JPS6062116A - Ｘ線露光装置 - Google Patents

Ｘ線露光装置

Info

Publication number
JPS6062116A
JPS6062116A JP58169299A JP16929983A JPS6062116A JP S6062116 A JPS6062116 A JP S6062116A JP 58169299 A JP58169299 A JP 58169299A JP 16929983 A JP16929983 A JP 16929983A JP S6062116 A JPS6062116 A JP S6062116A
Authority
JP
Japan
Prior art keywords
vacuum
gate valve
chamber
window
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58169299A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0426206B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html
Inventor
Takeshi Kimura
剛 木村
Kozo Mochiji
広造 持地
Hidehito Obayashi
大林　秀仁
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP58169299A priority Critical patent/JPS6062116A/ja
Publication of JPS6062116A publication Critical patent/JPS6062116A/ja
Publication of JPH0426206B2 publication Critical patent/JPH0426206B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70841—Constructional issues related to vacuum environment, e.g. load-lock chamber

Landscapes

  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • X-Ray Techniques (AREA)
  • Apparatus For Radiation Diagnosis (AREA)
JP58169299A 1983-09-16 1983-09-16 Ｘ線露光装置 Granted JPS6062116A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58169299A JPS6062116A (ja) 1983-09-16 1983-09-16 Ｘ線露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58169299A JPS6062116A (ja) 1983-09-16 1983-09-16 Ｘ線露光装置

Publications (2)

Publication Number Publication Date
JPS6062116A true JPS6062116A (ja) 1985-04-10
JPH0426206B2 JPH0426206B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1992-05-06

Family

ID=15883942

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58169299A Granted JPS6062116A (ja) 1983-09-16 1983-09-16 Ｘ線露光装置

Country Status (1)

Country Link
JP (1) JPS6062116A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014160040A (ja) * 2013-02-20 2014-09-04 Toshiba Corp Ｘ線透過装置およびｘ線検査装置
US8931508B2 (en) 2008-08-26 2015-01-13 Eaton Corporation Piloted fuel tank vapor isolation valve

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8931508B2 (en) 2008-08-26 2015-01-13 Eaton Corporation Piloted fuel tank vapor isolation valve
JP2014160040A (ja) * 2013-02-20 2014-09-04 Toshiba Corp Ｘ線透過装置およびｘ線検査装置

Also Published As

Publication number Publication date
JPH0426206B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1992-05-06

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