JPS6027123A - 光プラズマ気相反応法 - Google Patents

光プラズマ気相反応法

Info

Publication number
JPS6027123A
JPS6027123A JP58135396A JP13539683A JPS6027123A JP S6027123 A JPS6027123 A JP S6027123A JP 58135396 A JP58135396 A JP 58135396A JP 13539683 A JP13539683 A JP 13539683A JP S6027123 A JPS6027123 A JP S6027123A
Authority
JP
Japan
Prior art keywords
plasma
reaction
reactive gas
gas
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58135396A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0557732B2 (en:Method
Inventor
Shunpei Yamazaki
舜平 山崎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Semiconductor Energy Laboratory Co Ltd
Original Assignee
Semiconductor Energy Laboratory Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Semiconductor Energy Laboratory Co Ltd filed Critical Semiconductor Energy Laboratory Co Ltd
Priority to JP58135396A priority Critical patent/JPS6027123A/ja
Publication of JPS6027123A publication Critical patent/JPS6027123A/ja
Publication of JPH0557732B2 publication Critical patent/JPH0557732B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H10P14/24—
    • H10P14/3411—

Landscapes

  • Formation Of Insulating Films (AREA)
  • Photovoltaic Devices (AREA)
JP58135396A 1983-07-25 1983-07-25 光プラズマ気相反応法 Granted JPS6027123A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58135396A JPS6027123A (ja) 1983-07-25 1983-07-25 光プラズマ気相反応法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58135396A JPS6027123A (ja) 1983-07-25 1983-07-25 光プラズマ気相反応法

Publications (2)

Publication Number Publication Date
JPS6027123A true JPS6027123A (ja) 1985-02-12
JPH0557732B2 JPH0557732B2 (en:Method) 1993-08-24

Family

ID=15150732

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58135396A Granted JPS6027123A (ja) 1983-07-25 1983-07-25 光プラズマ気相反応法

Country Status (1)

Country Link
JP (1) JPS6027123A (en:Method)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0277127A (ja) * 1988-09-13 1990-03-16 Sony Corp 半導体装置

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS499589A (en:Method) * 1972-03-23 1974-01-28
JPS56124229A (en) * 1980-03-05 1981-09-29 Matsushita Electric Ind Co Ltd Manufacture of thin film
JPS5710920A (en) * 1980-06-23 1982-01-20 Canon Inc Film forming process

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS499589A (en:Method) * 1972-03-23 1974-01-28
JPS56124229A (en) * 1980-03-05 1981-09-29 Matsushita Electric Ind Co Ltd Manufacture of thin film
JPS5710920A (en) * 1980-06-23 1982-01-20 Canon Inc Film forming process

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0277127A (ja) * 1988-09-13 1990-03-16 Sony Corp 半導体装置

Also Published As

Publication number Publication date
JPH0557732B2 (en:Method) 1993-08-24

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