ja) | 1983-09-20 | 1983-09-20 | 鉛系パツシベ−シヨンガラスのエツチング液 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58172191A JPS6064437A (ja) | 1983-09-20 | 1983-09-20 | 鉛系パツシベ−シヨンガラスのエツチング液 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6064437A true JPS6064437A (ja) | 1985-04-13 |
| JPH0527249B2 JPH0527249B2 (https=) | 1993-04-20 |
Family
ID=15937259
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58172191A Granted JPS6064437A (ja) | 1983-09-20 | 1983-09-20 | 鉛系パツシベ−シヨンガラスのエツチング液 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6064437A (https=) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002151484A (ja) * | 2000-08-31 | 2002-05-24 | Agilent Technol Inc | エッチング後の洗浄処理法 |
| EP1150342A4 (en) * | 1998-11-24 | 2005-12-21 | Daikin Ind Ltd | RESIN SOLUTION, ASSESSED OBJECT AND METHOD FOR ASSESSED OBJECT |
| WO2019002789A1 (fr) * | 2017-06-30 | 2019-01-03 | Technic France | Composition chimique de nettoyage pour le retrait d'une couche de passivation amorphe a la surface de matériaux cristallins |
-
1983
- 1983-09-20 JP JP58172191A patent/JPS6064437A/ja active Granted
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1150342A4 (en) * | 1998-11-24 | 2005-12-21 | Daikin Ind Ltd | RESIN SOLUTION, ASSESSED OBJECT AND METHOD FOR ASSESSED OBJECT |
| US7404910B1 (en) | 1998-11-24 | 2008-07-29 | Daikin Industries, Ltd. | Etching solution, etched article and method for etched article |
| JP2002151484A (ja) * | 2000-08-31 | 2002-05-24 | Agilent Technol Inc | エッチング後の洗浄処理法 |
| WO2019002789A1 (fr) * | 2017-06-30 | 2019-01-03 | Technic France | Composition chimique de nettoyage pour le retrait d'une couche de passivation amorphe a la surface de matériaux cristallins |
| FR3068509A1 (fr) * | 2017-06-30 | 2019-01-04 | Technic France | Composition chimique de nettoyage pour le retrait d'une couche de passivation amorphe a la surface de materiaux cristallins |
| US11075073B2 (en) | 2017-06-30 | 2021-07-27 | Technic France | Cleaning chemical composition for the removal of an amorphous passivation layer at the surface of crystalline materials |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0527249B2 (https=) | 1993-04-20 |
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