JPS6042411A - 含フツ素共重合体の製造法 - Google Patents

含フツ素共重合体の製造法

Info

Publication number
JPS6042411A
JPS6042411A JP14959283A JP14959283A JPS6042411A JP S6042411 A JPS6042411 A JP S6042411A JP 14959283 A JP14959283 A JP 14959283A JP 14959283 A JP14959283 A JP 14959283A JP S6042411 A JPS6042411 A JP S6042411A
Authority
JP
Japan
Prior art keywords
fluorine
vinyl
ether
alpha
polymer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP14959283A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0333169B2 (enrdf_load_stackoverflow
Inventor
Toshio Koishi
小石 俊夫
Isao Tanaka
勲 田中
Takashi Yasumura
安村 崇
Iwao Oshima
尾島 巌
Takamasa Fuchigami
渕上 高正
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Central Glass Co Ltd
Sagami Chemical Research Institute
Original Assignee
Central Glass Co Ltd
Sagami Chemical Research Institute
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Central Glass Co Ltd, Sagami Chemical Research Institute filed Critical Central Glass Co Ltd
Priority to JP14959283A priority Critical patent/JPS6042411A/ja
Publication of JPS6042411A publication Critical patent/JPS6042411A/ja
Publication of JPH0333169B2 publication Critical patent/JPH0333169B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
JP14959283A 1983-08-18 1983-08-18 含フツ素共重合体の製造法 Granted JPS6042411A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14959283A JPS6042411A (ja) 1983-08-18 1983-08-18 含フツ素共重合体の製造法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14959283A JPS6042411A (ja) 1983-08-18 1983-08-18 含フツ素共重合体の製造法

Publications (2)

Publication Number Publication Date
JPS6042411A true JPS6042411A (ja) 1985-03-06
JPH0333169B2 JPH0333169B2 (enrdf_load_stackoverflow) 1991-05-16

Family

ID=15478568

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14959283A Granted JPS6042411A (ja) 1983-08-18 1983-08-18 含フツ素共重合体の製造法

Country Status (1)

Country Link
JP (1) JPS6042411A (enrdf_load_stackoverflow)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6354411A (ja) * 1986-08-22 1988-03-08 Kao Corp ワツクス状フツ素含有共重合体
WO2006016649A1 (ja) * 2004-08-11 2006-02-16 Kuraray Medical Inc. 歯科用重合性組成物
US7060771B2 (en) 2000-12-28 2006-06-13 Central Glass Company, Limited Transparent fluorine-containing copolymer
US7354693B2 (en) * 2004-08-05 2008-04-08 Shin-Etsu Chemical Co., Ltd. Polymer, resist protective coating material, and patterning process
US7358027B2 (en) * 2002-03-04 2008-04-15 International Business Machines Corporation Copolymer for use in chemical amplification resists
US9709891B2 (en) 2005-12-09 2017-07-18 Fujifilm Corporation Positive resist composition, resin used for the positive resist composition, compound used for synthesis of the resin and pattern forming method using the positive resist composition

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6354411A (ja) * 1986-08-22 1988-03-08 Kao Corp ワツクス状フツ素含有共重合体
US7060771B2 (en) 2000-12-28 2006-06-13 Central Glass Company, Limited Transparent fluorine-containing copolymer
US7417100B2 (en) 2000-12-28 2008-08-26 Central Glass Company, Limited Transparent fluorine-containing copolymer
US7358027B2 (en) * 2002-03-04 2008-04-15 International Business Machines Corporation Copolymer for use in chemical amplification resists
US7479364B2 (en) 2002-03-04 2009-01-20 International Business Machines Corporation Copolymer for use in chemical amplification resists
US7354693B2 (en) * 2004-08-05 2008-04-08 Shin-Etsu Chemical Co., Ltd. Polymer, resist protective coating material, and patterning process
WO2006016649A1 (ja) * 2004-08-11 2006-02-16 Kuraray Medical Inc. 歯科用重合性組成物
US7683103B2 (en) 2004-08-11 2010-03-23 Kuraray Medical Inc. Dental polymerizable composition
US9709891B2 (en) 2005-12-09 2017-07-18 Fujifilm Corporation Positive resist composition, resin used for the positive resist composition, compound used for synthesis of the resin and pattern forming method using the positive resist composition
EP1795960B1 (en) * 2005-12-09 2019-06-05 Fujifilm Corporation Positive resist composition, pattern forming method using the positive resist composition, use of the positive resit composition

Also Published As

Publication number Publication date
JPH0333169B2 (enrdf_load_stackoverflow) 1991-05-16

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