JPS6046924A - 低電気抵抗酸化スズ微粉末の製造方法 - Google Patents
低電気抵抗酸化スズ微粉末の製造方法Info
- Publication number
- JPS6046924A JPS6046924A JP15407983A JP15407983A JPS6046924A JP S6046924 A JPS6046924 A JP S6046924A JP 15407983 A JP15407983 A JP 15407983A JP 15407983 A JP15407983 A JP 15407983A JP S6046924 A JPS6046924 A JP S6046924A
- Authority
- JP
- Japan
- Prior art keywords
- powder
- electrical resistance
- tin oxide
- low electrical
- fine powder
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Conductive Materials (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15407983A JPS6046924A (ja) | 1983-08-25 | 1983-08-25 | 低電気抵抗酸化スズ微粉末の製造方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15407983A JPS6046924A (ja) | 1983-08-25 | 1983-08-25 | 低電気抵抗酸化スズ微粉末の製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6046924A true JPS6046924A (ja) | 1985-03-14 |
JPS621573B2 JPS621573B2 (enrdf_load_stackoverflow) | 1987-01-14 |
Family
ID=15576429
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP15407983A Granted JPS6046924A (ja) | 1983-08-25 | 1983-08-25 | 低電気抵抗酸化スズ微粉末の製造方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6046924A (enrdf_load_stackoverflow) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002029744A (ja) * | 2000-07-17 | 2002-01-29 | Sumitomo Chem Co Ltd | 酸化錫粉末の製造方法 |
JP2010195657A (ja) * | 2009-02-26 | 2010-09-09 | Mitsubishi Materials Corp | 超粒子酸化錫粉末の製造方法 |
US7799312B2 (en) | 2002-03-22 | 2010-09-21 | Samsung Corning Precision Glass Co., Ltd. | Method for manufacturing high-density indium tin oxide target, methods for preparing tin oxide powder and indium oxide powder used therefor |
US20120177565A1 (en) * | 2011-01-07 | 2012-07-12 | Southern Taiwan University | Method for making a conductive tin dioxide powder |
-
1983
- 1983-08-25 JP JP15407983A patent/JPS6046924A/ja active Granted
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002029744A (ja) * | 2000-07-17 | 2002-01-29 | Sumitomo Chem Co Ltd | 酸化錫粉末の製造方法 |
US7799312B2 (en) | 2002-03-22 | 2010-09-21 | Samsung Corning Precision Glass Co., Ltd. | Method for manufacturing high-density indium tin oxide target, methods for preparing tin oxide powder and indium oxide powder used therefor |
JP2010195657A (ja) * | 2009-02-26 | 2010-09-09 | Mitsubishi Materials Corp | 超粒子酸化錫粉末の製造方法 |
US20120177565A1 (en) * | 2011-01-07 | 2012-07-12 | Southern Taiwan University | Method for making a conductive tin dioxide powder |
Also Published As
Publication number | Publication date |
---|---|
JPS621573B2 (enrdf_load_stackoverflow) | 1987-01-14 |
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