JPH0333169B2 - - Google Patents
Info
- Publication number
- JPH0333169B2 JPH0333169B2 JP14959283A JP14959283A JPH0333169B2 JP H0333169 B2 JPH0333169 B2 JP H0333169B2 JP 14959283 A JP14959283 A JP 14959283A JP 14959283 A JP14959283 A JP 14959283A JP H0333169 B2 JPH0333169 B2 JP H0333169B2
- Authority
- JP
- Japan
- Prior art keywords
- formula
- polymer
- fluorine
- trifluoromethyl acrylate
- polymerization
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14959283A JPS6042411A (ja) | 1983-08-18 | 1983-08-18 | 含フツ素共重合体の製造法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14959283A JPS6042411A (ja) | 1983-08-18 | 1983-08-18 | 含フツ素共重合体の製造法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6042411A JPS6042411A (ja) | 1985-03-06 |
JPH0333169B2 true JPH0333169B2 (enrdf_load_stackoverflow) | 1991-05-16 |
Family
ID=15478568
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP14959283A Granted JPS6042411A (ja) | 1983-08-18 | 1983-08-18 | 含フツ素共重合体の製造法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6042411A (enrdf_load_stackoverflow) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6354411A (ja) * | 1986-08-22 | 1988-03-08 | Kao Corp | ワツクス状フツ素含有共重合体 |
JP3714870B2 (ja) | 2000-12-28 | 2005-11-09 | セントラル硝子株式会社 | 透明性含フッ素共重合体 |
US7358027B2 (en) | 2002-03-04 | 2008-04-15 | International Business Machines Corporation | Copolymer for use in chemical amplification resists |
JP4697406B2 (ja) * | 2004-08-05 | 2011-06-08 | 信越化学工業株式会社 | 高分子化合物,レジスト保護膜材料及びパターン形成方法 |
CA2576263A1 (en) * | 2004-08-11 | 2006-02-16 | Kuraray Medical Inc. | Dental polymerizable composition |
EP1795960B1 (en) * | 2005-12-09 | 2019-06-05 | Fujifilm Corporation | Positive resist composition, pattern forming method using the positive resist composition, use of the positive resit composition |
-
1983
- 1983-08-18 JP JP14959283A patent/JPS6042411A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS6042411A (ja) | 1985-03-06 |
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